Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method

Abstract

An exposure apparatus for exposing a substrate with an image of a pattern formed on a mask, including an illumination system or irradiation for illuminating or irradiating the mask with exposure light. A projection optical system is included for projecting, onto the substrate, an image of the pattern illuminated by the exposure light. The mask is securely supported on a movable mask stage. In one example, a mask holder is provided for supporting the mask from below. A pressing member is also included for applying, from above, a prescribed force to the mask, outside of the points supported by the mask holder.

What is claimed is:  
     
         1 . A holding apparatus which holds a mask in a light exposure apparatus, the mask containing a pattern to be transferred onto a substrate by illuminating the pattern with an illuminating light, and the light exposure apparatus being a scanning-type apparatus that moves the mask in a direction of travel perpendicular to an optical axis of the illumination light while the mask pattern is illuminated by the illumination light, the holding apparatus comprising: 
 a mask holder which holds the mask by a holding force;    a mask driver, which is mechanically connected to the mask holder, and which drives the mask holder in a direction of travel perpendicular to the optical axis;    a vacuum adhesion device, which has a plurality of adhering portions, and which generates a vacuum adhesion force between the mask and the mask holder, the adhering portions generating the vacuum adhesion force to be used for fastening the mask to the mask holder respectively so that the mask is vacuum adhered to the mask holder by the plurality of adhering portions; and    an external force supplying system, which is electrically connected to said mask driver, and which supplies an external force to the mask in order to maintain a predetermined positional relationship between the mask and the mask holder while the mask driver drives the mask holder, wherein the external force is different from the vacuum adhesion force, and wherein the mask is held on the mask holder by the holding force including the external force and the vacuum adhesion force generated from the plurality of adhering portions.    
     
     
         2 . The apparatus as set forth in  claim 1 , wherein the mask driver drives the mask holder at an acceleration, a, less than the product of the holding force, N, acting on the mask and a coefficient of friction, μ, between the mask and the mask holder divided by the mass, m, of the mask as shown in the following relationship: 
       
         a<Nμ/m. 
       
     
     
         3 . The apparatus as set forth in  claim 1 , further including a plurality of support members to support the mask from below at a plurality of support points.  
     
     
         4 . The apparatus as set forth in  claim 3 , wherein the external force supplying system applies the force, from above, to the mask outside of the support points of the support members.  
     
     
         5 . The apparatus as set forth in  claim 4 , wherein said external force supplying system applies the force, from above, outside of the support points of said mask holder, at two side portions of the mask that are substantially parallel to the direction of travel.  
     
     
         6 . The apparatus as set forth in  claim 1 , further including an airtight member to form an airtight space between the mask and said mask holder, wherein said external force supplying system applies the force to the mask by controlling air pressure within said airtight member.  
     
     
         7 . The apparatus as set forth in  claim 1 , wherein the force applied by said external force supplying system is a magnetic force to secure the mask to said mask holder.  
     
     
         8 . The apparatus as set forth in  claim 7 , wherein said external force supplying system further includes 
 a clamp adapted to make and break contact with the mask;    an electromagnet attached to said mask holder;    a permanent magnet attached to said clamp and mounted opposite to said mask holder; and    a controller to control said electromagnet to secure the mask to and release the mask from said mask holder.    
     
     
         9 . The apparatus as set forth in  claim 1 , wherein the force applied by said external force supplying system is an electrostatic attractive force to secure the mask to said mask holder.  
     
     
         10 . The apparatus as set forth in  claim 1 , wherein the force applied by said external force supplying system is generated by a ringing phenomenon.  
     
     
         11 . The apparatus as set forth in  claim 1 , wherein said external force supplying system applies the force to the mask as a compressing force by a fluid to secure the mask to said mask holder.  
     
     
         12 . A holding apparatus which holds a mask in a light exposure apparatus, the mask containing a pattern to be transferred onto a substrate by illuminating the pattern with an illumination light, and the light exposure apparatus being a scanning-type apparatus that moves the mask in a direction of travel perpendicular to an optical axis of the illumination light while the mask pattern is illuminated by the illumination light, the holding apparatus comprising: 
 a mask holder which holds the mask, wherein the mask holder travels in a direction perpendicular to the optical axis;    a vacuum adhesion device which generates a vacuum adhesion force between the mask and the mask holder, wherein the mask is adhered to the mask holder by the vacuum adhesion force; and    an external force supplying system, which supplies an external force to the mask in order to maintain a predetermined positional relationship between the mask and the mask holder, wherein the external force is different from the vacuum adhesion force, wherein the external force effects to the mask in a direction perpendicular to a formation surface of the mask pattern formed on the mask, and wherein the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.    
     
     
         13 . The apparatus as set forth in  claim 12 , wherein said external force supplying system is electrically activated.  
     
     
         14 . The apparatus as set forth in  claim 13 , wherein the force applied by said external force supplying system is an electrostatic attractive force that secures the mask to said mask holder by applying a predetermined voltage there between.  
     
     
         15 . The apparatus as set forth in  claim 14 , further including a chrome portion provided on a surface of the mask and contacting said mask holder.  
     
     
         16 . The apparatus as set forth in  claim 15 , wherein said chrome portion is provided on a side of the mask making contact with said mask holder.  
     
     
         17 . The apparatus as set forth in  claim 15 , further including an electric portion provided on said mask holder making contact with said chrome portion.  
     
     
         18 . The apparatus as set forth in  claim 12 , wherein the force applied by said external force supplying system is a compressive force applied, from above, to an upper side portion of the mask.  
     
     
         19 . The apparatus as set forth in  claim 18 , further including an airtight member to form an airtight space between the mask and said mask holder.  
     
     
         20 . The apparatus as set forth in  claim 19 , wherein said external force supplying system applies the force to the mask by controlling the air pressure within said airtight member.  
     
     
         21 . The apparatus as set forth in  claim 20 , wherein said external force supplying system applies the force to the mask as a compressing force as a fluid to a portion of the mask other than a portion in which the pattern is formed.  
     
     
         22 . The apparatus as set forth in  claim 21 , wherein the fluid is a gas and the compressive force is adjusted by controlling pressure of the gas.  
     
     
         23 . The apparatus as set forth in  claim 12 , wherein said external force supplying system applies the force to the mask, wherein the force is generated by a ringing phenomenon.  
     
     
         24 . A scanning-exposure method for transferring a pattern formed on a mask onto a substrate by illuminating the pattern with an illumination light, and for moving the mask in a direction of travel perpendicular to an optical axis of the illuminating light, the scanning exposure method comprising: 
 generating a vacuum adhesion force between the mask and a mask holder that holds the mask;    applying an external force to the mask, wherein the external force is different from the vacuum adhesion force, and wherein the external force effects to the mask in a direction perpendicular to a formation surface of the mask pattern formed on the mask; and    moving the mask holder in a direction of travel perpendicular to the optical axis when the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.    
     
     
         25 . The method as set forth in  claim 24 , further including generating the external force by electrical activation from an external force generating member disposed on the mask holder.  
     
     
         26 . The method as set forth in  claim 24 , wherein said applying an external force applies the external force as an electrostatic attraction force.  
     
     
         27 . The method as set forth in  claim 24 , wherein said applying an external force applies the external force as a compressive force.  
     
     
         28 . The method as set forth in  claim 24 , further including generating the external force by a ringing phenomenon.  
     
     
         29 . A method for manufacturing a device including transferring a device-pattern formed on a mask onto a substrate of the device using the scanning-exposure method as set forth in  claim 24 .  
     
     
         30 . A scanning exposure method for transferring a pattern formed on a mask onto a substrate by illuminating the pattern with an illumination light, and for moving the mask in a direction of travel perpendicular to an optical axis of the illumination light, the scanning exposure method comprising: 
 generating a vacuum adhesion force between the mask and a mask holder that holds the mask, wherein the vacuum adhesion force is obtained from a plurality of adhering portions that generate the vacuum adhesion force to be used for fastening the mask to the mask holder respectively;    applying an external force to the mask, wherein the external force is different from the vacuum adhesion force; and    moving the mask holder in a direction of travel perpendicular to the optical axis when the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.    
     
     
         31 . The method as set forth in  claim 30 , further including generating the external force by electrical activation from an external force generating member disposed on the mask holder.  
     
     
         32 . The method as set forth in  claim 30 , wherein said applying an external force applies the external force as an electrostatic attraction force.  
     
     
         33 . The method as set forth in  claim 30 , wherein said applying an external force applies the external force as a compressive force.  
     
     
         34 . The method as set forth in  claim 30 , further including generating the external force by a ringing phenomenon.  
     
     
         35 . A method for manufacturing a device including transferring a device-pattern formed on a mask onto a substrate of the device using the scanning-exposure method as set forth in  claim 30 .  
     
     
         36 . A holding apparatus which holds a mask in a light exposure apparatus, the mask containing a pattern to be transferred onto a substrate by illuminating the pattern with an illumination light, and the light exposure apparatus being a scanning-type exposure apparatus that moves the mask in a direction of travel perpendicular to an optical axis of the illumination light while the mask pattern is illuminated by the illumination light, the holding apparatus comprising: 
 a mask holder which holds the mask, wherein the mask holder travels in a direction perpendicular to the optical axis;    a vacuum adhesion device which generates a vacuum adhesion force between the mask and the mask holder, wherein the mask is adhered to the mask holder by the vacuum adhesion force; and    an external force supplying system, which supplies an external force to the mask in order to maintain a predetermined positional relationship between the mask and the mask holder, wherein the external force is different from the vacuum adhesion force, wherein the external force is able to control based on information regarding a mask thickness or information regarding a moving velocity of the mask holder, and wherein the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.    
     
     
         37 . The apparatus as set forth in  claim 36 , wherein said external force supplying system is electrically activated.  
     
     
         38 . The apparatus as set forth in  claim 37 , wherein the force applied by said external force supplying system is an electrostatic attractive force that secures the mask to said mask holder by applying a predetermined voltage there between.  
     
     
         39 . The apparatus as set forth in  claim 38 , further including a chrome portion provided on a surface of the mask and contacting said mask holder.  
     
     
         40 . The apparatus as set forth in  claim 39 , wherein said chrome portion is provided on a side of the mask making contact with said mask holder.  
     
     
         41 . The apparatus as set forth in  claim 39 , further including an electric portion provided on said mask holder making contact with said chrome portion.  
     
     
         42 . The apparatus as set forth in  claim 36 , wherein the force applied by said external force supplying system is a compressive force applied, from above, to an upper side portion of the mask.  
     
     
         43 . The apparatus as set forth in  claim 42 , further including an airtight member to form an airtight space between the mask and said mask holder.  
     
     
         44 . The apparatus as set forth in  claim 43 , wherein said external force supplying system applies the force to the mask by controlling the air pressure within said airtight member.  
     
     
         45 . The apparatus as set forth in  claim 44 , wherein said external force supplying system applies the force to the mask as a compressing force as a fluid to a portion of the mask other than a portion in which the pattern is formed.  
     
     
         46 . The apparatus as set forth in  claim 45 , wherein the fluid is a gas and the compressive force is adjusted by controlling pressure of the gas.  
     
     
         47 . The apparatus as set forth in  claim 36 , wherein said external force supplying system applies the force to the mask, wherein the force is generated by a ringing phenomenon.  
     
     
         48 . A scanning exposure method for transferring a pattern formed on a mask onto a substrate by illuminating the pattern with an illumination light, and for moving the mask in a direction of travel perpendicular to an optical axis of the illumination light, the scanning exposure method comprising: 
 generating a vacuum adhesion force between the mask and a mask holder that holds the mask;    applying an external force to the mask, wherein the external force is different from the vacuum adhesion force, and wherein the external force is able to control based on information regarding a mask thickness or information regarding a moving velocity of the mask holder; and    moving the mask holder in a direction of travel perpendicular to the optical axis when the mask is held on the mask holder by a holding force including the vacuum adhesion force and the external force.    
     
     
         49 . The method according to  claim 48 , wherein the external force is generated by electrically activating an external force generating device that generates the external force.  
     
     
         50 . The method as set forth in  claim 48 , wherein said applying an external force applies the external force as an electrostatic attraction force.  
     
     
         51 . The method as set forth in  claim 48 , wherein said applying an external force applies the external force as a compressive force.  
     
     
         52 . The method as set forth in  claim 48 , further including generating the external force by a ringing phenomenon.  
     
     
         53 . A method for manufacturing a device including transferring a device-pattern formed on a mask onto a substrate of the device using the scanning-exposure method as set forth in  claim 48 .  
     
     
         54 . The holding apparatus according to  claim 36 , wherein the external force supplying system controls generation of the external force.  
     
     
         55 . The holding apparatus according to  claim 36 , wherein the external force supplying system controls an amount of the external force.  
     
     
         56 . The method according to  claim 48 , further comprising controlling generation of the external force.  
     
     
         57 . The method according to  claim 48 , further comprising controlling an amount of the external force.  
     
     
         58 . A scanning exposure apparatus which exposes the substrate with the pattern formed on the mask, wherein the scanning exposure apparatus has the holding apparatus according to  claim 1 .  
     
     
         59 . A scanning exposure apparatus which exposes the substrate with the pattern formed on the mask, wherein the scanning exposure apparatus has the holding apparatus according to  claim 12 .  
     
     
         60 . A scanning exposure apparatus which exposes the substrate with the pattern formed on the mask, wherein the scanning exposure apparatus has the holding apparatus according to  claim 36.