Fabrication system and a fabrication method of light emitting device

Abstract

An evaporation apparatus with high utilization efficiency for EL materials and excellent film uniformity is provided. The invention is an evaporation apparatus having a movable evaporation source and a substrate rotating unit, in which the space between an evaporation source holder and a workpiece (substrate) is narrowed to 30 cm or below, preferably 20 cm, more preferably 5 to 15 cm, to improve the utilization efficiency for EL materials. In evaporation, the evaporation source holder is moved in the X-direction or the Y-direction, and the workpiece (substrate) is rotated for deposition. Therefore, film uniformity is improved.

What is claimed is:  
     
         1 . A fabrication system having a deposition apparatus, in which an evaporation material is evaporated from an evaporation source disposed opposite to a substrate and deposited over the substrate, said system comprising: 
 a film-formation chamber where the substrate is placed, said film-formation chamber comprising: 
 the evaporation source;  
 means for moving the evaporation source; and  
 means for rotating the substrate,  
   wherein the evaporation source is moved and the substrate is rotated simultaneously for deposition.    
     
     
         2 . The fabrication system according to  claim 1 , wherein a space between the evaporation source and the substrate is 30 cm or below.  
     
     
         3 . The fabrication system according to  claim 1 , wherein the film-formation chamber is joined to a chamber for vacuuming the film-formation chamber.  
     
     
         4 . The fabrication system according to  claim 1 , wherein the evaporation source is moved in at least of an X-direction and a Y-direction.  
     
     
         5 . The fabrication system according to  claim 1 , wherein the evaporation material comprises an organic compound material.  
     
     
         6 . The fabrication system according to  claim 1 , said means for moving the evaporation source is an evaporation source holder.  
     
     
         7 . The fabrication system according to  claim 1 , said means for rotating the substrate is a substrate holder.  
     
     
         8 . A fabrication system having a deposition apparatus, comprising: 
 a loading chamber;    a transport chamber joined to the loading chamber; and    a film-formation chamber joined to the transport chamber,    wherein the film-formation chamber includes: 
 an evaporation source;  
 means for moving the evaporation source; and  
 means for rotating the substrate,  
   wherein the evaporation source is moved and the substrate is rotated simultaneously for deposition.    
     
     
         9 . The fabrication system according to  claim 8 , wherein a space between the evaporation source and the substrate is 30 cm or below.  
     
     
         10 . The fabrication system according to  claim 8 , wherein the film-formation chamber is joined to a chamber for vacuuming the film-formation chamber.  
     
     
         11 . The fabrication system according to  claim 8 , wherein the evaporation source is moved in at least of an X-direction and a Y-direction.  
     
     
         12 . The fabrication system according to  claim 8 , wherein the evaporation material comprises an organic compound material.  
     
     
         13 . The fabrication system according to claims  8 , said means for moving the evaporation source is an evaporation source holder.  
     
     
         14 . The fabrication system according to claims  8 , said means for rotating the substrate is a substrate holder.  
     
     
         15 . A fabrication system having a deposition apparatus, in which an evaporation material is evaporated from an evaporation source disposed opposite to a substrate and deposited over the substrate, comprising: 
 a film-formation chamber where the substrate is placed comprising: 
 the evaporation source;  
 means for moving the evaporation source; and  
   wherein the evaporation source is moved zigzag.    
     
     
         16 . The fabrication system according to  claim 15 , wherein a space between the evaporation source and the substrate is 30 cm or below.  
     
     
         17 . The fabrication system according to  claim 15 , wherein the film-formation chamber is joined to a chamber for vacuuming the film-formation chamber.  
     
     
         18 . The fabrication system according to  claim 15 , wherein the evaporation source is moved in at least of an X-direction and a Y-direction.  
     
     
         19 . The fabrication system according to  claim 15 , wherein the evaporation material comprises an organic compound material.  
     
     
         20 . The fabrication system according to  claim 15 , said means for moving the evaporation source is an evaporation source holder.  
     
     
         21 . A fabrication system having a deposition apparatus, the fabrication system comprising: 
 a loading chamber;    a transport chamber joined to the loading chamber; and    a film-formation chamber joined to the transport chamber,    wherein the film-formation chamber includes: 
 an evaporation source;  
 means for moving the evaporation source; and  
 wherein the evaporation source is moved zigzag.  
   
     
     
         22 . The fabrication system according to  claim 21 , wherein a space between the evaporation source and the substrate is 30 cm or below.  
     
     
         23 . The fabrication system according to  claim 21 , wherein the film-formation chamber is joined to a chamber for vacuuming the film-formation chamber.  
     
     
         24 . The fabrication system according to  claim 21 , wherein the evaporation source is moved in at least of an X-direction and a Y-direction.  
     
     
         25 . The fabrication system according to  claim 21 , wherein the evaporation material comprises an organic compound material.  
     
     
         26 . The fabrication system according to  claim 21 , said means for moving the evaporation source is an evaporation source holder.  
     
     
         27 . A fabrication method of a light emitting device, comprising: 
 rotating a substrate in a film-formation chamber;    evaporating an evaporation material comprising an organic compound from an evaporation source in the film-formation chamber;    changing a relative position of the evaporation source with respect to the substrate; and    depositing a layer comprising said organic compound over said substrate in the film-formation chamber.    
     
     
         28 . A fabrication method of a light emitting device, comprising: 
 evaporating an evaporation material comprising an organic compound from an evaporation source in a film-formation chamber;    changing a relative position of the evaporation source with respect to the substrate zigzag; and    depositing a layer comprising said organic compound over said substrate in the film-formation chamber.