Implant provided with attachment and hole-insert parts, and a method for producing such an implant

Abstract

An implant ( 4 ) is provided with attachment and hole-insert parts ( 2, 3 ) with surfaces which have different degrees of finishing and/or degrees of roughness and/or porosities ( 2 f, 2 g ). Arranged on the surfaces there is at least one dozen (A-B) in which the degree of finishing and/or the degree of roughness and/or the porosity is continuously changed. The changes in porosity in said zones can mirror continuous or discontinuous changes in the bone in question, for example the jaw bone or tooth bone. The continuously changed zones can be obtained with the aid of electrolyte ( 15 ) and, connected to the latter, an anode and cathode arrangement ( 13, 14 ). When establishing the porosity, it is possible to mask different portions of the respective implant and to control the temperature of the implant.

1 . Implant ( 4 ) provided with attachment and hole-insert parts ( 2 ,  3 ) with surfaces ( 2   d,    3   a′,    3   b′ ) which have different degrees of finishing and/or degrees of roughness, characterized in that the surfaces are provided with at least one zone (A, B, C, D or E) in which the degree of finishing and/or the degree of roughness and/or the porosity ( 2   f,    2   g ) is continuously changed.  
     
     
         2 . Implant according to patent  claim 1 , characterized in that the surfaces are provided with two or more zones (A, B, C, D, E) with continuously changed degrees of finishing and/or degrees of roughness and/or porosities.  
     
     
         3 . Implant according to patent  claim 1  or  2 , characterized in that, in the case where there is one zone, the latter extends in the longitudinal direction of the implant, for example along a substantial part (B) of the longitudinal direction of the implant.  
     
     
         4 . Implant according to patent  claim 1  or  2 , characterized in that, in the case where there are two or more zones (A, B), these extend in the longitudinal direction of the implant.  
     
     
         5 . Implant according to patent  claim 1 ,  2  or  3 , characterized in that, in the case where there is one zone, the latter extends in the circumferential direction of the implant, e.g. over a substantial part of the circumferential direction (C′, D′ or E′) of the implant.  
     
     
         6 . Implant according to patent claims  1 ,  2 ,  4  or  5 , characterized in that, in the case where there are at least two zones (C′, D′, E′), these extend along parts of the circumferential direction ( 2   h ) of the implant.  
     
     
         7 . Implant according to any of the preceding patent claims, characterized in that each zone (C-E or C′-E′) has a longitudinal extent in the longitudinal direction or circumferential direction (H,  2   h ) of the implant which is 5% or more of the respective extent (H,  2   h ).  
     
     
         8 . Implant according to any of patent claims  1 ,  2 ,  4 ,  6  or  7 , characterized in that, in the case where there are two or more zones (C-E), two zones are arranged next to each other with the porosity modifications oriented towards or away from each other.  
     
     
         9 . Implant according to any of the preceding claims, characterized in that the hole-insert part ( 3 ) of the implant has one or more threaded portions, for example a cylindrical threaded portion ( 4 ′) and a conical threaded portion ( 4 ″) at the tip of the implant.  
     
     
         10 . Implant according to any of the preceding patent claims, characterized in that a surface ( 2   d ) situated on the attachment part ( 2 ) has a degree of finishing which is obtained by machining, and in that the degree of roughness/porosity increases continuously therefrom out towards the tip ( 9   d ) of the implant.  
     
     
         11 . Method for establishing different degrees of finishing and/or degrees of machining of outer surfaces ( 2   d,    3   a′,    3   b′ ) of an implant ( 4 ) with attachment and hole-insert parts ( 2 ,  3   a,    3   b ), characterized in that the implant ( 4 ) is applied wholly or partially in or near an electrolyte ( 15 ), in that the temperature of the implant can be controlled, and in that voltage (U) is applied to an anode and cathode arrangement ( 8 ,  14 ) where a current (I) initiated by the voltage is passed through the implant.  
     
     
         12 . Method according to patent  claim 11 , characterized in that an anode ( 8 ) included in the arrangement is arranged in a cooling device, for example in a container ( 6 ) which is filled with liquid nitrogen ( 7 ), and in that the implant ( 4 ) is connected to the anode (B) via a boundary surface ( 6   a ) in the cooling device, and in that the cooling of the anode effected by the cooling device ( 7 ) is transmitted to the implant.  
     
     
         13 . Method according to patent  claim 11  or  12 , characterized in that parts of the implant ( 4 ) are masked, and in that the porosity ( 2   g ) is initiated by means of said electrolyte ( 15 ) and voltage (U) on the exposed portions of the implant.  
     
     
         14 . Method according to patent  claim 13 , characterized in that each zone (C-D) with respective continuously changed degree of finishing and/or degree of roughness and/or porosity ( 2   g ) is initiated with the aid of voltage and current generated in the anode and cathode arrangement ( 8 ,  14 ).  
     
     
         15 . Method according to patent  claim 13  or  14 , characterized in that each zone (C-D) with respective continuously changed degree of finishing and/or degree of roughness and/or porosity ( 2   g ) is initiated with the aid of the degree of immersion or degree of application of the implant in the electrolyte ( 15 ).  
     
     
         16 . Method according to patent  claim 13 ,  14  or  15 , characterized in that each zone with respective continuously changed degree of finishing and/or degree of roughness and/or porosity is initiated with the aid of the degree of masking of the implant.  
     
     
         17 . Method according to patent  claim 13 ,  14  or  15 , characterized in that each zone with respective continuously changed degree of finishing and/or degree of roughness and/or porosity is initiated by voltage and current generated in the anode and cathode arrangement, the degree of immersion or degree of application in the electrolyte, the degree of masking and temperature control, preferably vigorous cooling.  
     
     
         18 . Arrangement for providing an implant with different degrees of finishing and/or machining and/or degrees of porosity ( 2   f,    2   g ) on the surfaces ( 4 ′,  4 ″) of the implant, characterized in that the range includes implants with continuously decreasing or increasing porosity in one or more zones (C-D).  
     
     
         19 . Arrangement according to patent  claim 18 , characterized in that the continuously decreasing or increasing porosity in each zone is varied between different implants in the range.  
     
     
         20 . Arrangement according to patent  claim 15  or  16 , characterized in that the implants in the range have different continuously decreasing zones in the longitudinal and/or circumferential directions (H,  2   b ) of the implant.