Exposure method and apparatus

Abstract

A high exposure accuracy is obtained while mitigating the influence of vibration by using an exposure method and an exposure apparatus. Columns ( 59 A, 59 B) are installed on a base plate ( 12 ), a reticle base ( 62 ) is supported at the inside of the columns ( 59 A, 59 B) by the aid of variable mount sections ( 61 A, 61 B) having high rigidity, a finely movable stage ( 63 ) is movably placed on the reticle base ( 62 ) by the aid of air bearings, and a reticle (R 1 ) as an exposure objective is placed on the finely movable stage ( 63 ). A coarsely movable stage ( 64 ) is hung on a bottom surface of a support plate ( 66 ) arranged over the reticle base ( 62 ) in a state capable of being driven in a scanning direction. The finely movable stage ( 63 ) is driven by the coarsely movable stage ( 64 ) in the scanning direction in a non-contact state with respect to the reticle base ( 62 ). The finely movable stage ( 63 ) is finely driven with respect to the coarsely movable stage ( 64 ) by an actuator arranged between the coarsely movable stage ( 64 ) and the finely movable stage ( 63 ).

What is claimed is:  
     
         1 . An exposure method for exposing a second object with an exposure light beam via a pattern of a first object, the exposure method comprising: 
 preparing a base member and a movable stage which is arranged movably on the base member and on which the first object is placed; and    driving the movable stage in a predetermined direction without being in contact with the base member.    
     
     
         2 . The exposure method according to  claim 1 , wherein: 
 a guide member is arranged over the base member; and    the movable stage is driven in the predetermined direction along the guide member in a state in which law of conservation of momentum is substantially satisfied.    
     
     
         3 . An exposure apparatus for exposing a second object with an exposure light beam via a pattern of a first object, the exposure apparatus comprising: 
 a base member;    a movable stage which is arranged movably on the base member and on which the first object is placed; and    a coarsely movable stage which drives the movable stage in a predetermined direction without being in contact with the base member.    
     
     
         4 . The exposure apparatus according to  claim 3 , further comprising: 
 a guide member which is arranged over the base member; and    a driving unit which drives the coarsely movable stage in the predetermined direction along the guide member.    
     
     
         5 . The exposure apparatus according to  claim 3 , wherein: 
 the first object and the second object are synchronously scanned in the predetermined direction when the second object is exposed; and    the guide member is moved in an opposite direction to the predetermined direction so that law of conservation of momentum is substantially satisfied when the coarsely movable stage is driven in the predetermined direction by the aid of the driving unit.    
     
     
         6 . The exposure apparatus according to  claim 3 , further comprising: 
 a first measuring unit which measures a position of the coarsely movable stage in the predetermined direction;    a second measuring unit which measures a two-dimensional position of the movable stage; and    an actuator which finely moves the movable stage two-dimensionally with respect to the coarsely movable stage.    
     
     
         7 . The exposure apparatus according to  claim 3 , wherein a plurality of masks to serve as the first object are placed in the predetermined direction on the movable stage.  
     
     
         8 . An exposure apparatus for exposing a second object with an exposure light beam passing through a first object, the exposure apparatus comprising: 
 a first movable member which holds one of the first object and the second object and which is arranged on a first base member; and    a second movable member which is arranged on a second base member different from the first base member and which is used to drive the first movable member.    
     
     
         9 . The exposure apparatus according to  claim 8 , wherein the first movable member is coupled to the second movable member in a non-contact manner.  
     
     
         10 . The exposure apparatus according to  claim 8 , wherein the first movable member has its degrees of freedom of a number which is larger than that of the second movable member.  
     
     
         11 . The exposure apparatus according to  claim 10 , further comprising a first actuator which relatively moves the first movable member with respect to the second movable member.  
     
     
         12 . The exposure apparatus according to  claim 11 , further comprising: 
 a second actuator which relatively moves the second movable member with respect to the second base member, wherein:    at least a part of the second actuator is provided on the second base member.    
     
     
         13 . The exposure apparatus according to  claim 8 , further comprising a vibration-attenuating unit which attenuates vibration caused by reaction force during the movement of at least one of the first and second movable members.  
     
     
         14 . The exposure apparatus according to  claim 13 , wherein the vibration-attenuating unit includes a movable member which is movable so that law of conservation of momentum is substantially satisfied during the movement.  
     
     
         15 . The exposure apparatus according to  claim 14 , wherein the second movable member is movable along a guide member on the second base member, and the guide member is movable as the movable member during the movement.  
     
     
         16 . The exposure apparatus according to  claim 8 , wherein a vibration-preventive mechanism is provided between the first base member and the second base member.  
     
     
         17 . The exposure apparatus according to  claim 8 , wherein the first base member is provided integrally with a first support member on which at least a part of a main exposure body is arranged.  
     
     
         18 . The exposure apparatus according to  claim 17 , wherein the second base member is provided on a second support member which is different from the first support member, on a surface of installation of the main exposure body.  
     
     
         19 . A method for producing an exposure apparatus for exposing a second object with an exposure light beam via a pattern of a first object, the method comprising: 
 arranging a base member on a bottom surface side of the first object at a position at which the first object is to be arranged;    providing a movable stage such that the movable stage is movable and places the first object thereon, on the base member;    providing a guide member along a predetermined direction on the base member;    arranging a coarsely movable stage so as to be movable along the guide member and opposingly to at least a part of the movable stage; and    coupling the movable stage and the coarsely movable stage to one another.    
     
     
         20 . An exposure method for exposing a second object with an exposure light beam via a pattern of a first object, the exposure method comprising: 
 supporting a second base member in a state capable of making displacement with a predetermined number of degrees of freedom on a first base member;    placing a first movable stage for positioning the first object movably on the second base member;    placing a second movable stage for positioning the second object movably on the first base member; and    controlling an attitude of the second base member with respect to the first base member so as to suppress vibration caused by movement of the first and second movable stages.    
     
     
         21 . The exposure method according to  claim 20 , further comprising: 
 supporting a third base member in a state capable of making displacement with a predetermined number of degrees of freedom on the first base member;    placing, on the third base member, a projection system for projecting an image of the pattern of the first object onto the second object; and    further controlling an attitude of the third base member with respect to the first base member so as to suppress the vibration caused by the movement of the first and second movable stages.    
     
     
         22 . An exposure apparatus for exposing a second object with an exposure light beam via a pattern of a first object, the exposure apparatus comprising: 
 a first base member which is supported by the aid of a plurality of vibration-preventive pedestals;    a second base member which is placed on the first base member by the aid of a plurality of expandable/contractible or displaceable first attitude control members;    a first movable stage which is arranged movably on the second base member and which positions the first object; and    a second movable stage which is arranged movably on the first base member and which positions the second object.    
     
     
         23 . The exposure apparatus according to  claim 22 , further comprising: 
 a projection system which projects an image of the pattern of the first object onto the second object; and    a third base member which is placed on the first base member by the aid of a plurality of expandable/contractible or displaceable second attitude control members, wherein:    the projection system is supported on the third base member.    
     
     
         24 . The exposure apparatus according to  claim 23 , wherein: 
 a cutout formed on the third base member; and    the projection system is installed accessibly in a side surface direction with respect to the cutout.    
     
     
         25 . The exposure apparatus according to  claim 23 , wherein the projection system is supported on the third base member by the aid of a plurality of expandable/contractible or displaceable third attitude control members.  
     
     
         26 . A method for producing an exposure apparatus for exposing a second object with an exposure light beam passing through a pattern of a first object, the method comprising: 
 supporting a first base member by the aid of a plurality of vibration-preventive pedestals;    placing a second base member on the first base member by the aid of a plurality of expandable/contractible or displaceable first attitude control members;    placing, on the second base member, a first movable stage so as t be movable and position the first object; and    placing, on the first base member, a second movable stage so as to be movable and position the second object.    
     
     
         27 . A method for producing a device, comprising the step of using the exposure method as defined in  claim 1 .  
     
     
         28 . A method for producing a device, comprising the step of using the exposure method as defined in  claim 20 .  
     
     
         29 . A method for producing a device, comprising the step of performing exposure by using the exposure apparatus as defined in  claim 3 .  
     
     
         30 . A method for producing a device, comprising the step of performing exposure by using the exposure apparatus as defined in  claim 8 .  
     
     
         31 . A method for producing a device, comprising the step of performing exposure by using the exposure apparatus as defined in  claim 22.