US2003141606A1PendingUtilityA1
Resist pattern for alignment measurement
Priority: Jan 31, 2002Filed: Jan 27, 2003Published: Jul 31, 2003
Est. expiryJan 31, 2022(expired)· nominal 20-yr term from priority
H10W 46/101H10W 46/00
23
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Claims
Abstract
A resist pattern for alignment measurement being shrunk by a heat flow comprises a plurality of positive type or negative type line patterns. Widths of spaces between the line patters are greater than twice those of the line patterns. Alternatively, the resist pattern comprises a box-shaped or slit-shaped measurement pattern and a pair of box-shaped or slit-shaped auxiliary patterns provided inside and outside the measurement pattern, respectively.
Claims
exact text as granted — not AI-modified1 . A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising:
a plurality of line patterns.
2 . The resist pattern for alignment measurement according to claim 1 , wherein said line patterns are all positive types.
3 . The resist pattern for alignment measurement according to claim 1 , wherein said line patterns are all negative types.
4 . The resist pattern for alignment measurement according to claim 1 , wherein widths of spaces between said line patters are greater than twice those of said line patterns.
5 . A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising:
a measurement pattern; and a pair of auxiliary patterns provided inside and outside said measurement pattern, respectively.
6 . The resist pattern for alignment measurement according to claim 5 , wherein said measurement and auxiliary patterns are box-shaped.
7 . The resist pattern for alignment measurement according to claim 5 , wherein said measurement and auxiliary patterns are slit-shaped.
8 . The resist pattern for an alignment measurement according to claim 5 , wherein said measurement and auxiliary patterns are all positive types.
9 . The resist pattern for an alignment measurement according to claim 5 , wherein said measurement and auxiliary patterns are all negative types.
10 . A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising
a measurement pattern; and at least one auxiliary pattern provided inside or outside said measurement pattern, wherein widths of spaces between said measurement and auxiliary pattern are equal in vertical and horizontal directions.
11 . A resist pattern for alignment measurement, said resist pattern being shrunk by a heat flow, comprising
a box-shaped measurement pattern; and an auxiliary pattern provided outside said measurement pattern, wherein widths of spaces between internal edges of said measurement pattern in vertical and horizontal directions and widths of spaces between outer edges of said measurement pattern and inner edges of said auxiliary pattern in vertical and horizontal directions are all equal.Join the waitlist — get patent alerts
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