High efficiency electromagnetic beam projector, and systems and methods for implementation thereof

Abstract

This invention relates to electromagnetic wave beam paths, formation of the beam, illumination of programmable electromagnetic wave field vector orientation rotating devices (“PEMFVORD”) with an electromagnetic beam, and the technique of projection of the modulated beam. This invention also relates to a unique light path and method of forming the light into a rectangular beam to be used for optical projection systems and, more particularly, in a color and/or black and white liquid crystal device (LCD) projectors that produce high resolution, high brightness and/or three-dimensional images. This invention further relates to a device capable of receiving and displaying two-dimensional and three dimensional images.

What is claimed is:  
     
         1 . A method of producing a substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity across the beam of electromagnetic energy, comprising: 
 (a) providing a first substantially collimated beam of electromagnetic energy;    (b) resolving from the first substantially collimated beam of electromagnetic energy a first substantially collimated resolved beam of electromagnetic energy having a first selected orientation of the electromagnetic wave field vector and a second substantially collimated resolved beam of electromagnetic energy having a second selected orientation of the electromagnetic wave field vector, whereby the first and second selected orientations of the electromagnetic wave field vector are different from each other;    (c) intercepting the first substantially collimated resolved beam at a first location along the beam optical path and shifting the first selected orientation of the electromagnetic wave field vector by a first non-zero increment to produce a first phase shifted resolved beam;    (d) intercepting the second substantially collimated resolved beam at a second location along the beam optical path spaced apart from the first location and shifting the second selected orientation of the electromagnetic wave field vector by a second non-zero increment to produce a second phase shifted resolved beam having substantially the same selected orientation of the electromagnetic wave field vector as the first phase shifted resolved beam; and    (e) redirecting the second phase shifted resolved beam to be parallel to the first phase shifted resolved beam to form a second substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity substantially across the second substantially collimated beam of electromagnetic energy.    
     
     
         2 . The method of  claim 1  where said (a) includes shaping the first substantially collimated beam of electromagnetic energy into a rectangular cross sectional area.  
     
     
         3 . The method of  claim 1  where said first substantially collimated beam of electromagnetic energy includes a rectangular cross sectional area.  
     
     
         4 . The method of  claim 1  where said (b) includes adjusting said second substantially collimated resolved beam of electromagnetic energy to a substantially uniform flux intensity relative to said first substantially collimated resolved beam of electromagnetic energy.  
     
     
         5 . The method of  claim 1  where said shifting in said (c) includes passing at least one of said substantially collimated resolved beams off of an electromagnetic wave vector orientation rotator.  
     
     
         6 . The method of  claim 1  where said shifting in said (d) includes passing at least one of said substantially collimated resolved beams off of an electromagnetic wave vector orientation rotator.  
     
     
         7 . The method of  claim 1  where said shifting in said (c) includes reflecting at least one of said substantially collimated resolved beams off of an electromagnetic wave vector orientation rotator.  
     
     
         8 . The method of  claim 1  where said shifting in said (d) includes reflecting at least one of said substantially collimated resolved beams off of an electromagnetic wave vector orientation rotator.  
     
     
         9 . The method of  claim 1  further comprising shaping at least one of said first and second phase shifted resolved beams of said (e) into a rectangular cross sectional area.  
     
     
         10 . The method of  claim 1  where at least one of said first and second phase shifted resolved beams includes a rectangular cross sectional area.  
     
     
         11 . The method of  claim 1  where said (e) includes adjusting said second phase shifted resolved beam to a substantially uniform flux intensity relative to said first phase shifted resolved beam.  
     
     
         12 . A method of producing a substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity across the beam of electromagnetic energy, comprising: 
 (a) providing a first substantially collimated beam of electromagnetic energy;    (b) resolving from the first substantially collimated beam of electromagnetic energy a first substantially collimated resolved beam of electromagnetic energy having a first selected orientation of the electromagnetic wave field vector and a second substantially collimated resolved beam of electromagnetic energy having a second selected orientation of the electromagnetic wave field vector, whereby the first and second selected orientations of the electromagnetic wave field vector are different from each other;    (c) redirecting the second substantially collimated resolved beam to be parallel to the first substantially collimated resolved beam;    (d) intercepting the first substantially collimated resolved beam at a first location along the beam optical path and shifting the first selected orientation of the electromagnetic wave field vector by a first non-zero increment to produce a first phase shifted resolved beam;    (e) intercepting the second substantially collimated resolved beam at a second location along the beam optical path spaced apart from the first location and shifting the second selected orientation of the electromagnetic wave field vector by a second non-zero increment to produce a second phase shifted resolved beam having substantially the same selected orientation of the electromagnetic wave field vector as the first phase shifted resolved beam; and    (f) forming a second substantially collimated beam of electromagnetic energy based on said first and second phase shifted resolved beams, said second substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity substantially across the second substantially collimated beam of electromagnetic energy.    
     
     
         13 . A system for producing a substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity across the beam of electromagnetic energy, comprising: 
 (a) a first substantially collimated beam of electromagnetic energy;    (b) a beam splitter configured to resolve from the first substantially collimated beam of electromagnetic energy a first substantially collimated resolved beam of electromagnetic energy having a first selected orientation of the electromagnetic wave field vector and a second substantially collimated resolved beam of electromagnetic energy having a second selected orientation of the electromagnetic wave field vector, whereby the first and second selected orientations of the electromagnetic wave field vector are different from each other;    (c) a first electromagnetic wave vector orientation rotator configured to: 
 (1) intercept the first substantially collimated resolved beam at a first location along the beam optical path; and  
 (2) shift the first selected orientation of the electromagnetic wave field vector by a first non-zero increment to produce a first phase shifted resolved beam;  
   (d) a second electromagnetic wave vector orientation rotator configured to: 
 (1) intercept the second substantially collimated resolved beam at a second location along the beam optical path spaced apart from the first location; and  
 (2) shift the second selected orientation of the electromagnetic wave field vector by a second non-zero increment to produce a second phase shifted resolved beam having substantially the same selected orientation of the electromagnetic wave field vector as the first phase shifted resolved beam; and  
   (e) a reflector configured to redirect the second phase shifted resolved beam to be parallel to the first phase shifted resolved beam to form a second substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vectors and a substantially uniform flux intensity substantially across the second substantially collimated beam of electromagnetic energy.    
     
     
         14 . The system of  claim 13 , further comprising a beam shaper configured to shape said first substantially collimated beam of electromagnetic energy into a rectangular cross sectional area.  
     
     
         15 . The system of  claim 14  where said beam shaper includes a mirror.  
     
     
         16 . The system of  claim 14  where said beam shaper includes a reflector.  
     
     
         17 . The system of  claim 14  where said beam shaper includes at least one lens.  
     
     
         18 . The system of  claim 13  where said beam splitter includes an electromagnetic waves field vector splitting resolver.  
     
     
         19 . The system of  claim 13  where said beam splitter is further configured to adjust said second substantially collimated resolved beam of electromagnetic energy to a substantially uniform flux intensity relative to said first substantially collimated resolved beam of electromagnetic energy.  
     
     
         20 . The system of  claim 13  where said rotator of said (c) includes a passive liquid crystal device.  
     
     
         21 . The system of  claim 13  where said rotator of said (c) includes an active liquid crystal device.  
     
     
         22 . The system of  claim 13  where said rotator of said (c) includes a half-wave plate.  
     
     
         23 . The system of  claim 13  where said rotator of said (c) includes a quarter-wave plate.  
     
     
         24 . The system of  claim 13  where said rotator of said (c) includes a birefringent material.  
     
     
         25 . The system of  claim 13  where said rotator of said (c) includes a non-birefringent material.  
     
     
         26 . The system of  claim 13  where said rotator of said (c) includes a thin film material.  
     
     
         27 . The system of  claim 13  where said rotator of said (d) includes a passive liquid crystal device.  
     
     
         28 . The system of  claim 13  where said rotator of said (d) includes an active liquid crystal device.  
     
     
         29 . The system of  claim 13  where said rotator of said (d) includes a half-wave plate.  
     
     
         30 . The system of  claim 13  where said rotator of said (d) includes a quarter-wave plate.  
     
     
         31 . The system of  claim 13  where said rotator of said (d) includes a birefringent material.  
     
     
         32 . The system of  claim 13  where said rotator of said (d) includes a non-birefringent material.  
     
     
         33 . The system of  claim 13  where said rotator of said (d) includes a thin film material.  
     
     
         34 . The system of  claim 13  further comprising a beam shaper configured to shape at least one of said first and second phase shifted resolved beams of said (e) into a rectangular cross sectional area.  
     
     
         35 . The system of  claim 34  where said beam shaper includes a mirror.  
     
     
         36 . The system of  claim 34  where said beam shaper includes a reflector.  
     
     
         37 . The system of  claim 34  where said beam shaper includes at least one lens.  
     
     
         38 . The system of  claim 13  where said reflector is further configured to adjust said second phase shifted resolved beam to a substantially uniform flux intensity relative to said first phase shifted resolved beam.  
     
     
         39 . The system of  claim 13  where said reflector includes a mirror.  
     
     
         40 . The system of  claim 39  where said mirror is dichroic.  
     
     
         41 . The system of  claim 39  where said mirror includes a thin film material.  
     
     
         42 . The system of  claim 39  where said mirror includes a metal coating.  
     
     
         43 . A system for producing a substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity across the beam of electromagnetic energy, comprising: 
 (a) a first substantially collimated beam of electromagnetic energy;    (b) a beam splitter configured to resolve from the first substantially collimated beam of electromagnetic energy a first substantially collimated resolved beam of electromagnetic energy having a first selected orientation of the electromagnetic wave field vector and a second substantially collimated resolved beam of electromagnetic energy having a second selected orientation of the electromagnetic wave field vector, whereby the first and second selected orientations of the electromagnetic wave field vector are different from each other;    (c) a reflector configured to redirect the second substantially collimated resolved beam to be parallel to the first substantially collimated resolved beam;    (d) a first electromagnetic wave vector orientation rotator configured to: 
 (1) intercept the first substantially collimated resolved beam at a first location along the beam optical path; and  
 (2) shift the first selected orientation of the electromagnetic wave field vector by a first non-zero increment to produce a first phase shifted resolved beam;  
   (e) a second electromagnetic wave vector orientation rotator configured to: 
 (1) intercept the second substantially collimated resolved beam at a second location along the beam optical path spaced apart from the first location; and  
 (2) shift the second selected orientation of the electromagnetic wave field vector by a second non-zero increment to produce a second phase shifted resolved beam having substantially the same selected orientation of the electromagnetic wave field vector as the first phase shifted resolved beam; and  
 (3) whereby a second substantially collimated beam of electromagnetic energy comprising the first and second phase shifted resolved beams is formed, said second substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vectors and a substantially uniform flux intensity substantially across the second substantially collimated beam of electromagnetic energy.  
   
     
     
         44 . A system for producing a substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity across the beam of electromagnetic energy, comprising: 
 (a) a first substantially collimated beam of electromagnetic energy;    (b) means for resolving the first substantially collimated beam of electromagnetic energy to a first substantially collimated resolved beam of electromagnetic energy having a first selected orientation of the electromagnetic wave field vector and a second substantially collimated resolved beam of electromagnetic energy having a second selected orientation of the electromagnetic wave field vector, whereby the first and second selected orientations of the electromagnetic wave field vector are different from each other;    (c) means for intercepting the first substantially collimated resolved beam at a first location along the beam optical path;    (d) means for shifting the first selected orientation of the electromagnetic wave field vector by a first non-zero increment to produce a first phase shifted resolved beam;    (e) means for intercepting the second substantially collimated resolved beam at a second location along the beam optical path spaced apart from the first location;    (f) means for shifting the second selected orientation of the electromagnetic wave field vector by a second non-zero increment to produce a second phase shifted resolved beam having substantially the same selected orientation of the electromagnetic wave field vector as the first phase shifted resolved beam; and    (g) means for redirecting the second phase shifted resolved beam to be parallel to the first phase shifted resolved beam to form a second substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vectors and a substantially uniform flux intensity substantially across the second substantially collimated beam of electromagnetic energy.    
     
     
         45 . The system of  claim 44 , further comprising means for shaping said first substantially collimated beam of electromagnetic energy into a rectangular cross sectional area.  
     
     
         46 . The system of  claim 44  further comprising means for shaping at least one of said first and second phase shifted resolved beams of said (g) into a rectangular cross sectional area.  
     
     
         47 . The system of  claim 44  further comprising means for adjusting said second substantially collimated resolved beam of electromagnetic energy to a substantially uniform flux intensity relative to said first substantially collimated resolved beam of electromagnetic energy.  
     
     
         48 . The system of  claim 44  further comprising means for adjusting said second phase shifted resolved beam to a substantially uniform flux intensity relative to said first phase shifted resolved beam.  
     
     
         49 . The system of  claim 44  further comprising means for redirecting said first and second substantially collimated resolved beams to be parallel prior to being intercepted by said means in said (c) and (e). A system for producing a substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity across the beam of electromagnetic energy, comprising: 
 (a) a first substantially collimated beam of electromagnetic energy;  
 (b) means for resolving the first substantially collimated beam of electromagnetic energy to a first substantially collimated resolved beam of electromagnetic energy having a first selected orientation of the electromagnetic wave field vector and a second substantially collimated resolved beam of electromagnetic energy having a second selected orientation of the electromagnetic wave field vector, whereby the first and second selected orientations of the electromagnetic wave field vector are different from each other;  
 (c) redirecting the second substantially collimated resolved beam to be parallel to the first substantially collimated resolved beam;  
 (d) means for intercepting the first substantially collimated resolved beam at a first location along the beam optical path;  
 (e) means for shifting the first selected orientation of the electromagnetic wave field vector by a first non-zero increment to produce a first phase shifted resolved beam;  
 (f) means for intercepting the second substantially collimated resolved beam at a second location along the beam optical path spaced apart from the first location;  
 (g) means for shifting the second selected orientation of the electromagnetic wave field vector by a second non-zero increment to produce a second phase shifted resolved beam having substantially the same selected orientation of the electromagnetic wave field vector as the first phase shifted resolved beam; and  
 (i) means for forming a second substantially collimated beam of electromagnetic energy based on said first and second phase shifted resolved beams, said second substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vectors and a substantially uniform flux intensity substantially across the second substantially collimated beam of electromagnetic energy.  
 
     
     
         50 . A system for producing a substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vector and a substantially uniform flux intensity across the beam of electromagnetic energy, comprising: 
 (a) a first substantially collimated beam of electromagnetic energy;    (b) a beam splitter configured to resolve from the first substantially collimated beam of electromagnetic energy a first substantially collimated resolved beam of electromagnetic energy having a first selected orientation of the electromagnetic wave field vector and a second substantially collimated resolved beam of electromagnetic energy having a second selected orientation of the electromagnetic wave field vector, whereby the first and second selected orientations of the electromagnetic wave field vector are different from each other;    (c) a first electromagnetic wave vector orientation rotator configured to: 
 (1) intercept the first substantially collimated resolved beam at a first location along the beam optical path; and  
 (2) shift the first selected orientation of the electromagnetic wave field vector by a first non-zero increment to produce a first phase shifted resolved beam; and  
   (d) a second electromagnetic wave vector orientation rotator configured to: 
 (1) intercept the second substantially collimated resolved beam at a second location along the beam optical path spaced apart from the first location; and  
 (2) shift the second selected orientation of the electromagnetic wave field vector by a second non-zero increment to produce a second phase shifted resolved beam having substantially the same selected orientation of the electromagnetic wave field vector as the first phase shifted resolved beam; and  
 (3) redirect the second phase shifted resolved beam to be parallel to the first phase shifted resolved beam to form a second substantially collimated beam of electromagnetic energy having substantially the same selected orientation of electromagnetic wave field vectors and a substantially uniform flux intensity substantially across the second substantially collimated beam of electromagnetic energy.