Apparatus for the deposition of high dielectric constant films

Abstract

An integrated deposition system is described that is capable of vaporizing low vapor pressure liquid precursors and conveying the vapor to a processing region to fabricate advanced integrated circuits. The integrated deposition system includes a heated exhaust system, a remote plasma generator, a processing chamber, a liquid delivery system, and a computer control module that together create a commercially viable and production worthy system for depositing high capacity dielectric materials from low vapor pressure precursors.

We claim:  
     
         1 . An apparatus for depositing a film, said apparatus comprising: 
 a chamber assembly comprising a chamber body and a processing region;    a first vaporizer; and    a vapor delivery system connecting said first vaporizer and said processing region with a first vapor path of less than approximately three feet from said first vaporizer through said vapor delivery system to said processing region.    
     
     
         2 . The apparatus of  claim 1 , wherein said vapor delivery system further comprises: 
 a plurality of heated zones;    a heater in thermal contact with each said heated zone;    a thermocouple in thermal contact with each said heated zone; and    a plurality of temperature controllers, wherein each of said plurality of temperature controllers is in communication with a heater and thermocouple in a different one of said plurality of heated zones to maintain said heated zones at a first target temperature.    
     
     
         3 . The apparatus of  claim 1 , wherein said vapor delivery system further comprises: 
 a plurality of heated zones;    a heater in thermal contact with each said heated zone;    a thermocouple in thermal contact with each said heated zone; and    a plurality of temperature controllers, wherein each of said plurality of temperature controllers is in communication with a heater and thermocouple in a different one of said plurality of heated zones to maintain at least one of said heated zones at a first target temperature and another of said heated zones at a second target temperature.    
     
     
         4 . The apparatus of  claim 1 , wherein said chamber assembly further comprises a chamber lid and a sealing O-ring, and said chamber lid comprises: 
 a temperature controlled lid zone, with said temperature controlled lid zone in thermal contact with said sealing O-ring;    a passageway in thermal contact with said temperature controlled lid zone wherein a temperature controlled liquid is conveyed through said passageway to cool said temperature controlled lid zone; and    a heated lid zone in thermal contact with said processing region.    
     
     
         5 . The apparatus of  claim 1 , said vapor delivery system further comprising a first vapor three-way valve between said first vaporizer and said processing region, said first vapor three-way valve connecting said first vaporizer to said processing region or to an exhaust system.  
     
     
         6 . The apparatus of  claim 1 , further comprising a liquid delivery system comprising: 
 a first precursor container for holding a first precursor;    a solvent container for holding a solvent; and    a liquid three-way valve, said liquid delivery system connecting said first vaporizer to said liquid three-way valve and said liquid three-way valve connecting said vaporizer to said first precursor container or to said solvent container.    
     
     
         7 . The apparatus of  claim 6 , said liquid delivery system further comprising a liquid flow meter between said liquid three-way valve and said first vaporizer, and said vaporizer comprising a metering valve.  
     
     
         8 . The apparatus of  claim 7 , said liquid delivery system further comprising a positive shut off valve between said liquid flow meter and said first vaporizer.  
     
     
         9 . The apparatus of  claim 1 , said chamber assembly further comprising: 
 a chamber body;    a passageway in thermal contact with said chamber body;    a chamber body fluid thermocouple in thermal contact with a chamber body fluid within said passageway;    a chamber body fluid heater;    and a chamber body fluid temperature controller, wherein said chamber body fluid temperature controller communicates with said chamber body fluid thermocouple and regulates chamber body fluid heater to keep said chamber body fluid at a target chamber body temperature.    
     
     
         10 . The apparatus of  claim 9  wherein said chamber body fluid is heated.  
     
     
         11 . The apparatus of  claim 1 , said chamber assembly further comprising: 
 a cavity within said chamber body;    a chamber liner proportioned to conform to said cavity; and    a region comprising a gap between said chamber body and said chamber liner.    
     
     
         12 . The apparatus of  claim 11  wherein said gap is about 0.100 inches.  
     
     
         13 . The apparatus of  claim 1  further comprising: 
 a pedestal heater comprising a center region and an annular region about said center region;  
 at least one heater in thermal contact with said center and annular regions;  
 at least one thermocouple in thermal contact with said center region;  
 at least one temperature controller, wherein said heaters, thermocouples, and temperature controller cooperate to heat each of said center region and said annular region to a first support temperature, and wherein said temperature controller directs said heaters to heat to said annular region based on an amount said temperature controller directs said heaters to heat said center region.  
 
     
     
         14 . The apparatus of  claim 1  further comprising: 
 an enclosed volume within said chamber assembly;  
 a pedestal heater housed within said chamber assembly;  
 a seam between said pedestal heater and said chamber body whereby a gas can flow between said processing region and said enclosed volume; and  
 a gas inlet connected to said enclosed volume.  
 
     
     
         15 . The apparatus of  claim 14  wherein said pedestal heater partially defines both said processing region and said enclosed volume.  
     
     
         16 . The apparatus of  claim 1  further comprising a second vaporizer, wherein: 
 said vapor delivery system connects said second vaporizer and said processing region with a second vapor path of less than approximately three feet from said second vaporizer through said vapor delivery system to said processing region.  
 
     
     
         17 . The apparatus of  claim 16 , said vapor delivery system further comprising 
 a first vapor three-way valve between said first and second vaporizers and said processing region, said first vapor three-way valve connecting both said first and second vaporizers to said processing region or to an exhaust system.    
     
     
         18 . The apparatus of  claim 16 , said vapor delivery system further comprising: 
 a first vapor three-way valve between said first vaporizer and said processing region; and    a second vapor three-way valve between said second vaporizer and said processing region, wherein said first vapor three-way valve connects said first vaporizer to said processing region or to an exhaust system and said second vapor three-way valve connects said second vaporizer to said processing region or to said exhaust system.    
     
     
         19 . The apparatus of  claim 16 , further comprising a liquid delivery system comprising: 
 a first precursor container for holding a first precursor;    a second precursor container for holding a second precursor;    a solvent container for holding a solvent; and    a first liquid three-way valve and a second liquid three-way valve, and wherein said liquid delivery system connects: 
 said first vaporizer to said first liquid three-way valve;  
 said first liquid three-way valve to both said first precursor container and said solvent container;  
 said second vaporizer to said second liquid three-way valve; and  
 said second liquid three-way valve to both said second precursor container and said solvent container.  
   
     
     
         20 . The apparatus of  claim 1 , wherein: 
 said chamber assembly further comprises a chamber lid; and    said vapor delivery system further comprises a vapor delivery manifold wherein: 
 said vapor delivery manifold is mounted on said chamber lid;  
 said first vaporizer is mounted on said vapor delivery manifold; and  
 said vapor delivery manifold connects said first vaporizer to said processing region.  
   
     
     
         21 . The apparatus of  claim 20 , wherein said chamber lid is hingedly attached to said chamber body and partly defines said processing region.  
     
     
         22 . The apparatus of  claim 16 , wherein: 
 said chamber assembly further comprises a chamber lid; and    said vapor delivery system further comprises a vapor delivery manifold wherein: 
 said vapor delivery manifold is mounted on said chamber lid;  
 said first and second vaporizers are mounted on said vapor delivery manifold; and  
 said vapor delivery manifold connect said first and second vaporizers to said processing region.  
   
     
     
         23 . The apparatus of  claim 22  wherein said chamber lid is hingedly attached to said chamber body and partly defines said processing region.  
     
     
         24 . The apparatus of  claim 22 , said vapor delivery system further comprising a vapor three-way valve mounted on said vapor delivery manifold, wherein: 
 said vapor delivery manifold connects: 
 said first and second vaporizers to said vapor three-way valve; and  
 said vapor three-way valve to said processing region and to an exhaust system.  
   
     
     
         25 . The apparatus of  claim 22  further comprising a liquid delivery system comprising a first flexible double containment line, said first flexible double containment line comprising: 
 an outer tube comprising a first flexible section;  
 an inner tube comprising a second flexible section, wherein said inner tube passes through said outer tube to create an annular space, and wherein said second flexible section is primarily within said first flexible section; and  
 a plurality of annular plugs that are positioned to enclose said annular space to create an annular volume, said flexible double containment line positioned to flex to accommodate movement of said chamber lid.  
 
     
     
         26 . The apparatus of  claim 25  wherein a gas fills said annular volume and creates a pressure within said annular volume.  
     
     
         27 . The apparatus of  claim 25 , wherein at least one said annular plugs comprises a weld.  
     
     
         28 . The apparatus of  claim 26 , further comprising: 
 a processing system, said processing system comprising at least one valve and at least one heater;    a pressure monitor in communication with said annular volume;    a hardware interlock; and    a software control module comprising software that monitors said pressure monitor, wherein said hardware interlock de-energizes said at least one valve, said at least one heater, and said chamber assembly when said software detects a pressure change in said annular volume.    
     
     
         29 . The apparatus of  claim 25 , said liquid delivery system further comprising: 
 a first precursor container for holding a first precursor;    a second precursor container for holding a second precursor;    a solvent container for holding a solvent;    a second flexible double containment line similar to said first double containment line;    a third flexible double containment line similar to said first double containment line;    a first liquid three-way valve; and    a second liquid three-way valve, wherein said liquid delivery system connects: 
 said first vaporizer to said first liquid three-way valve;  
 said first liquid three-way valve to said first precursor container using said first flexible double containment line and to said solvent container using said second double containment line;  
 said second vaporizer to said second liquid three-way valve; and  
 said second liquid three-way valve to said second precursor container using said third flexible double containment line and to said solvent container using said second double containment line.  
   
     
     
         30 . The apparatus of  claim 22 , said vapor delivery manifold further comprising: 
 a vapor conduit;    a process gas conduit; and    a mixing conduit, wherein said vapor conduit and said process gas conduit intersect said mixing gas conduit at a first intersection such that a vapor exiting said vapor conduit is directed towards a process gas as said process gas exits said process gas conduit and said process gas is directed towards said vapor as said vapor exits said vapor conduit.    
     
     
         31 . The apparatus of  claim 1  further comprising a tunable exhaust system, said tunable exhaust system comprising: 
 a slotted housing comprising first and second slotted housing wall regions, each with a plurality of ventilation slots;  
 a plurality of slotted plates, each slidably attached to a corresponding area of said first or second slotted housing wall regions whereby sliding each said slotted plate in an opening direction uncovers said ventilation slots in said corresponding area and sliding each said slotted plate against said slotted housing wall region in a closing direction covers said ventilation slots in said corresponding area;  
 an exhaust cover overlaying said first slotted wall region to create an enclosed volume; and  
 an exhaust port in said exhaust cover for attaching to an exhaust line.  
 
     
     
         32 . The apparatus of  claim 31  wherein said slotted housing comprises a pair of parallel walls and said first slotted housing wall region is on one said parallel wall and said second slotted housing wall region is on the other of said parallel walls.  
     
     
         33 . The apparatus of  claim 31  wherein said slotted housing comprises a pair of perpendicular walls and said first slotted housing wall region is on one said perpendicular wall and said second slotted housing wall region is on the other of said perpendicular walls.  
     
     
         34 . The apparatus of  claim 31  wherein said slotted housing houses a liquid delivery system.  
     
     
         35 . The apparatus of  claim 31  wherein said slotted housing houses a vapor delivery system.  
     
     
         36 . The apparatus of  claim 1  further comprising a lift mechanism, said lift mechanism comprising: 
 a pedestal heater with an upper surface and a plurality of holes spaced about said heater and oriented perpendicularly to said upper surface;  
 a lift plate;  
 a lift tube supporting said lift plate;  
 a plurality of lift pins dimensioned to move within said plurality of holes, extend through said pedestal heater, and contact said lift tube;  
 a shaft supporting said pedestal heater;  
 a lower carrier supporting said shaft;  
 an upper carrier supporting said lift tube; and  
 an upper retainer, wherein: 
 said lower carrier and said shaft cooperate to raise and lower said pedestal heater to an upper position, a lower position, and an intermediate position;  
 said lift pins move, between a raised position above said upper surface of said pedestal heater and a lowered position even with or below said upper surface, as a result of relative movement between said pedestal heater and said lift plate;  
 said upper carrier: 
 rests against said upper retainer during movement by said lower carrier between said upper and intermediate positions so that there is a relative movement between said upper and lower carriers; and  
 moves in unison with said lower carrier during movement by said lower carrier between said intermediate and lower positions; and  
 
 said lift plate contacts said lift pins so that said relative movement causes said lift pins to move between said extended and said retracted positions.  
 
 
     
     
         37 . The apparatus of  claim 36  wherein there are four lift pins evenly spaced about said pedestal heater.  
     
     
         38 . The apparatus of  claim 36 , further comprising: 
 a motor;    a lead screw drive shaft; and    a nut, wherein said lower carrier is raised and lowered by said motor coupled to said lead screw drive shaft and said nut.    
     
     
         39 . The apparatus of  claim 36 , further comprising a lift housing wherein: 
 said upper and lower carriers are supported by said lift housing;    said lift housing attaches to said chamber assembly through a lift leveling plate; and    said lift leveling plate adjusts to align said lift mechanism with said chamber assembly.    
     
     
         40 . The apparatus of  claim 1  further comprising an interlock.  
     
     
         41 . The apparatus of  claim 40 , wherein: 
 said apparatus further comprises at least one switch connecting said apparatus to a power supply;    said at least one switch has an on and an off position; and    said interlock moves said at least one switch to said off position when said interlock is activated by a trip cause.    
     
     
         42 . The apparatus of  claim 40 , wherein: 
 said apparatus further comprises at least one valve with an on and an off position; and    said interlock turns at least one said valve to said off position when said interlock is activated by a trip cause.    
     
     
         43 . The apparatus of  claim 42  further comprising a chamber lid that closes upon said chamber body, wherein said interlock comprises a lid position detector and said trip cause comprises said lid position detector detecting that said chamber lid is open.  
     
     
         44 . The apparatus of  claim 41  wherein said interlock comprises a spill detector and wherein said trip cause comprises said spill detector detecting a liquid spill.  
     
     
         45 . The apparatus of  claim 42  wherein said interlock comprises a spill detector and wherein said trip cause comprises said spill detector detecting a liquid spill.  
     
     
         46 . The apparatus of  claim 40 , further comprising a processing system, said processing system comprising at least one valve and at least one heater and said interlock comprises: 
 a software control module;    software; and    a pressure monitor, wherein said software control module de-energizes said at least one valve, said at least one heater, and said chamber assembly when said software receives a signal from said pressure monitor that said system pressure is too high.    
     
     
         47 . The apparatus of  claim 20 , further comprising: 
 A flexible double containment line, said containment line comprising: 
 an outer tube comprising a first flexible section;  
 an inner tube comprising a second flexible section, wherein said inner tube passes through said outer tube to create an annular space, and wherein said second flexible section is primarily within said first flexible section;  
 a plurality of annular plugs that are positioned to enclose that portion of said annular space that lies between said first and second flexible sections to create an annular volume; and  
 a gas, wherein said gas fills said annular volume and creates a pressure within said annular volume.  
   
     
     
         48 . The apparatus of  claim 47  further comprising an interlock, and said containment line further comprising a pressure transducer monitoring said pressure, wherein: 
 said containment line permits a liquid to flow from said container to said vapor delivery system; and  
 said interlock communicates with said pressure transducer and when said pressure drops below a target level said interlock stops said liquid from flowing from said container to said containment line.  
 
     
     
         49 . A flexible double containment line apparatus comprising: 
 an outer tube comprising a first flexible section;    an inner tube comprising a second flexible section, wherein said inner tube passes through said outer tube to create an annular space, and wherein said second flexible section is primarily within said first flexible section;    a plurality of annular plugs that are positioned to enclose that portion of said annular space that lies between said first and second flexible sections to create an annular volume; and    a gas, wherein said gas fills said annular volume and creates a pressure within said annular volume.    
     
     
         50 . An apparatus for depositing a film, said apparatus comprising: 
 a chamber assembly comprising a chamber body, a chamber lid, and a processing region;    a first vaporizer;    a vapor delivery system connecting said first vaporizer to said processing region, said vapor delivery system comprising: 
 a vapor delivery manifold wherein: 
 said vapor delivery manifold is mounted on said chamber lid;  
 said first vaporizer is mounted on said vapor delivery manifold; and  
 said vapor delivery manifold connects said first vaporizer to said processing region.  
 
   
     
     
         51 . An apparatus for depositing a film, said apparatus comprising: 
 a chamber assembly-comprising a chamber body, a chamber lid, and a processing region;    a first vaporizer;    a vapor delivery system connecting said first vaporizer to said processing region, said vapor delivery system comprising: 
 a vapor delivery manifold wherein: 
 said vapor delivery manifold is mounted on said chamber lid;  
 said first vaporizer is mounted on said vapor delivery manifold; and  
 said vapor delivery manifold connects said first vaporizer to said processing region;  
 
 a plurality of heated zones;  
 a heater in thermal contact with each said heated zone;  
 a thermocouple in thermal contact with each said heated zone; and  
 a plurality of temperature controllers, wherein each of said plurality of temperature controllers is in communication with a heater and thermocouple in a different one of said plurality of heated zones to independently maintain each said heated zone at a target temperature.  
   
     
     
         52 . The apparatus of  claim 51  wherein said plurality of heated zones is six.  
     
     
         53 . The apparatus of  claim 16 , further comprising: 
 a first metering valve for metering a first flow rate to said first vaporizer;    a second metering valve for metering a second flow rate to said second vaporizer;    a first vaporizer temperature controller for controlling a first vaporization temperature of said first vaporizer; and    a second vaporizer temperature controller for controlling a second vaporization temperature of said second vaporizer, wherein: 
 said first flow rate may be different from said second flow rate; and  
 said first vaporization temperature may be different from said second vaporization temperature.  
   
     
     
         54 . The apparatus of  claim 1 , further comprising a remote plasma generator for introducing an activated species into said processing region.  
     
     
         55 . The apparatus of  claim 6 , further comprising a mainframe, and wherein said liquid delivery system further comprises: 
 a liquid delivery system housing located on said mainframe;    a plurality of precursor supply lines; and    at least one solvent supply line, wherein: 
 said liquid delivery system housing is dimensioned to contain a plurality of bulk storage containers and at least one bulk solvent container while said bulk storage containers are connected to said precursor supply lines and said bulk solvent bulk container is connected to said at least one solvent supply line.  
   
     
     
         56 . The apparatus of  claim 55  wherein said plurality of bulk storage containers is four and said liquid delivery system housing is within ten feet of said chamber assembly.  
     
     
         57 . The apparatus of  claim 1 , further comprising: 
 an enclosure for housing said vaporizer;    a spill detector within said enclosure;    a heated zone within said enclosure; and    an interlock, wherein: 
 said interlock is in communication with said spill detector and said interlock de-energizes said heated zone when said spill detector detects a spill.