Method for manufacturing solder mask of printed circuit board

Abstract

A solder mask manufacturing method adapted to apply a solder mask on a surface of a substrate of a circuit board, said surface is provided with a conductor pattern having an unsheltered portion and a sheltered portion which is covered by said solder mask. The method comprises the steps of: a) disposing a layer of semi-solid solder mask material having an expansion coefficient substantially the same as that of the substrate on the surface of said substrate to cover said copper conductor pattern, and a metal foil covering the material layer; b) applying pressure to the metal foil and applying baking treatment to cure the solder mask material in to solid; c) utilizing chemical solution and plasma etching to remove the metal foil and the solid solder mask material above the unsheltered portion of said copper conductor pattern respectively such that the unsheltered portion can be exposed; and d) using chemical solution to remove the residual metal foil.

What is claimed is:  
     
         1 . A solder mask manufacturing method of a printed circuit board adapted to apply a solder mask on a surface of a substrate of the printed circuit board, wherein the surface of the substrate is provided with a conductor pattern having an unsheltered portion and a sheltered portion being covered by said solder mask, the manufacturing method comprising the following steps: 
 (a) coating a layer of semi-solid solder mask material, which is pre-coated on one side of a metal foil, on the surface of the substrate such that the sheltered and unsheltered portions of said conductor pattern are covered by said solder mask material layer, said solder mask material having a thermal expansion coefficient substantially identical to that of the substrate of said printed circuit board;    (b) pressing said metal foil and curing said semi-solid solder mask material layer into solid such that said solder mask material layer firmly covers the surface of the substrate;    (c) covering a photo-resist layer on the other side of the metal foil;    (d) photoimaging positions of the photo-resist layer;    (e) removing the photo-resist layer and the metal foil corresponding in location above the unsheltered portion of said conductor pattern for exposing the solder mask material layer above the unsheltered portion of said conductor pattern to outside;    (f) removing the residual photo-resist layer;    (g) removing the solder mask material layer above the unsheltered portion of said conductor pattern such that said unsheltered portion can be exposed outside;    (h) removing the residual metal foil.    
     
     
         2 . The manufacturing method as defined in  claim 1 , wherein the substrate of said printed circuit board is made of a material containing a resin, and said semi-solid solder mask material in the step (a) is made of a material containing a resin which is substantially identical to the resin of the substrate.  
     
     
         3 . The manufacturing method as defined in  claim 2 , wherein the resin contained in the substrate of said printed circuit board is epoxy resin.  
     
     
         4 . The manufacturing method as claimed in  claim 1 , wherein the thickness of the metal foil is between 20 m˜40 m.  
     
     
         5 . The manufacturing method as claimed in  claim 1 , wherein the pre-coated semi-solid solder mask material has a thickness of about 30 m ˜100 m in the step (a).  
     
     
         6 . The manufacturing method as claimed in  claim 1 , wherein the pressure applied on the metal foil in the step (b) is between 10˜40 kgw/cm 2 .  
     
     
         7 . The manufacturing method as defined in  claim 1 , wherein the metal foil is removed by chemical solution etching in the step (e).  
     
     
         8 . The manufacturing method as defined in  claim 7 , wherein the chemical solution used to remove the metal foil in the step (e) is ferric chloride (FeCl 3 ) solution.  
     
     
         9 . The manufacturing method as defined in  claim 1 , wherein the residual photo-resist is remove by using sodium hydroxide (NaOH) solution in the step (f).  
     
     
         10 . The manufacturing method as defined in  claim 1 , wherein the solder mask material layer above the unsheltered portion of said conductor pattern is removed by plasma etching in the step (g).  
     
     
         11 . The manufacturing method as defined in  claim 1 , wherein the residual metal foil is removed by chemical solution etching in the step (h).  
     
     
         12 . The manufacturing method as defined in  claim 11 , wherein the chemical solution used to remove the residual metal foil is phosphoric acid (H 3 PO 4 ) solution.  
     
     
         13 . The manufacturing method as defined in  claim 11 , wherein the chemical solution used to remove the residual metal foil is hydrochloric acid (HCl) solution.