Ultra fine particle film forming apparatus

Abstract

To provide a film forming method, a film forming apparatus and a manufacturing method of ultrafine particle films, implementing an efficient and proper film thickness control. The manufacturing method of ultrafine particle films includes the steps of: guiding metal ultrafine particles generated in an ultrafine particle generation chamber together with a carrier gas through a conveying pipe to the film forming chamber; and forming a film on a substrate installed over a stage in the film forming chamber through a nozzle, and the evaporated amount of said evaporation material or the thickness of a formed film is controlled by using either the intensity of the emission spectrum intrinsic to an evaporation material or that of the emission spectrum intrinsic to the carrier gas, or else by using both of these.

What is claimed is:  
     
         1 . A manufacturing method of ultrafine particle films, comprising the steps of: 
 guiding metal ultrafine particles generated in an ultrafine particle generation chamber together with a carrier gas through a conveying pipe to a film forming chamber; and    forming a film on a substrate installed over a stage in the film forming chamber through a nozzle,    wherein the evaporated amount of said evaporation material or the thickness of a formed film is controlled by using either the intensity of the emission spectrum intrinsic to an evaporation material or that of the emission spectrum intrinsic to the carrier gas, or else by using both of these.    
     
     
         2 . The manufacturing method of ultrafine particle films as set forth in  claim 1 , 
 wherein either the gap between the evaporation material and an electrode or a current value, or both of these are controlled so that the emission spectral intensity intrinsic to said evaporation material remains constant during the film forming.    
     
     
         3 . The manufacturing method of ultrafine particle films as set forth in  claim 1  or  2 , 
 wherein said evaporation material is melted by arc heating to manufacture an ultrafine particle film.  
 
     
     
         4 . A film forming method, comprising the steps of: 
 evaporating a source material;    bringing a gas different from said source material into contact with said evaporated source material to granulate said evaporated source material; and    conveying the grains together with said gas and colliding them onto a substrate to form a film on the substrate,    wherein the gasified amount of said evaporation material or the thickness of a film formed on said substrate is controlled on the basis of the emission spectral intensity intrinsic to an evaporation material generated in gasifying said source gas and/or and the one intrinsic to said carrier gas.    
     
     
         5 . A film forming apparatus, comprising: 
 means for gasifying a source material;    means for ejecting a gas different from said source material so as to coming into contact with said evaporated source material to granulate said evaporated source material;    means for conveying the grains together with said gas to collide them onto a substrate, and    means for controlling the position of said substrate,    wherein spectrum detection means for detecting the emission spectra of said gasified source material and means for controlling the gasifying conditions of said source material to form said grains on the basis of the detected value of said spectrum detection means are provided.