US2003053265A1PendingUtilityA1

Thin film magnetic head, magnetic head device, magnetic recording/reproducing device and method for fabricating a thin film magnetic head

Assignee: TDK CORPPriority: Jul 24, 2001Filed: Jul 10, 2002Published: Mar 20, 2003
Est. expiryJul 24, 2021(expired)· nominal 20-yr term from priority
G11B 5/3967Y10T29/49046G11B 5/3932G11B 5/3903
44
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Claims

Abstract

A magnetoresistive effective film responds commensurate with an external magnetic field. Magnetic domain-controlling films apply a perpendicular biasing magnetic field to the magnetoresistive effective film. The forefronts of first electrode films constituting a pair of electrode films are overlaid on the magnetoresistive effective film, and the forefront surfaces of the first electrode films are risen at an inner angle of θ1. Second electrode films are overlaid on the first electrode films, and the forefront surfaces of the second electrode films are risen at an inner angle of θ2 smaller than the inner angle θ1.

Claims

exact text as granted — not AI-modified
What is claimed is:  
     
         1 . A thin film magnetic head comprising a reading element including a magnetoresistive effective film to respond commensurate with an external magnetic head, a pair of magnetic domain-controlling films to apply a perpendicular biasing magnetic field to said magnetoresistive effective film and a pair of electrode films, each composed of a first electrode film and a second electrode film, 
 a forefront of said first electrode film being overlaid on said magnetoresistive effective film,    a forefront surface of said first electrode film being risen at an inner angle of θ1,    said second electrode film being formed on said first electrode film,    a forefront surface of said second electrode film being risen at an inner angle θ2 smaller than said inner angle θ1.    
     
     
         2 . A thin film magnetic head as defined in  claim 1 , wherein said forefront surface of said second electrode film is discontinued from said forefront surface of said first electrode film so that said forefront surfaces of said second electrode film and said first electrode film shape kinked line.  
     
     
         3 . A thin film magnetic head as defined in  claim 1 , wherein said inner angle θ1 is set within 40-90 degrees.  
     
     
         4 . A thin film magnetic head as defined in  claim 1 , wherein said inner angle θ2 is set to 45 degrees or below.  
     
     
         5 . A thin film magnetic head as defined in  claim 1 , wherein the thickness of said first electrode film is set smaller than the thickness of said second electrode film.  
     
     
         6 . A thin film magnetic head as defined in  claim 5 , wherein the thickness of said first electrode film is set within 5-20 nm.  
     
     
         7 . A thin film magnetic head as defined in  claim 5 , wherein the thickness of said second electrode film is set within 10-50 nm.  
     
     
         8 . A thin film magnetic head as defined in  claim 1 , wherein said first and said second electrode films are mainly made of Au.  
     
     
         9 . A thin film magnetic head as defined in  claim 1 , wherein said reading element further includes a hard film on said second electrode film.  
     
     
         10 . A thin film magnetic head as defined in  claim 9 , wherein said hard film is made of at least one selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Ru, Rh, Ir, Pd, Cu, Si and Al.  
     
     
         11 . A thin film magnetic head as defined in  claim 9 , wherein the thickness of said hard film is set within 1-50 nm.  
     
     
         12 . A thin film magnetic head as defined in  claim 9 , wherein said reading element further includes an oxide film formed on said hard film.  
     
     
         13 . A thin film magnetic head as defined in  claim 12 , wherein said oxide film is made of at least one selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Ru, Rh, Ir, Pd, Cu, Si and Al.  
     
     
         14 . A thin film magnetic head as defined in  claim 12 , wherein the thickness of the oxide film is set within 1-10 nm.  
     
     
         15 . A thin film magnetic head as defined in  claim 1 , further comprising a slider to support said reading element.  
     
     
         16 . A thin film magnetic head as defined in  claim 1 , further comprising a writing element made of an inductive type magnetic conversion element.  
     
     
         17 . A magnetic head device comprising a thin film magnetic head as defined in  claim 1  and a head supporting device to support said thin film magnetic head.  
     
     
         18 . A magnetic recording/reproducing drive device comprising a magnetic head device as defined in  claim 17  and a magnetic disk to be magnetically recorded and reproduced with said magnetic head device.  
     
     
         19 . A method for fabricating a thin film magnetic head comprising a reading element including a magnetoresistive effective film to respond commensurate with an external magnetic head, a pair of magnetic domain-controlling films to apply a perpendicular biasing magnetic field to said magnetoresistive effective film and a pair of electrode films, each composed of a first electrode film and a second electrode film, a forefront of said first electrode film being overlaid on said magnetoresistive effective film, a forefront surface of said first electrode film being risen at an inner angle of θ1, said second electrode film being formed on said first electrode film, a forefront surface of said second electrode film being risen at an inner angle θ2 smaller than said inner angle θ1, comprising the steps of: 
 forming said magnetoresistive effective film and said magnetic domain-controlling films,  
 forming a first conductive film to be processed to said first electrode film on said magnetoresistive effective film and said magnetic domain-controlling films,  
 forming a resist mask for lift off on said first conductive film and above said magnetoresistive effective film,  
 forming said second electrode film on said first conductive film via said resist mask by means of sputtering,  
 removing said resist mask and etching said first conductive film by means of reactive ion etching using said second electrode film as a mask, to form said first electrode film, thereby to complete said reading element.  
 
     
     
         20 . A fabricating method as defined in  claim 19 , wherein said forefront surface of said second electrode film is discontinued from said forefront surface of said first electrode film so that said forefront surfaces of said second electrode film and said first electrode film shape kinked line.  
     
     
         21 . A fabricating method as defined in  claim 19 , wherein said inner angle θ1 is set within 40-90 degrees.  
     
     
         22 . A fabricating method as defined in  claim 19 , wherein said inner angle θ2 is set to 45 degrees or below.  
     
     
         23 . A fabricating method as defined in  claim 19 , wherein the thickness of said first electrode film is set smaller than the thickness of said second electrode film.  
     
     
         24 . A fabricating method as defined in  claim 23 , wherein the thickness of said first electrode film is set within 5-20 nm.  
     
     
         25 . A fabricating method as defined in  claim 23 , wherein the thickness of said second electrode film is set within 10-50 nm.

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