Apparatus for fluid control with a substrate processing tank

Abstract

An improved method and apparatus for adjusting chemistry concentrations and temperatures within a substrate processing tank is provided. A first aspect may include checking the fluid level within the tank, and, if the level is higher than a predetermined upper level, bleeding an amount of fluid from the tank; if the level is lower than a predetermined lower level, flowing an amount of fluid to the tank, and if the level is between the predetermined upper and lower levels, bleeding an amount of fluid from the tank and flowing an amount of fluid to the tank. A second aspect may include flowing water into the tank at a flow rate at least equivalent to the flow rate of water required to achieve a chemistry spike of a predetermined concentration and volume prior to beginning the flow of chemicals. A third aspect may include a method and apparatus for heating or cooling chemistry to a predetermined temperature as the chemistry is recirculated.

The invention claimed is:  
     
         1 . An apparatus for controlling fluid flow to a semiconductor processing tank, the apparatus comprising: 
 a tank;    a fluid recirculation loop adapted to bleed fluid from the tank, to filter the fluid and to return the fluid to the tank; and    a thermo couple coupled to the fluid recirculation loop so as to heat or cool the fluid to a predetermined temperature.    
     
     
         2 . The apparatus of  claim 1  wherein the tank comprises a substrate support adapted to support a semiconductor substrate; and 
 a transducer adapted to direct acoustic energy through fluid contained in the tank, to the surface of a semiconductor substrate supported by the substrate support.