Manufacturing method of spacer for electron-beam apparatus and manufacturing method of electron-beam apparatus

Abstract

There is herein disclosed a manufacturing method of a spacer for an electron-beam apparatus which comprises an airtight container, and an electron source. The spacer is arranged in the airtight container. The method comprises the step of heating and drawing a base material of the spacer to form a desired rough state on the surface of the base material, the step of heating and drawing the base material of the spacer to form the desired rough state and an electroconductive film on the surface of the base material, or the step of heating and drawing the base material of the spacer having the rough state on its surface. According to the present invention, the spacer having a surface structure on which can suppress charging can be manufactured at a low cost, and an electron-beam apparatus such as an image-forming apparatus having a sufficient display luminance can also be manufactured.

What is claimed is:  
     
         1 . A manufacturing method of a spacer for an electron-beam apparatus which comprises an airtight container, and an electron source and the spacer arranged in the airtight container, said method comprising the step of heating and drawing a base material of the spacer to form a desired rough state on the surface of the base material.  
     
     
         2 . The manufacturing method of the spacer for the electron-beam apparatus according to  claim 1  which further has the step of forming an electroconductive film on the surface of the base member of the spacer formed by the heating and drawing step.  
     
     
         3 . A manufacturing method of a spacer for an electron-beam apparatus which comprises an airtight container, and an electron source and the spacer arranged in the airtight container, said method comprising the step of heating and drawing a base material of the spacer to form a desired rough state and an electroconductive film on the surface of the base material.  
     
     
         4 . A manufacturing method of a spacer for an electron-beam apparatus which comprises an airtight container, and an electron source and the spacer arranged in the airtight container, said method comprising the step of heating and drawing a base material of the spacer having a rough state on its surface.  
     
     
         5 . The manufacturing method of the spacer for the electron-beam apparatus according to  claim 4  which further has the step of forming an electroconductive film on the surface of a base member of the spacer formed by the heating and drawing step.  
     
     
         6 . The manufacturing method of the spacer for the electron-beam apparatus according to  claim 4 , wherein an electroconductive film is formed on the surface of the base material in the heating and drawing step.  
     
     
         7 . A manufacturing method of a spacer for an electron-beam apparatus which comprises an airtight container, and an electron source and the spacer arranged in the airtight container, said method comprising the steps of forming a rough state on the surface of a base material of the spacer, and then heating and drawing the base material on which the rough state is formed.  
     
     
         8 . The manufacturing method of the spacer for the electron-beam apparatus according to  claim 7  which further has the step of forming an electroconductive film on the surface of the base member of the spacer formed by the rough state formation step and the heating and drawing step.  
     
     
         9 . The manufacturing method of the spacer of the electron-beam apparatus according to  claim 7 , wherein the electroconductive film is formed on the surface of the base material in the heating and drawing step.  
     
     
         10 . The manufacturing method of the spacer for the electron-beam apparatus according to any one of  claims 1  to  9 , wherein the electron-beam apparatus is an image-forming apparatus comprising an airtight container, an electron source arranged in the airtight container, an image-forming member which forms an image by the irradiation of an electron from the electron source, and a spacer.  
     
     
         11 . A manufacturing method of an electron-beam apparatus which comprises an airtight container, and an electron source and the space arranged in the airtight container, wherein the spacer is manufactured by the method described in any one of  claims 1  to  9 .  
     
     
         12 . The manufacturing method of the electron-beam apparatus according to  claim 11 , wherein the electron-beam apparatus is an image-forming apparatus comprising an airtight container, an electron source arranged in the airtight container, an image-forming member which forms an image by the irradiation of an electron from the electron source, and a spacer.