US2002182768A1PendingUtilityA1

Current isolating epitaxial buffer layers for high voltage photodiode array

Priority: Dec 9, 1999Filed: Jul 22, 2002Published: Dec 5, 2002
Est. expiryDec 9, 2019(expired)· nominal 20-yr term from priority
H10F 39/807H10F 30/2215H10F 39/18
38
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Claims

Abstract

An array of photodiodes in series on a common semi-insulating substrate has a non-conductive buffer layer between the photodiodes and the semi-insulating substrate. The buffer layer reduces current injection leakage between the photodiodes of the array and allows optical energy to be converted to high voltage electrical energy.

Claims

exact text as granted — not AI-modified
We claim:  
     
         1 . A method for fabricating an array of photodiodes on a semi-insulating substrate; said method comprising: 
 growing a non-conductive, buffer layer on a semi-insulating substrate; and    growing a photodiode structure comprising semiconductor layers on said non-conductive layer.    
     
     
         2 . The method of  claim 1  wherein said semi-insulating substrate and said semiconductor layers comprise a single crystal, direct bandgap semiconductor.  
     
     
         3 . The method of  claim 1  wherein said growing comprises epitaxially growing said buffer layer and/or semiconductor layers on said semi-insulating substrate.  
     
     
         4 . The method of  claim 1  further comprising etching said semiconductor layers to expose said non-conductive, buffer layer or said semi-insulating substrate between said diodes to electrically isolate said photodiodes.  
     
     
         5 . The method of  claim 1  wherein said nonconductor buffer layer is prepared by a low temperature growth method (LTB).  
     
     
         6 . The method of  claim 1  wherein said nonconductor buffer layer is selected from a buffer semiconductor material having a bandgap greater than a bandgap of a semiconductor material of said semi-insulating substrate and greater than a bandgap of said semiconductor layer of said photodiode structure that is in contact with said buffer semiconductor material.  
     
     
         7 . A system for converting optical energy to high voltage electrical energy, said system comprising: 
 a source of optical energy;    means for transmitting said optical energy to an array of independent photovoltaic cells interconnected in series on a surface of a semi-insulating substrate, said cells comprising at least one layer of single crystal semiconductor, and    wherein said independent photovoltaic cells are separated from said semi-insulating substrate by at least one non-conductive buffer layer between a plurality of said photovoltaic cells and said semi-insulating substrate.    
     
     
         8 . The system of  claim 7  wherein said source of optical energy comprises a laser.  
     
     
         9 . The system of  claim 8  wherein said means for transmitting said optical energy comprises a fiber optic.  
     
     
         10 . The system of  claim 9  wherein an optical homogenizer is located between said fiber optic and said array to produce a uniform laser beam profile for illuminence onto said array.  
     
     
         11 . The system of  claim 7  wherein said source of optical energy comprises solar radiation.  
     
     
         12 . The system of  claim 7  wherein said non-conductive buffer layer comprises insulator or semiconductor material not allowing current injection between said substrate and said photodiode during illuminence of said optical energy onto said array.  
     
     
         13 . The system of  claim 7  wherein said non-conductive buffer layer has a resistivity of greater than 1e9 ohm-cm.

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