US2002176933A1PendingUtilityA1
Paste for transparent insulating film, plasma display panel, method of manufacturing paste, method of manufacturing transparent insulating film, and method of manufacturing plasma display panel
Priority: Dec 5, 2000Filed: Dec 5, 2001Published: Nov 28, 2002
Est. expiryDec 5, 2020(expired)· nominal 20-yr term from priority
C03C 8/16C03C 8/02H01J 2211/38
34
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
Paste for a transparent insulating film of a plasma display panel, the paste including powder glass contains lead oxide, silicon oxide, boron oxide, barium oxide, and aluminum oxide, solvent, and resin.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . Paste for a transparent insulating film of a plasma display panel, said paste including powder glass, which contains lead oxide, silicon oxide, boron oxide, bariumoxide, and aluminum oxide, solvent, and resin.
2 . The paste for a transparent insulating film according to claim 1 , wherein said powder glass has a composition of boron oxide in 20 to 30 wt %, barium oxide in 15 to 20 wt %, and aluminum oxide in 3 to 6 wt %.
3 . The paste for a transparent insulating film according to claim 1 , wherein said powder glass contains copper oxide.
4 . Paste for a transparent insulating film of a plasma display panel, said paste including powder glass, which contains bismuth oxide, silicon oxide, boron oxide, barium oxide, and aluminum oxide, solvent, and resin.
5 . The paste for a transparent insulating film according to claim 4 , wherein said powder glass contains zinc oxide.
6 . The paste for a transparent insulating film according to claim 4 or 5 , wherein said powder glass has a composition of boron oxide in 20 to 30 wt %, barium oxide in 15 to 20 wt %, and aluminum oxide in 3 to 6 wt %.
7 . The paste for a transparent insulating film according to claim 4 , wherein said powder glass contains copper oxide.
8 . A plasma display panel, comprising:
a glass substrate; an electrode pattern formed on said glass substrate; and a transparent insulating film applied on said electrode pattern, wherein said transparent insulating film is formed using the paste for a transparent insulating film according to claim 1 .
9 . A plasma display panel, comprising:
a glass substrate; an electrode pattern formed on said glass substrate; and a transparent insulating film applied on said electrode pattern, wherein said transparent insulating film is formed using the paste for a transparent insulating film according to claim 4 .
10 . A method of manufacturing paste, comprising the steps of: storing powder glass, solvent, and resin in a storage section; and
rotating a plate at a peripheral speed of 40 m/s or more, said plate being disposed in said storage section so as to be substantially in parallel with or inclined to a bottom of said storage section.
11 . The method of manufacturing paste according to claim 10 , wherein said powder glass has a dispersed particle size such that D10 is 0.4 to 0.6 μm, D50 is 0.8 to 1.2 μm, and D90 is 1.4 to 1.8 μm.
12 . The method of manufacturing paste according to claim 20 , wherein said powder glass has a dispersed particle size such that D10 is 0.2 to 0.8 μm, D50 is 1.0 to 2.0 μm, and D90 is 2.5 to 4.0 μm.
13 . A method of manufacturing paste, comprising the steps of:
storing powder glass, solvent, and resin in a sand mill storage section; and operating a sand mill disposed in said sand mill storage section at a peripheral speed of 10 m/s or less.
14 . The method of manufacturing paste according to claim 13 , wherein said powder glass has a dispersed particle size such that D10 is 0.4 to 0.6 μm, D50 is 0.8 to 1.2 μm, and D90 is 1.4 to 1.8 μm.
15 . A method of manufacturing paste, comprising the steps of:
storing powder glass, solvent, and resin in a storage section; and rotating a cylinder at a peripheral speed of 20 m/s or more, said cylinder having a hole or a slit on a side and having a bottom disposed in said storage section so as to be substantially in parallel with or inclined to a bottom of said storage section.
16 . The method of manufacturing paste according to claim 15 , wherein said powder glass has a dispersed particle size such that D10 is 0.2 to 0.8 μm, D50 is 1.0 to 2.0 μm, and D90 is 2.5 to 4.0 μm.
17 . A method of manufacturing a transparent insulating film, comprising the steps of:
manufacturing paste by using any one of the methods of manufacturing paste according to claims 10 to 16 ; and applying said manufactured paste on a glass substrate having an electrode pattern formed in advance, and drying and firing said paste.
18 . A method of manufacturing a plasma display panel, comprising the steps of:
forming an electrode pattern on a glass substrate; and manufacturing a transparent insulating film on said glass substrate having said electrode pattern formed thereon by using the method of manufacturing a transparent insulating film according to claim 17 .
19 . The method of manufacturing a plasma display panel according to claim 18 , wherein a scanning electrode formed by using said electrode pattern has b value of 5 or less.Join the waitlist — get patent alerts
Track US2002176933A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.