US2002176933A1PendingUtilityA1

Paste for transparent insulating film, plasma display panel, method of manufacturing paste, method of manufacturing transparent insulating film, and method of manufacturing plasma display panel

Priority: Dec 5, 2000Filed: Dec 5, 2001Published: Nov 28, 2002
Est. expiryDec 5, 2020(expired)· nominal 20-yr term from priority
C03C 8/16C03C 8/02H01J 2211/38
34
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Claims

Abstract

Paste for a transparent insulating film of a plasma display panel, the paste including powder glass contains lead oxide, silicon oxide, boron oxide, barium oxide, and aluminum oxide, solvent, and resin.

Claims

exact text as granted — not AI-modified
What is claimed is:  
     
         1 . Paste for a transparent insulating film of a plasma display panel, said paste including powder glass, which contains lead oxide, silicon oxide, boron oxide, bariumoxide, and aluminum oxide, solvent, and resin.  
     
     
         2 . The paste for a transparent insulating film according to  claim 1 , wherein said powder glass has a composition of boron oxide in 20 to 30 wt %, barium oxide in 15 to 20 wt %, and aluminum oxide in 3 to 6 wt %.  
     
     
         3 . The paste for a transparent insulating film according to  claim 1 , wherein said powder glass contains copper oxide.  
     
     
         4 . Paste for a transparent insulating film of a plasma display panel, said paste including powder glass, which contains bismuth oxide, silicon oxide, boron oxide, barium oxide, and aluminum oxide, solvent, and resin.  
     
     
         5 . The paste for a transparent insulating film according to  claim 4 , wherein said powder glass contains zinc oxide.  
     
     
         6 . The paste for a transparent insulating film according to  claim 4  or  5 , wherein said powder glass has a composition of boron oxide in 20 to 30 wt %, barium oxide in 15 to 20 wt %, and aluminum oxide in 3 to 6 wt %.  
     
     
         7 . The paste for a transparent insulating film according to  claim 4 , wherein said powder glass contains copper oxide.  
     
     
         8 . A plasma display panel, comprising: 
 a glass substrate;    an electrode pattern formed on said glass substrate; and    a transparent insulating film applied on said electrode pattern,    wherein said transparent insulating film is formed using the paste for a transparent insulating film according to  claim 1 .    
     
     
         9 . A plasma display panel, comprising: 
 a glass substrate;    an electrode pattern formed on said glass substrate; and    a transparent insulating film applied on said electrode pattern,    wherein said transparent insulating film is formed using the paste for a transparent insulating film according to  claim 4 .    
     
     
         10 . A method of manufacturing paste, comprising the steps of: storing powder glass, solvent, and resin in a storage section; and 
 rotating a plate at a peripheral speed of 40 m/s or more, said plate being disposed in said storage section so as to be substantially in parallel with or inclined to a bottom of said storage section.    
     
     
         11 . The method of manufacturing paste according to  claim 10 , wherein said powder glass has a dispersed particle size such that D10 is 0.4 to 0.6 μm, D50 is 0.8 to 1.2 μm, and D90 is 1.4 to 1.8 μm.  
     
     
         12 . The method of manufacturing paste according to claim  20 , wherein said powder glass has a dispersed particle size such that D10 is 0.2 to 0.8 μm, D50 is 1.0 to 2.0 μm, and D90 is 2.5 to 4.0 μm.  
     
     
         13 . A method of manufacturing paste, comprising the steps of: 
 storing powder glass, solvent, and resin in a sand mill storage section; and    operating a sand mill disposed in said sand mill storage section at a peripheral speed of 10 m/s or less.    
     
     
         14 . The method of manufacturing paste according to  claim 13 , wherein said powder glass has a dispersed particle size such that D10 is 0.4 to 0.6 μm, D50 is 0.8 to 1.2 μm, and D90 is 1.4 to 1.8 μm.  
     
     
         15 . A method of manufacturing paste, comprising the steps of: 
 storing powder glass, solvent, and resin in a storage section; and    rotating a cylinder at a peripheral speed of 20 m/s or more, said cylinder having a hole or a slit on a side and having a bottom disposed in said storage section so as to be substantially in parallel with or inclined to a bottom of said storage section.    
     
     
         16 . The method of manufacturing paste according to  claim 15 , wherein said powder glass has a dispersed particle size such that D10 is 0.2 to 0.8 μm, D50 is 1.0 to 2.0 μm, and D90 is 2.5 to 4.0 μm.  
     
     
         17 . A method of manufacturing a transparent insulating film, comprising the steps of: 
 manufacturing paste by using any one of the methods of manufacturing paste according to  claims 10  to  16 ; and    applying said manufactured paste on a glass substrate having an electrode pattern formed in advance, and drying and firing said paste.    
     
     
         18 . A method of manufacturing a plasma display panel, comprising the steps of: 
 forming an electrode pattern on a glass substrate; and    manufacturing a transparent insulating film on said glass substrate having said electrode pattern formed thereon by using the method of manufacturing a transparent insulating film according to  claim 17 .    
     
     
         19 . The method of manufacturing a plasma display panel according to  claim 18 , wherein a scanning electrode formed by using said electrode pattern has b value of 5 or less.

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