Multiple etch technique for air bearing surface fabrication
Abstract
A slider includes an air bearing surface (ABS) including a plurality of separate coplanar pads, a cavity recessed to a certain depth beneath the level of the ABS, and a plurality of steps in which each step is disposed at a level between that of the ABS and that of the cavity. The plurality of steps include a trailing edge step and a leading edge step, and in some embodiments a first side step and a second side step. The leading edge step is provided at a level between that of the trailing edge step. The first side step and the second side step may be provided at the same or different levels to tailor the flight characteristics of the slider. A process is also disclosed for the fabrication of a slider of the present invention. The process includes at least three cycles of masking, etching, and stripping in order to form at least three successively deeper levels, the deepest level being the cavity. Selective masking of the substrate allows portions of the substrate to be preserved through successive etching operations to become the ABS and the plurality of steps.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A process for fabricating a slider comprising:
providing a substrate having an initial surface; forming a first mask above and in contact with said initial surface; forming a first level by removing material from said substrate where exposed by said first mask to a first depth beneath said initial surface; removing said first mask; forming a second mask above and in co-tact with said initial surface and said first level; forming a second level by removing material from said substrate where exposed by said second mask to a second depth beneath said initial surface; removing said second mask; forming a third mask above and in contact with said initial surface, said first level, and said second level; forming a cavity by removing material, from said substrate where exposed by said third mask to a third depth beneath said initial surface; and removing said third mask.
2 . The process of claim 1 wherein forming said first level includes etching said substrate to a first depth of about 3 μ″ to about 8 μ″ below said initial surface.
3 . The process of claim 1 wherein forming said first level includes etching said substrate to a first depth of about 5 μ″ below sad initial surface.
4 . The process of claim 1 wherein forming said second level includes forming a trailing edge step.
5 . The process of claim 4 wherein forming said second level further includes forming a first side step.
6 . The process of claim 4 wherein forming said second level further includes forming a first side step and a second side step.
7 . The process of claim 1 wherein forming said second level includes etching said substrate to a second depth of about 6 μ″ to about 12 μ″ below said initial surface.
8 . The process of claim 1 wherein forming said second level includes etching said substrate to a second depth of about 8 μ″ below said initial surface.
9 . The process of claim 1 wherein forming said cavity includes etching said substrate to a third depth of about 30 μ″ to about 80 μ″ below said initial surface.
10 . The process of claim 1 wherein forming said cavity includes etching said substrate to a third depth of about 50 μ″ below said initial surface.
11 . The process of claim 1 wherein forming said cavity further includes forming a first side step.
12 . The process of claim 1 wherein forming said cavity further includes forming a first side step and a second side step.
13 . The process of claim 5 wherein forming said cavity further includes forming a second side step.
14 . A slider for a magnetic disk drive comprising:
a body including an air bearing surface, a trailing edge step recessed by a first depth beneath said air bearing surface, a leading edge step recessed by a second depth beneath said air bearing surface, and a cavity recessed by a third depth beneath said air bearing surface, wherein said second depth is disposed between said first depth and said third depth, and said first depth is disposed between said air bearing surface and said second depth.
15 . The slider of claim 14 wherein said trailing edge step is recessed about 3 μ″ to about 8 μ″ below said air bearing surface.
16 . The slider of claim 14 wherein said trailing edge step is recessed about 5 μ″ below said air bearing surface.
17 . The slider of claim 14 wherein said leading edge step is recessed about 6 μ″ to about 12 μ″ below said air bearing surface.
18 . The slider of claim 14 wherein said leading edge step is recessed about 8 μ″ below said air bearing surface.
19 . The slider of claim 14 wherein said cavity is recessed about 30 μ″ to about 80 μ″ below said air bearing surface.
20 . The slider of claim 14 wherein said cavity is recessed about 50 μ″ below said air bearing surface.
21 . The slider of claim 14 further including a first side step recessed below said air bearing surface.
22 . The slider of claim 21 further including a first side step recessed below said air bearing surface and a second side step recessed below said air bearing surface.
23 . The slider of claim 21 wherein said first side step and said trailing edge step are recessed below said air bearing surface by substantially the same distance.
24 . The slider of claim 22 wherein said first side step, said second side step, and said trailing edge step are recessed below said air bearing surface by substantially the same distance.
25 . The slider of claim 21 wherein said first side step and said leading edge step are recessed below said air bearing surface by substantially the same distance.
26 . The slider of claim 22 wherein said first side step, said second side step, and said leading edge step are recessed below said air bearing surface by substantially the same distance.
27 . The slider of claim 22 wherein said first side step and said trailing edge step are recessed below said air bearing surface by substantially the same distance and said second side step and said leading edge step are recessed below said air bearing surface by substantially the same distance.Join the waitlist — get patent alerts
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