US2002145235A1PendingUtilityA1
Process and apparatus for sequential multi-beam laser processing of materials
Priority: Oct 8, 1996Filed: Dec 8, 2000Published: Oct 10, 2002
Est. expiryOct 8, 2016(expired)· nominal 20-yr term from priority
B23K 26/60B23K 26/361B23K 26/3576B23K 26/364
38
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Claims
Abstract
A method of processing a substrate by first processing the diamond surface with a laser operating at a first wavelength, and then by processing the diamond surface with a laser operating at a second wavelength.
Claims
exact text as granted — not AI-modifiedI claim:
1 . A method for processing a substrate having an initial surface roughness R 0 to modify the surface roughness to a final surface roughness R F , comprising:
(a) applying a first wavelength of laser light to the substrate surface to modify the surface roughness on at least a portion of the surface to an intermediate surface roughness R I ; and (b) applying a second wavelength of laser light to said portion of the substrate surface having an intermediate surface roughness R I , to modify the surface roughness of on at least a part of said portion to an final surface roughness R F .
2 . The method of claim 1 wherein the first wavelength is greater than the second wavelength.
3 . The method of claim 1 wherein the first wavelength is less than the second wavelength.
4 . A method for processing a substrate, comprising:
(a) applying a first wavelength of laser light to a portion of the substrate; and (b) applying a second wavelength of laser light to said portion of the substrate.Join the waitlist — get patent alerts
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