PCRAM cell manufacturing

Abstract

An exemplary embodiment of the present invention includes a method for forming a programmable cell by forming an opening in a dielectric material to expose a portion of an underlying first conductive electrode, forming a recessed chalcogenide-metal ion material in the opening and forming a second conductive electrode overlying the dielectric material and the chalcogenide-metal ion material. A method for forming a recessed chalcogenide-metal ion material comprises forming a glass material to be recessed approximately 50% or less, in the opening in the dielectric material, forming a metal material on the glass material within the opening and diffusing metal ions from the metal material into the glass material by using ultraviolet light or ultraviolet light in combination with a heat treatment, to cause a resultant metal ion concentration in the glass material.

What is claimed is:  
     
         1 . A method of forming a programmable cell comprising the steps of: 
 forming an opening in a dielectric material to expose a portion of an underlying first conductive electrode;    forming a recessed chalcogenide-metal ion material in said opening; and    forming a second conductive electrode overlying said dielectric material and said recessed chalcogenide-metal ion material.    
     
     
         2 . The method of  claim 1 , wherein said step of forming a recessed chalcogenide-metal ion material comprises the steps of: 
 forming a glass material to be recessed in said opening;    forming a metal material on said glass material within said opening;    diffusing metal ions from said metal material into said glass material.    
     
     
         3 . The method of  claim 2 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material in said opening and subsequently removing approximately 50% or less of said glass material resident in said opening.  
     
     
         4 . The method of  claim 2 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material in said opening and subsequently removing approximately 40-50% of said glass material resident in said opening.  
     
     
         5 . The method of  claim 2 , wherein said step of diffusing metal ions comprises irradiating said metal material for approximately 15 minutes at 4.5 mw/cm 2  with an ultraviolet light having a 405 nm wavelength.  
     
     
         6 . The method of  claim 5 , further comprises thermally heating said metal material at approximately 110° C. for 5-10 minutes during said irradiating.  
     
     
         7 . The method of  claim 2 , wherein said step of diffusing metal ions comprises causing a resultant metal ion concentration in said glass material to be approximately 27%+/−10%.  
     
     
         8 . A method of forming a programmable cell comprising the steps of: 
 forming an opening in a dielectric material to expose a portion of an underlying first conductive electrode;    forming a glass material to be recessed in said opening;    forming a metal material on said glass material within said opening;    diffusing metal ions from said metal material into said glass material; and    forming a second conductive electrode overlying said dielectric material and said metal material.    
     
     
         9 . The method of  claim 8 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material in said opening and subsequently removing approximately 50% or less of said glass material resident in said opening.  
     
     
         10 . The method of  claim 8 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material in said opening and subsequently removing approximately 40-50% of said glass material resident in said opening.  
     
     
         11 . The method of  claim 8 , wherein said step of diffusing metal ions comprises irradiating said metal material for approximately 15 minutes at 4.5 mw/cm 2  with an ultraviolet light having a 405 nm wavelength.  
     
     
         12 . The method of  claim 11 , further comprises thermally heating said metal material at approximately 110° C. for 5-10 minutes during said irradiating.  
     
     
         13 . The method of  claim 8 , wherein said step of diffusing metal ions comprises causing a resultant metal ion concentration in said glass material to be approximately 27%+/−10%.  
     
     
         14 . A method of forming a programmable capacitor dynamic random access memory comprising the steps of: 
 forming a first conductive electrode on a substrate surface;    forming a dielectric material on said first conductive electrode;    forming an opening in said dielectric material to expose a portion of said first conductive electrode;    forming a glass material to be recessed in said opening;    forming a metal material on said glass material within said opening;    diffusing metal ions from said metal material into said glass material; and    forming a second conductive electrode overlying said dielectric material and said metal material.    
     
     
         15 . The method of  claim 14 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material to be recessed in said opening and subsequently removing approximately 50% or less of said glass material resident in said opening.  
     
     
         16 . The method of  claim 14 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material in said opening and subsequently removing approximately 40-50% of said glass material resident in said opening.  
     
     
         17 . The method of  claim 16 , wherein said step of diffusing metal ions comprises irradiating said metal material for approximately 15 minutes at 4.5 mw/cm 2  with an ultraviolet light having a 405 nm wavelength.  
     
     
         18 . The method of  claim 17 , further comprises thermally heating said metal material at approximately 110° C. for 5-10 minutes during said irradiating.  
     
     
         19 . The method of  claim 14 , wherein said step of diffusing metal ions comprises causing a resultant metal ion concentration in said glass material to be approximately 27%+/−10%.  
     
     
         20 . A method of forming a programmable capacitor dynamic random access memory comprising the steps of: 
 forming a first conductive electrode on a substrate surface;    forming a dielectric material on said first conductive electrode;    forming an opening in said dielectric material to expose a portion of said first conductive electrode;    forming a glass material to be recessed by approximately 50% or less in said opening;    forming a metal material on said glass material within said opening;    diffusing metal ions from said metal material into said glass material; and    forming a second conductive electrode overlying said dielectric material and said metal material.    
     
     
         21 . The method of  claim 20 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material in said opening and subsequently removing approximately 40-50% of said glass material resident in said opening.  
     
     
         22 . The method of  claim 20 , wherein said step of diffusing metal ions comprises irradiating said metal material for approximately 15 minutes at 4.5 mw/cm 2  with an ultraviolet light having a 405 nm wavelength.  
     
     
         23 . The method of  claim 22 , further comprises thermally heating said metal material at approximately 110° C. for 5-10 minutes during said irradiating.  
     
     
         24 . The method of  claim 20 , wherein said step of diffusing metal ions comprises causing a resultant metal ion concentration in said glass material to be approximately 27%+/−10%.  
     
     
         25 . A method of forming a programmable capacitor dynamic random access memory comprising the steps of: 
 forming a first conductive electrode on a substrate surface;    forming a dielectric material on said first conductive electrode;    forming an opening in said dielectric material to expose a portion of said first conductive electrode;    forming a glass material to be recessed by approximately 50% or less in said opening;    forming a silver based material on said glass material within said opening;    diffusing silver ions from said silver based material into said glass material such that a resultant silver ion concentration in said glass material is approximately 27%+/−10%; and    forming a second conductive electrode overlying said dielectric material and said metal material.    
     
     
         26 . The method of  claim 25 , wherein said step of forming a glass material to be recessed in said opening comprises forming a glass material in said opening and subsequently removing approximately 40-50% of said glass material resident in said opening.  
     
     
         27 . The method of  claim 25 , wherein said step of diffusing metal ions comprises irradiating said metal material for approximately 15 minutes at 4.5 mw/cm 2  with an ultraviolet light having a 405 mn wavelength.  
     
     
         28 . The method of  claim 27 , further comprises thermally heating said metal material at approximately 110° C. for 5-10 minutes during said irradiating.