Nanoscale molecular arrayer

Abstract

The present invention is a dedicated apparatus for the formation of array that includes one or more deposition domains comprised of one or more deposition materials. The present invention may include an X, Y controller, an X, Y translation stage, a loading substrate, a deposition substrate, a Z controller, and a deposition probe. A computer controls all of the relative positions of each of the components. Furthermore, the present invention utilizes a humidity control system to create a capillary bridge between the probe and the substrate for transferring the deposition material between the loading substrate, the deposition probe, and the deposition substrate.

1 . An apparatus for creating a molecular array comprising: 
 a base;    a Z controller operably connected to the base wherein the Z controller is selectively positionable along a Z axis;    a deposition probe removably and operably connected to the Z controller so that the deposition probe is selectively positionable along the Z axis by the Z controller;    an X, Y controller operably connected to the base wherein the X, Y controller is selectively positionable along an X axis and a Y axis, the X, Y controller further comprising a deposition substrate operably attached thereto and wherein the movement of the X, Y controller moves the deposition substrate between a first position and a second position, the second position being operably positioned relative to the deposition probe; and    an X, Y translation stage operably connected to the base wherein the X, Y translation stage is selectively positionable along an X axis and a Y axis, the X, Y translation stage further comprising a loading substrate operably attached thereto and wherein the movement of the X, Y translation stage moves the loading substrate between a first position and a second position, the second position being operably located relative to the deposition probe.    
     
     
         2 . The apparatus of  claim 1  further comprising a control computer.  
     
     
         3 . The apparatus of  claim 2  further comprising a humidity controller operably attached to the base wherein the humidity controller controls the humidity around the deposition probe.  
     
     
         4 . The apparatus of  claim 3  wherein the humidity controller is operably connected to the control computer.  
     
     
         5 . The apparatus of  claim 1  wherein the Z controller has an approximately 200 nanometer spatial resolution along the Z axis  
     
     
         6 . The apparatus of  claim 5  wherein the X, Y controller has an approximately 20 nanometer spatial resolution along the X and Y axes.  
     
     
         7 . The apparatus of  claim 1  wherein the loading substrate further comprises one or more deposition materials deposited thereon.  
     
     
         8 . The apparatus of  claim 1  further comprising an optical microscope operably attached to the base.  
     
     
         9 . The apparatus of  claim 2  further comprising a force feedback monitor.  
     
     
         10 . The apparatus of  claim 2  wherein the deposition probe further includes a tip.  
     
     
         11 . The apparatus of  claim 10  further comprising a humidity controller, the humidity controller selectively controlling the humidity of the air around the tip.  
     
     
         12 . The apparatus of  claim 2  wherein the control computer further comprises a stepper motor control card.  
     
     
         13 . The apparatus of  claim 12  wherein the humidity controller further comprises a dry gas source, a humidity source, and a gas flow monitor.  
     
     
         14 . A method for creating a deposition domain comprising: 
 (a) obtaining a loading substrate, the loading substrate further including a deposition material;    (b) loading the deposition material onto a deposition probe by altering the humidity level around the loading substrate and the deposition probe to create a capillary bridge; and    (c) creating a deposition domain on a deposition substrate by transferring a desired amount of the deposition material from the deposition probe to the deposition substrate.    
     
     
         15 . The method of  claim 14  further comprising repeating steps (a) through (c) to create an array.  
     
     
         16 . The method of  claim 14  wherein placing the loading substrate further comprises affixing the loading substrate onto an X, Y translation stage to move the loading substrate to a position relative to the deposition probe.  
     
     
         17 . An apparatus for creating an array comprising: 
 a Z controller    a deposition probe operably attached to the Z controller, the deposition probe further comprising a tip;    an X, Y controller operably attached to the Z controller; and    a deposition substrate operably affixed to the X, Y controller where the deposition substrate is selectively movable between a first position and a second position and wherein when the X, Y controller moves the deposition substrate to the second position the deposition substrate is operably positioned relative to the tip.    
     
     
         18 . The apparatus of  claim 17  further comprising: 
 a control computer operably connected to the Z controller and the X, Y controller;  
 a force feedback monitor operably affixed to the deposition probe and operably connected to the control computer; and  
 a humidity controller operably affixed to the Z controller and operably connected to the control computer.  
 
     
     
         19 . The apparatus of claim  20  further comprising an ozone source for cleaning the deposition probe.  
     
     
         20 . An apparatus for creating a deposition domain comprising: 
 an X, Y and Z controller;    a loading substrate operably and movably attached to the Z controller;    a deposition substrate operably and movably attached to the Z controller;    a deposition probe operably attached to the Z controller; and    a humidity controller operably attached to the Z controller wherein the humidity controller selectively controls the humidity level around the deposition probe, the loading substrate, and the deposition substrate.