US2002089095A1PendingUtilityA1
Molding assembly for wafer scale molding of protective caps
Priority: Jan 10, 2001Filed: Jan 14, 2002Published: Jul 11, 2002
Est. expiryJan 10, 2021(expired)· nominal 20-yr term from priority
Inventors:Kia Silverbrook
H10W 72/536H10W 99/00H10W 76/12B29C 33/06B29C 35/0272B29C 43/50B29C 43/36B29C 35/0888B29L 2031/3425B29K 2883/00B29C 43/18B29C 33/0022B29C 2043/503B29C 2035/0822B29L 2031/56
40
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
A mold assembly ( 100 ) formed of a pair of molds ( 102, 104 ) and a pair of release plates ( 118, 120 ). The molds ( 102, 104 ) have holes ( 126 ) which extend from outer surfaces into the mold cavities ( 106 ). The release plates ( 118, 120 ) have pins ( 122, 124 ) which pass into the holes ( 126, 128 ). When molding is finished, the molds ( 102, 104 ) are moved toward the release plates ( 118, 120 ). The pins ( 122, 124 ) contact the molded article(s) ( 134 ) and hold them in position as the molds ( 102, 104 ) are withdrawn.
Claims
exact text as granted — not AI-modifiedI claim:
1 . A molding assembly including:
a first mold and a second mold a having first and second molding surfaces respectively for molding a sheet of thermoplastic material placed therebetween, which, when assembled, define at least one cavity there between, the first mold including at least one a first aperture extending from an outer surface to the first molding surface; a release mechanism for removing the first mold from the second mold after molding of the sheet, said release mechanism including at least one first pin which extends into a respective first aperture; said first mold movable relative to the second mold and said at least one first pin between a molding position and a release position; whereby, in the molding position, the first and second molds are in contact or close together and said at least one first pin extends into a respective first aperture from the outer surface but does not extend out of the respective aperture beyond the molding surface, and, in the release position, the first and second molds are remote from each other and said at least one first pin extends into respective first apertures from the outer surface and extends out of the respective first aperture beyond the first molding surface, wherein the first and second molds are formed substantially of silicon or silicon alloy.
2 The assembly of claim 1 wherein the molds are substantially planar and the first release mechanism includes a substantially planar plate having said at least one pin extending generally perpendicular to the plane of the plate.
3 . The assembly of claim 1 wherein the at least one first aperture in the first mold is located toward the center of the respective cavity.
4 . The assembly of claim 1 wherein the first release mechanism and the outer surface of the first mold define at least part of a substantially closed cavity therebetween and further including a vacuum source for applying a vacuum to the substantially closed cavity to move the first mold from the molding position to the release position.
5 . The assembly of claim 4 further including a source of above ambient pressure for applying an above ambient pressure to the cavity to move the first mold from the release position to the molding position.
6 . The assembly of claim 1 wherein the second mold includes at least one second aperture extending from an outer surface to the cavity defining surface, and further including a second release mechanism for removing the second mold from the sheet after molding of the sheet, said second release mechanism including at least one second pin which extends into a respective second aperture in the second mold.
7 . The assembly of claim 6 wherein the second apertures in the second mold are located toward the edges of the respective cavity.
8 . The assembly of claim 1 wherein at least part of at least the first or second mold is at least partially transparent or translucent to electromagnetic radiation having wavelengths in the range of about 1000 nm to about 5000 nm.
9 . The assembly of claim 1 wherein at least part of the first release mechanism is at least partially transparent or translucent to electromagnetic radiation having wavelengths in the range of about 1000 nm to about 5000 nm.
10 . The assembly of claim 1 wherein at least part of the first release mechanism is formed of a semiconductor material.
11 . A method of manipulating a sheet of thermoplastic material using the assembly of claim 1 , the method including:
a) sandwiching the sheet between the two molds: b) heating the sheet to a plastic state; c) urging the two molds together to plastically deform the sheet; d) drawing the first mold away from the sheet whilst maintaining the at least one first pin in contact with the sheet; and, e) removing the at least one first pin from being in contact with the sheet.
12 . The method of claim 11 further including, before step d) or after step e), bonding the molded sheet to a wafer
13 . The method of claim 11 including:
f) providing a second mold including at least one second aperture extending from an outer surface to the cavity defining surface, and a second release mechanism for removing the second mold from the sheet after molding of the sheet, said second release mechanism including at least one second pin which extends into a respective second aperture in the second mold.
g) drawing the second mold away from the sheet whilst maintaining said at least one second pin in contact with the sheet; and
h) removing the at least one second pin from being in contact with the sheet.
14 . The method of claim 11 wherein step c) includes applying an above ambient pressure to the working cavity between the first mold and the first release mechanism.
15 . The method of claim 11 wherein step d) includes applying a below ambient pressure to the working cavity between the first mold and the first release mechanism to draw the first mold away from the second mold
16 . The method of claim 14 wherein step c) includes applying an above ambient pressure to the working cavity between the second mold and the second release mechanism.
17 . The method of claim 14 wherein step g) includes applying a below ambient pressure to the working cavity between the second mold and the second release mechanism to draw the second mold away from the sheet.
18 . The method of claim 11 wherein step b) includes irradiating the thermoplastic material with electromagnetic radiation having wavelengths in the range of about 1000 nm to about 5000 nm.
19 . The method of claim 11 further including applying the caps to a wafer after step c) and before step d).
20 . The method of claim 11 further including applying an etch to the caps to remove extraneous material from between the caps.
21 . The method of claim 21 wherein the etch is applied before step d).
22 . The method of claim 21 wherein the etch is applied after step d).
23 . The method of claim 14 wherein steps g) and h) occur after step c) and before step d).Join the waitlist — get patent alerts
Track US2002089095A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.