High accuracy blast processing method and high accuracy blast processing apparatus

Abstract

In a high accuracy blast processing method of the present invention which is a blast processing method for processing a substrate by injecting an injection material from a nozzle by compressed air, injection of the injection material is either intermittent injection for repeating the injection and injection stop at short intervals or a combination of the intermittent injection and continuous injection. By doing so, even if a processing progresses, processing efficiency is not deteriorated and a non-processing target region is not damaged even without using a mask. A high accuracy blast processing apparatus of the present invention consists of a nozzle unit forcedly feeding the injection material to the nozzle by the compressed air and a work table moving the substrate horizontally and vertically. A solenoid valve for injecting and stopping the injection material and a control unit outputting an intermittent operating signal to the solenoid valve are connected to the nozzle unit.

What is claimed is:  
     
         1 . A high accuracy blast processing method for processing a substrate by injecting an injection material from a nozzle by compressed air, wherein 
 injection of the injection material is intermittent injection for repeating injection and injection stop at short intervals.    
     
     
         2 . A high accuracy blast processing method for processing a substrate by injecting an injection material from a nozzle by compressed air, wherein 
 injection of the injection material is a combination of intermittent injection for repeating injection and injection stop at short intervals and continuous injection.    
     
     
         3 . A high accuracy blast processing method according to  claim 1  or  2 , wherein 
 the injection and the injection stop of the intermittent injection are repeated at intervals of not more than 1 second.  
 
     
     
         4 . A high accuracy blast processing method according to  claim 1 ,  2  or  3 , wherein 
 the substrate is processed by injecting the injection material having a mean particle diameter of not more than 50 μm and an injection quantity of not more than 50 g/min from the nozzle having an inside diameter of 0.2 to 2 mm by the compressed air of 0.2 to 2.5 MPa.  
 
     
     
         5 . A high accuracy blast processing apparatus comprising: 
 a nozzle unit forcedly feeding an injection material to a nozzle by compressed air; and    a work table moving a substrate horizontally and vertically, wherein    a control unit outputting an intermittent operating signal for injecting and stopping the injection material is connected to said nozzle unit.    
     
     
         6 . A high accuracy blast processing apparatus comprising: 
 a nozzle unit forcedly feeding an injection material to a nozzle by compressed air; and    a work table moving a substrate horizontally and vertically, wherein    a solenoid valve for injecting and stopping the injection material and a control unit outputting an intermittent operating signal to the solenoid valve are connected to said nozzle unit.    
     
     
         7 . A high accuracy blast processing apparatus according to  claim 5  or  6 , wherein 
 the nozzle unit is constituted of the nozzle having an inside diameter of 0.2 to 2 mm and a mechanism for forcedly feeding the injection material having a mean particle diameter of not more than 50 μm in a quantity of not more than 50 g/min to the nozzle by the compressed air of 0.2 to 2.5 MPa.