Photosensitive composition for sandblasting and photosensitive film using the same

Abstract

A photosensitive composition for sandblasting comprising the components of: (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group; (B) an acrylic copolymer; and (C) a photopolymerization initiator, wherein the component (B) comprises, as a monomer unit, one of copolymerizable monomers comprising one of a benzene ring and a cyclohexyl group.

What is claimed is:  
     
         1 . A photosensitive composition for sandblasting comprising the components of: 
 (A) a photopolymerizable urethane (meth)acrylate oligomer comprising (meth)acryloyl group;    (B) an acrylic copolymer; and    (C) a photopolymerization initiator,    wherein the component (B) comprises, as a monomer unit, a copolymerizable monomer comprising one of a benzene ring and a cyclohexyl group.    
     
     
         2 . The photosensitive composition according to  claim 1 , wherein the component (A) comprises 50% by weight or more of urethane (meth)acrylate oligomer comprising polyether structural unit in a main chain.  
     
     
         3 . The photosensitive composition according to  claim 1 , wherein the component (A) comprises a reaction product of a compound comprising a terminal isocyanate group and a (meth)acrylate compound, 
 wherein the compound comprising a terminal isocyanate group is obtained by reacting a polyether compound comprising a terminal hydroxyl group with a diisocyanate compound, and the (meth)acrylate compound comprises one of a hydroxyl group and a carboxyl group.    
     
     
         4 . The photosensitive composition according to  claim 3 , wherein the polyether compound comprising a terminal hydroxyl group comprises (poly)alkylene glycol.  
     
     
         5 . The photosensitive composition according to  claim 1 , wherein the component (B) comprises from 2% to 70% by weight of the copolymerizable monomer comprising one of a benzene ring and a cyclohexyl group, based on the total amount of the component (B).  
     
     
         6 . The photosensitive composition according to  claim 1 , which comprises: 
 from 10 to 90 parts by weight of the component (A);    from 10 to 90 parts by weight of the component (B); and    from 0.1 to 25 parts by weight of the component (C), based on the total amount of the components (A), (B) and (C).    
     
     
         7 . The photosensitive composition according to  claim 1 , wherein the component (B) has an acid value of from 50 mgKOH/g to 250 mgKOH/g.  
     
     
         8 . The photosensitive composition according to  claim 1 , which further comprises a photopolymerizable monomer in an amount of no more than 20 parts by weight based on 100 parts by weight of the total amount of the components (A), (B) and (C).  
     
     
         9 . A photosensitive film comprising a flexible film, a layer comprising the photosensitive composition according to  claim 1 , and a releasable film in this order.