US2002064666A1PendingUtilityA1

Article having uneven surface, production process for the article, and composition for the process

Priority: Feb 5, 1998Filed: Jan 31, 2002Published: May 30, 2002
Est. expiryFeb 5, 2018(expired)· nominal 20-yr term from priority
B29D 11/00278C09D 183/04B23K 26/364B29C 39/148B29C 41/20B29C 39/18B29K 2083/005B29D 11/00365B23K 26/40B29L 2011/0016B29C 41/12B23K 2103/42Y10T428/31663B29C 33/424C03C 17/30B23K 2103/34B23K 2103/52B23K 2103/50C03C 2218/335C03C 2217/77
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Claims

Abstract

A process for producing an article having a finely uneven surface coated with a film, which has high heat resistance and which neither cracks nor peels off from a substrate, by forming a film of a sol material between a substrate and a mold in such a manner that the film is in close contact with them and applying heat to form a gelled film, which has a surface configuration that is the inversion of the surface configuration of the mold, on the surface of the substrate, wherein the sol material contains (A) R 2 SiX 2 (R is an alkyl group and X is an alkoxyl group or halogen atom) and (B) R′SiX′ 3 (R′ is an aryl group or substituted aryl group and X′ is an alkoxyl group or halogen atom).

Claims

exact text as granted — not AI-modified
What is claimed:  
     
         1 . An article having an uneven surface produced by the process comprising forming a film of a sol material between the substrate of the article and a mold in such a manner that the film is in close contact with these and heating the film to form a gelled film, which has a surface configuration that is the inversion of the surface configuration of the mold, on the surface of the substrate of the article, wherein 
 the sol material contains (A) a silane compound represented by the following formula (1):    R 2 SiX 2   (1)     wherein R is an alkyl group and X is an alkoxyl group or a halogen atom, and    (B) a silane compound represented by the following formula (2):    R′SiX′ 3   (2)     wherein R′ is a substituted or unsubstituted aryl group and X′ is an alkoxyl group or a halogen atom,    wherein an organopolysiloxane film having an uneven surface is formed to a thickness of 1 μm to 1 mm on the surface of the substrate of the article and the film contains 5 to 25 wt % of an alkyl group and 5 to 40 wt % of an aryl group.

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