Method for manufacture of optical element

Abstract

In a method for manufacture of an optical element, a thin film is formed on a surface, such as a grating surface, an aspherical surface or a spherical surface, formed on a mold. Then, a substrate is bonded to the thin film. Subsequently, the thin film and the substrate are separated from the mold.

1 . A method for manufacture of an optical element, comprising: 
 a step of forming a thin film on a mold;    a step of bonding a substrate to said thin film; and    a step of separating said thin film and said substrate from said mold.    
     
     
         2 . A method according to  claim 1 , wherein said thin film is a reflecting film.  
     
     
         3 . A method according to  claim 1 , wherein said thin film is a multilayer film.  
     
     
         4 . A method according to  claim 3 , wherein said multilayer film includes an antireflection film.  
     
     
         5 . A method according to  claim 1 , wherein said optical element is a diffractive optical element such as a binary optics element, an aspherical lens, or a spherical lens.  
     
     
         6 . A method for manufacture of an optical element, comprising: 
 a step of forming a thin film on a mold;    a step of polishing a surface of said thin film;    a step of bonding a substrate to the polished surface of said thin film; and    a step of separating said thin film and said substrate from said mold.    
     
     
         7 . A method according to  claim 6 , wherein said thin film is a multilayer film.  
     
     
         8 . A method according to  claim 6 , wherein said thin film is a reflecting film.  
     
     
         9 . A method according to  claim 7 , wherein said multilayer film includes a reflecting film or an antireflection film.  
     
     
         10 . A method according to  claim 6 , wherein said optical element is a diffractive optical element such as a binary optics element, an aspherical lens, or a spherical lens.  
     
     
         11 . A method according to  claim 1  or  6 , wherein said step of forming said thin film is one of thin-film forming methods selected from among a CVD method, a vacuum vapor deposition method, a sputtering vapor deposition method, an ion beam vapor deposition method and an ion beam sputtering method.  
     
     
         12 . A method according to  claim 1  or  6 , wherein said step of forming said thin film is an oxidized film forming method of hydrolyzing a coating film of an organic metal compound selected from the group consisting of organic silicon, organic aluminum and organic titanium.  
     
     
         13 . A method according to  claim 1  or  6 , wherein a material of said thin film is selected from the group consisting of quartz, fluorite, metal oxide and fluoride.  
     
     
         14 . A method according to  claim 1  or  6 , wherein said substrate is made of a material selected from the group consisting of quartz, fluorite, metal oxide and fluoride.  
     
     
         15 . An optical element manufactured by a method according to  claim 1  or  6 .  
     
     
         16 . An optical system using an optical element according to  claim 15 .  
     
     
         17 . An exposure apparatus in which an optical system according to  claim 16  is mounted.  
     
     
         18 . An illumination apparatus in which an optical system according to  claim 16  is mounted.  
     
     
         19 . A projection apparatus in which an optical system according to  claim 16  is mounted.  
     
     
         20 . A device manufacturing method comprising a step of transferring a device pattern to a substrate by using an exposure apparatus according to claim  17 .