US2002026985A1PendingUtilityA1
Etching device
Priority: Aug 22, 2000Filed: Aug 10, 2001Published: Mar 7, 2002
Est. expiryAug 22, 2020(expired)· nominal 20-yr term from priority
Inventors:Kenya Kai
H10P 72/0424
28
PatentIndex Score
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Cited by
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Claims
Abstract
An etching device for supplying an etchant to the surface of a workpiece held on a rotating spinner table, which comprises a center portion supply nozzle for supplying the etchant to the rotation center portion of the workpiece held on the spinner table and a peripheral portion supply nozzle for supplying the etchant to an area between the rotation center portion and the periphery of the workpiece.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An etching device comprising a spinner table for holding a workpiece and turning it and an etchant supply means for supplying an etchant to the surface of the workpiece held on the spinner table, wherein
the etchant supply means has a center portion supply nozzle for supplying the etchant to the rotation center portion of the workpiece held on the spinner table and a peripheral portion supply nozzle for supplying the etchant to an area between the rotation center portion and the periphery of the workpiece.
2 . The etching device of claim 1 , wherein the peripheral portion supply nozzle has a plurality of nozzles provided at positions different in distance from the center portion supply nozzle.
3 . The etching device of claim 1 , wherein the amount of the etchant supplied from the peripheral portion supply nozzle is set larger than the amount of the etchant supplied from the center portion supply nozzle.Join the waitlist — get patent alerts
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