US2002008443A1PendingUtilityA1
Thin film, method for manufacturing thin film, and electronic component
Est. expiryJul 19, 2020(expired)· nominal 20-yr term from priority
H10D 1/00H03H 9/174H03H 9/02133C23C 14/0617H03H 3/02Y10T29/42Y10T29/49155Y10T29/49005
37
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Claims
Abstract
A method for manufacturing a thin film is performed such that the internal stress is controlled while the preferred orientation property is maintained at a high value. An AlN piezoelectric thin film is formed on a substrate by a sputtering method using a mixed gas including Ar and nitrogen, wherein the mixed gas has a nitrogen flow rate ratio, that is, nitrogen flow rate relative to the sum of the Ar flow rate and the nitrogen flow rate, of about 10% to about 75%.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A thin film comprising:
an AlN material provided on a surface of a substrate, wherein the crystallinity is the C axis preferred orientation, the half-width of a rocking curve is about 1.4° to about 1.6°, and an internal stress is within the range of approximately ±1 GPa.
2 . The thin film according to claim 1 , wherein the thin film is one of a piezoelectric thin film, a dielectric thin film and a magnetic material thin film.
3 . An electronic component comprising:
a substrate; and a thin film disposed on the substrate and made of an AlN material, wherein the crystallinity is the C axis preferred orientation, the half-width of a rocking curve is about 1.4° to about 1.6°, and an internal stress is within the range of approximately ±1 GPa.
4 . The electronic component according to claim 3 , wherein the substrate is made of Si.
5 . The electronic component according to claim 3 , further comprising a thin film made of one SiO 2 , Si 3 N 4 , and Al 2 O 3 , a lower layer electrode , the thin film, and an upper layer electrode arranged in this order.
6 . The electronic component according to claim 3 , wherein a diaphragm is provided on the substrate.
7 . The electronic component according to claim 3 , wherein the electronic component is one of a piezoelectric thin film resonator, a filter, a sensor, and an actuator.
8 . A method for manufacturing a thin film comprising the steps of:
providing a substrate; and forming a thin film on the substrate using a mixed gas of Ar and nitrogen such that the thin film includes an AlN material, wherein the crystallinity is the C axis preferred orientation, the half-width of a rocking curve is about 1.4° to about 1.6°, and an internal stress is within the range of approximately ±1 GPa; wherein said mixed gas has a nitrogen flow rate ratio of about 10% to about 75%, wherein the nitrogen flow rate is a ratio of a nitrogen flow rate relative to the sum of an Ar flow rate and the nitrogen flow rate.
9 . The method according to claim 8 , wherein the thin film is formed via a sputtering process.
10 . The method according to claim 8 , wherein the thin the AlN piezoelectric thin film is formed at a temperature of the substrate of approximately 100° C., with an RF power of about 100 W, and at a nitrogen flow rate ratio of about 5% to about 90%.
11 . The method according to claim 8 , wherein the thin film is one of a piezoelectric thin film, a dielectric thin film and a magnetic material thin film.
12 . The method according to claim 8 , wherein the substrate is made of Si.
13 . The method according to claim 8 , further comprising the steps of forming a thin film made of one SiO 2 , Si 3 N 4 , and Al 2 O 3 , a lower layer electrode, forming the thin film, and an upper layer electrode arranged in this order.
14 . The method according to claim 8 , further comprising the step of forming a diaphragm on the substrate.
15 . An electronic component comprising a thin film manufactured according to the method of claim 8 .
16 . The electronic component according to claim 15 , wherein the electronic component is one of a piezoelectric thin film resonator, a filter, a sensor, and an actuator.Join the waitlist — get patent alerts
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