US2001051105A1PendingUtilityA1
Copper alloy suitable for an IC lead pin for a pin grid array provided on a plastic substrate
Priority: Apr 28, 2000Filed: Apr 27, 2001Published: Dec 13, 2001
Est. expiryApr 28, 2020(expired)· nominal 20-yr term from priority
H10W 20/40C22C 9/02C22C 9/00C22C 9/04
38
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
A copper alloy suitable for an IC lead pin for a pin grid array provided on a plastic substrate, which copper alloy is a Cu—Zn—Mg alloy, a Cu—Sn alloy, a Cu—SN—Ag alloy, a Cu—Fe—Zn—P alloy, or a Cu—Cr alloy, each having a given alloy composition, in which the copper alloy has conductivity of 50% IACS or more and tensile stress of 400 MPa to 650 MPa.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A copper alloy suitable for an IC lead pin for a pin grid array provided on a plastic substrate, which copper alloy is selected from the group consisting of:
a copper alloy containing 0.05 to 0.5 wt % of Zn and 0.05 to 0.5 wt % of Mg, with the balance being made of unavoidable impurities and Cu; a copper alloy containing 0.1 to 1.0 wt % of Sn, with the balance being made of unavoidable impurities and Cu; a copper alloy containing 0.1 to 1.0 wt % of Sn and 0.1 to 0.6 wt % of Ag, with the balance being made of unavoidable impurities and Cu; a copper alloy containing 2.1 to 2.6 wt % of Fe, 0.05 to 0.2 wt % of Zn, and 0.015 to 0.15 wt % of P, with the balance being made of unavoidable impurities and Cu; and a copper alloy containing 0.4 to 1.1 wt % of Cr, with the balance being made of unavoidable impurities and Cu, wherein the copper alloy has conductivity of 50% IACS or more, and tensile stress of 400 MPa or more but 650 MPa or less.
2 . The copper alloy as claimed in claim 1 , which is the copper alloy containing 0.05 to 0.5 wt % of Zn and 0.05 to 0.5 wt % of Mg, with the balance being made of unavoidable impurities and Cu.
3 . The copper alloy as claimed in claim 1 , which is the copper alloy containing 0.1 to 1.0 wt % of Sn, with the balance being made of unavoidable impurities and Cu.
4 . The copper alloy as claimed in claim 1 , which is the copper alloy containing 0.1 to 1.0 wt % of Sn and 0.1 to 0.6 wt % of Ag, with the balance being made of unavoidable impurities and Cu.
5 . The copper alloy as claimed in claim 1 , which is the copper alloy containing 2.1 to 2.6 wt % of Fe, 0.05 to 0.2 wt % of Zn, and 0.015 to 0.15 wt % of P, with the balance being made of unavoidable impurities and Cu.
6 . The copper alloy as claimed in claim 1 , which is the copper alloy containing 0.4 to 1.1 wt % of Cr, with the balance being made of unavoidable impurities and Cu.Join the waitlist — get patent alerts
Track US2001051105A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.