US2001035346A1PendingUtilityA1
Apparatus and method for electroplating
Priority: Apr 24, 1998Filed: May 31, 2001Published: Nov 1, 2001
Est. expiryApr 24, 2018(expired)· nominal 20-yr term from priority
Inventors:Keiichi Maeda
H10P 14/47H10W 20/056H05K 3/241C25D 7/123H05K 3/423C25D 5/003C25D 17/001C25D 21/04
39
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
An apparatus and a method for electroplating for forming a metal film by an electroplating method. The apparatus comprises a plating bath provided in a non-oxidative atmosphere, and in the method, an article to be plated is immersed in a plating bath through a non-oxidative atmosphere.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An apparatus for electroplating for forming a metal film by an electroplating method, said apparatus comprising a plating bath provided in a non-oxidative atmosphere.
2 . An apparatus for electroplating as claimed in claim 1 , wherein
said non-oxidative atmosphere, in which said plating bath is provided, is provided in a plating chamber, and said apparatus further comprises a pre-treating chamber, in which a pre-treatment of an article to be plated is conducted, and a transportation chamber connected to said pre-treating chamber and said plating chamber.
3 . An apparatus for electroplating as claimed in claim 1 , wherein
said non-oxidative atmosphere is selected from a rare gas atmosphere, a nitrogen gas atmosphere and a hydrogen gas atmosphere.
4 . An apparatus for electroplating as claimed in claim 2 , wherein
said non-oxidative atmosphere is selected from a rare gas atmosphere, a nitrogen gas atmosphere and a hydrogen gas atmosphere.
5 . A method for electroplating for forming a metal film by an electroplating method, an article to be plated being immersed in a plating bath through a non-oxidative atmosphere.
6 . A method for electroplating as claimed in claim 5 , wherein
said non-oxidative atmosphere is selected from a rare gas atmosphere, a nitrogen gas atmosphere and a hydrogen gas atmosphere.Join the waitlist — get patent alerts
Track US2001035346A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.