Processing method and processing unit for substrate

Abstract

A processing unit for a substrate comprises a partition 6 provided between an atmospheric area S 1 and an inert gas area S 2. The partition 6 has an opening 22 to communicate the atmospheric area S 1 and the inert gas area S 2. A door 23 is provided at the opening 22 to open and close it. Carrier holding means 11 is provided for holding a carrier 2 of the substrate in such a manner that the carrier 2 comes in contact with the opening 22 on the side of the atmospheric area. Inert gas replacing means 56 is provided for replacing a gas in the carrier 2 with an inert gas by introducing the inert gas into the carrier 2 when the door 23 closes the opening 22 and the carrier 2 comes in contact with the opening 22 on the side of the atmospheric area by the carrier holding means 11. This processing unit can perform the process of the substrate without increasing the concentration of the oxygen in the inert gas area S 2 by preventing leakage of the air from the atmospheric area S 1 into the inert gas area S 2.

1 . A processing unit for a substrate comprising; 
 a partition provided between an atmospheric area and an inert gas area, and having an opening to communicate the atmospheric area with the inert gas area,    a door provided at the opening to open and close it,    carrier holding means for holding a carrier for the substrate in such a manner that the carrier comes in contact with the opening on the side of the atmospheric area, and    inert gas replacing means for replacing a gas in the carrier with an inert gas by introducing the inert gas into the carrier when the door closes the opening and the carrier comes in contact with the opening on the side of the atmospheric area by the carrier holding means.    
     
     
         2 . A processing unit according to    claim 1   , wherein: 
 the carrier has an opening part to communicate with the opening when the carrier comes in contact with the opening on the side of the atmospheric area, and    the inert gas replacing means has an inert gas supplying hole and a gas exhausting hole which are openly provided in the opening.    
     
     
         3 . A processing unit according to    claim 1   , wherein: 
 the carrier has a lid to open and close the opening part of the carrier.    
     
     
         4 . A processing unit according to    claim 3   , further comprising: 
 a lid opening-closing mechanism mounted on the door for holding the lid of the carrier and for opening and closing it.    
     
     
         5 . A processing unit according to    claim 4   , further comprising; 
 a door opening-closing mechanism mounted on the partition for opening and closing the door, and wherein:    the door opening-closing mechanism is adapted to open the door in a state where the lid opening-closing mechanism holds the lid of the carrier.    
     
     
         6 . A processing unit according to    claim 1   , wherein: 
 the carrier holding means has carrier positioning means for positioning the carrier in such a manner that the carrier comes in sealing contact with the opening on the side of the atmospheric area.    
     
     
         7 . A processing unit according to    claim 1   , wherein: 
 the carrier and the opening in the partition are adapted to come in sealing contact with each other via a sealing element.    
     
     
         8 . A processing unit according to    claim 1   , wherein: 
 the partition has a second opening to communicate the atmospheric area with the inert gas area, and further comprising;    a second door provided at the second opening to open and close it,    second carrier holding means for holding a carrier for the substrate in such a manner that the carrier comes in contact with the second opening on the side of the atmospheric area, and    second inert gas replacing means for replacing a gas in the carrier with an inert gas by introducing the inert gas into the carrier when the second door closes the second opening and the carrier comes in contact with the second opening on the side of the atmospheric area by the second carrier holding means.    
     
     
         9 . A processing unit according to    claim 8   , wherein: 
 the door is adapted to move downward to open the opening, and    the second door is adapted to move upward to open the second opening.    
     
     
         10 . A processing method for a substrate by using a processing unit for the substrate comprising: a partition provided between an atmospheric area and an inert gas area, and having an opening to communicate the atmospheric area with the inert gas area, a door provided above the opening to open and close it, carrier holding means for holding a carrier for the substrate in such a manner that the carrier comes in contact with the opening on the side of the atmospheric area, and inert gas replacing means for replacing a gas in the carrier with an inert gas by introducing the inert gas into the carrier when the door closes the opening and the carrier comes in contact with the opening on the side of the atmospheric area by the carrier holding means, said method comprising; 
 a step for closing the opening by the door,  
 a step for holding the carrier including the substrate by the carrier holding means in such a manner that the carrier comes in contact with the opening on the side of the atmospheric area,  
 a step for replacing the gas in the carrier with the inert gas by the inert gas replacing means, and  
 a step for opening the door to communicate the interior of the carrier replaced with the inert gas with the inert gas area via the opening.