Thin-film magnetic head and method of manufacturing the same

Abstract

A thin-film magnetic head includes an ABS and a three-layer pole tip structure located between the ABS and a position at a predetermined height from the ABS. The structure consists of a first pole, a recording gap layer and a second pole. The recording gap layer is made of a material having a etching rate equal to or higher than that of a material for making the first and second poles.

What is claimed is:  
     
         1 . A thin-film magnetic head including an air bearing surface and a three-layer pole tip structure located between the air bearing surface and a position at a predetermined height from the air bearing surface, said structure consisting of a first pole, a recording gap layer and a second pole, said recording gap layer being made of a material having a etching rate equal to or higher than that of a material for making said first and second poles.  
     
     
         2 . The head as claimed in    claim 1   , wherein the material for making said recording gap layer is one selected from a group of SiO 2 , TaO 5 , SiC, and AlN.  
     
     
         3 . The head as claimed in    claim 1   , wherein the material for making said first and second poles is nitride containing Fe.  
     
     
         4 . The head as claimed in    claim 1   , wherein the material for making said recording gap layer is Ta 2 O 5 , and wherein the material for making said first and second poles is NiFe.  
     
     
         5 . A thin-film magnetic head comprising: 
 a magnetoresistive reproducing head part;    an inductive re cording head part multilayered with said reproducing head part; and    an air bearing surface,    said recording head part including a three-layer pole tip structure located between the air bearing surface and a position at a predetermined height from the air bearing surface, said structure consisting of a first pole, a recording gap layer and a second pole,    said recording gap layer being made of a material having a etching rate equal to or higher than that of a material for making said first and second poles.    
     
     
         6 . The head as claimed in    claim 5   , wherein the material for making said recording gap layer is one selected from a group of SiO 2 , TaO 5 , SiC, and AlN.  
     
     
         7 . The head as claimed in    claim 5   , wherein the material for making said first and second poles is nitride containing Fe.  
     
     
         8 . The head as claimed in    claim 5   , wherein the material for making said recording gap layer is Ta 2 O 5 , and wherein the material for making said first and second poles is NiFe.  
     
     
         9 . A method of manufacturing a thin-film magnetic head comprising the steps of: 
 sequentially depositing a first magnetic layer, a non-magnetic layer and a second magnetic layer; and    forming a three-layer pole tip structure located between an air bearing surface and a position at a predetermined height from the air bearing surface by dry etching said first magnetic layer, said non-magnetic layer and said second magnetic layer,    said non-magnetic layer being made of a material having an etching rate equal to or higher than that of a material for making said first and second magnetic layers.    
     
     
         10 . The method as claimed in    claim 9   , wherein the material for making said recording gap layer is one selected from a group of SiO 2 , Ta 2 O 5 , SiC, and AlN.  
     
     
         11 . The method as claimed in    claim 9   , wherein the material for making said first and second poles is nitride containing Fe.  
     
     
         12 . The method as claimed in    claim 9   , wherein the material for making said recording gap layer is TaO 5 , and wherein the material for making said first and second poles is NiFe.