Multi racetrack cathodic arc

Abstract

An arc deposition system includes a coating chamber and a central cathode target disposed within the coating chamber. At least two anodes surround the central cathode target. Each anode is positively biased with respect to the central cathode target such that each anode independently induces an associated racetrack erosion profile on the central cathode target. At least two magnetic components are located within the central cathode target. The magnetic components guide an associated arc that forms its associated racetrack erosion profile. Characteristically, each anode of the at least two anodes has an associated magnetic component.

What is claimed is: 
     
       1. An arc deposition system comprising:
 a coating chamber; 
 a central cathode target and a substrate disposed within the coating chamber; 
 a first anode; 
 a second anode, the first anode and the second anode surrounding the central cathode target, the first anode being positively biased with respect to the central cathode target such that the first anode induces a first racetrack erosion profile on the central cathode target, the second anode being positively biased with respect to the central cathode target such that the second anode induces a second racetrack erosion profile on the central cathode target; 
 a first magnetic component for guiding a first arc that forms the first racetrack erosion profile; and 
 a second magnetic component for guiding a second arc that forms the second racetrack erosion profile, wherein the first magnetic component and the second magnetic component are located within the central cathode target, wherein the first anode and the second anode are equally spaced around the central cathode target on opposite sides of the central cathode target, wherein each of the first and second anodes is separated by an angle of about 180°; and 
 wherein the central cathode target rotates about a longitudinal axis of the central cathode target and each of the first and second anodes rotates about a respective longitudinal axis. 
 
     
     
       2. The arc deposition system of  claim 1  further comprising a controller. 
     
     
       3. The arc deposition system of  claim 2  further comprising a power supply system for biasing each of first anode and the second anode with respect to the central cathode target. 
     
     
       4. The arc deposition system of  claim 3 , wherein the power supply system includes a power supply subsystem to positively bias each anode of the first anode and the second anode with respect to the central cathode target. 
     
     
       5. The arc deposition system of  claim 4 , wherein the controller is configured to simultaneously activate each anode. 
     
     
       6. The arc deposition system of  claim 5 , wherein the controller is configured to activate the first anode and the second anode in an alternating manner. 
     
     
       7. The arc deposition system of  claim 3 , wherein each anode is positively biased with respect to the central cathode target with a DC voltage between −15 and −50 volts. 
     
     
       8. The arc deposition system of  claim 7 , wherein a current from 100 to 600 amps flows through each anode. 
     
     
       9. The arc deposition system of  claim 3  further comprising a striker for each anode to initiate an arc. 
     
     
       10. The arc deposition system of  claim 1  wherein the coating chamber is at an operating pressure between 0.5 and 50 mTorr.