Sputtering target for magnetic recording medium, and magnetic thin film

Abstract

Provided is a sputtering target or a film which is characterized by containing 0.1 to 10 mol % of an oxide of one or more types selected from FeO, Fe3O4, K2O, Na2O, PbO, and ZnO, 5 to 70 mol % of Pt, and the remainder being Fe. The present invention addresses the issue of providing a sputtering target capable of considerably reducing the particles caused by nonmagnetic materials and significantly improving the yield during deposition. It is thereby possible to deposit a quality magnetic recording layer and improve yield of a magnetic recording medium.

The invention claimed is: 
     
       1. A sputtering target consisting of 0.1 to 5 mol % of one or more oxides selected from the group consisting of FeO, Fe 3 O 4 , K 2 O, Na 2 O, PbO, and ZnO as a low-viscosity oxide, 1 to 50 mol % of boron carbide as a non-magnetic phase, 1 to 30 mol % of one or more elements selected from the group consisting of Ga, Ge, Ir, Re, Rh, and Zn, 5 to 70 mol % of Pt, and the remainder being Fe, wherein the sputtering target is a sintered body. 
     
     
       2. The sputtering target according to  claim 1 , wherein at least one of the low-viscosity oxide or the non-magnetic phase exists as nonmagnetic particles within the sputtering target, and wherein an average area per nonmagnetic particle is 0.1 to 2000 μm 2 . 
     
     
       3. The sputtering target according to  claim 1 , wherein the low-viscosity oxide exists as nonmagnetic particles within the sputtering target, and wherein an average area per nonmagnetic particle is 0.1 to 2000 μm 2 . 
     
     
       4. A film produced by a process using the sputtering target according to  claim 1 .