US11646187B2ActiveUtilityA1

Surface-assisted laser desorption/ionization method, mass spectrometry method and mass spectrometry device

Assignee: HAMAMATSU PHOTONICS KKPriority: Sep 3, 2015Filed: Sep 2, 2021Granted: May 9, 2023
Est. expirySep 3, 2035(~9.1 yrs left)· nominal 20-yr term from priority
H01J 49/164H01J 49/26H01J 49/0004G01N 33/6851G01N 27/64H01J 49/0418G01N 27/623G01N 1/2806G01N 1/2813
72
PatentIndex Score
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Cited by
78
References
10
Claims

Abstract

A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.

Claims

exact text as granted — not AI-modified
The invention claimed is: 
     
       1. A surface-assisted laser desorption/ionization method comprising:
 a first process of preparing a sample support having a substrate in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided and a conductive layer that is formed of a conductive material and covers at least the one surface; 
 a second process of placing a sample on a sample stage, arranging the sample support on the sample such that the other surface faces the sample, and fixing the sample support to the sample stage via an adhesion layer disposed between the sample support and the sample stage; and 
 a third process of applying a laser beam to the one surface in a state in which the sample support is fixed to the sample stage via the adhesion layer and ionizing the sample moved from the other surface side to the one surface side via the through-holes due to a capillary phenomenon. 
 
     
     
       2. The surface-assisted laser desorption/ionization method according to  claim 1 , wherein the adhesion layer is a double-sided tape that includes a first adhesive face adhered to the sample support and a second adhesive face adhered to the sample stage. 
     
     
       3. The surface-assisted laser desorption/ionization method according to  claim 1 , wherein the adhesion layer has conductivity. 
     
     
       4. The surface-assisted laser desorption/ionization method according to  claim 1 , wherein the substrate is formed by anodizing a valve metal or silicon. 
     
     
       5. The surface-assisted laser desorption/ionization method according to  claim 1 , wherein each of the through-holes has a width of 1 to 700 nm. 
     
     
       6. The surface-assisted laser desorption/ionization method according to  claim 1 , wherein the substrate has a thickness of 5 to 10 μm. 
     
     
       7. The surface-assisted laser desorption/ionization method according to  claim 1 , wherein the sample support further includes a frame mounted on an outer edge of the one surface of the substrate. 
     
     
       8. A mass spectrometry method comprising:
 each of the processes of the surface-assisted laser desorption/ionization method according to  claim 1 ; 
 a fourth process of detecting the sample ionized in the third process; and 
 a fifth process of imaging a two-dimensional distribution map of sample molecules composing the sample on the basis of detection result of the ionized sample. 
 
     
     
       9. The mass spectrometry method according to  claim 8 , wherein the application of the laser beam in the third process and the detection of the ionized sample in the fourth process are performed at each application position while changing application positions of the laser beam. 
     
     
       10. A surface-assisted laser desorption/ionization method comprising:
 a first process of preparing a sample support having a substrate which is formed of a conductive material and in which a plurality of through-holes passing from one surface thereof to the other surface thereof are provided; 
 a second process of placing a sample on a sample stage, arranging the sample support on the sample such that the other surface is in contact with the sample, and fixing the sample support to the sample stage via an adhesion layer disposed between the sample support and the sample stage; and 
 a third process of applying a laser beam to the one surface in a state in which the sample support is fixed to the sample stage via the adhesion layer and ionizing the sample moved from the other surface side to the one surface side via the through-holes due to a capillary phenomenon.

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