US10864565B2ActiveUtilityA1

Surface texturing of deforming tools

Assignee: SMS GROUP GMBHPriority: Nov 28, 2014Filed: Oct 21, 2015Granted: Dec 15, 2020
Est. expiryNov 28, 2034(~8.4 yrs left)· nominal 20-yr term from priority
B21H 8/00B21B 27/00Y10T29/4956B31F 1/07B21B 27/005B21B 2001/228B21H 8/005B21B 1/227B44B 5/026B44B 5/0047
41
PatentIndex Score
0
Cited by
24
References
10
Claims

Abstract

A method of producing a deforming tool ( 2 ) having a structured embossing surface ( 4 ) which can be brought into contact with a surface of a substrate ( 1 ) for plastic deformation of the substrate, includes the steps of determining a target structure to be produced on the substrate ( 1 ); geometrically distorting the target structure, such that an embossing image structure is obtained; inverting the embossing image structure, such that the embossing structure for the embossed surface ( 4 ) is obtained; and producing the embossing surface ( 4 ) of the deforming tool ( 2 ) according to the embossing structure.

Claims

exact text as granted — not AI-modified
The invention claimed is: 
     
       1. A method of producing a deforming tool ( 2 ) having a structured embossing surface ( 4 ) which is brought into contact with a surface of a substrate ( 1 ) for plastic deformation of the substrate, the method comprising:
 determining a target structure to be produced on the substrate ( 1 ); 
 geometrically transforming the target structure along at least one main direction along which the substrate is deformed during the plastic deformation, such that an embossing image structure is obtained; 
 inverting the obtained embossing image structure, such that an embossing structure for the structured embossing surface ( 4 ) is obtained; and 
 producing the deforming tool ( 2 ) having the structured embossing surface ( 4 ) comprising the obtained embossing structure. 
 
     
     
       2. The method according to  claim 1 ; characterized in that the target structure is defined by a transfer function the parameters of which comprise the embossing structure and one or more process parameters. 
     
     
       3. The method according to  claim 2 ; characterized in that one or more of the process parameters describe the deformation behavior of the substrate ( 1 ) during the plastic deformation along one or more main directions. 
     
     
       4. The method according to  claim 3 ; characterized in that the process parameters are comprised of at least one of the following parameters: a flow tension of the substrate ( 1 ), a geometric parameter of the embossing surface ( 4 ), an elongation of the substrate ( 1 ) in the deformation along a main direction, an embossing speed, a tension along the one or more main directions during the deformation, and a coefficient of friction between the embossing surface ( 4 ) and the substrate ( 1 ). 
     
     
       5. The method according to  claim 1 ; characterized in that the deforming tool ( 2 ) comprises a working roll ( 30 ). 
     
     
       6. The method according to  claim 5 ; characterized in that the target structure is described by a transfer function the parameters of which are comprised of the embossing structure and at least one of, the following parameters: a flow tension of the substrate ( 1 ), a diameter of the working roll ( 3 ), an elongation of the substrate ( 1 ) along the rolling direction, a rolling speed, the substrate tension at an entrance to the working roll ( 3 ), the substrate tension at an exit from the working roll ( 3 ), and the friction in the roll gap. 
     
     
       7. The method of  claim 5 , wherein the deforming tool comprises a dressing roll. 
     
     
       8. The method according to one  claim 1 ; characterized in that the substrate ( 1 ) is a sheet or plate, preferably a sheet or plate of metal. 
     
     
       9. The method according to  claim 1 ; characterized in that the embossing structure has an anisotropic characteristic, wherewith the corresponding characteristic in the target structure is isotropic. 
     
     
       10. The method according to  claim 1 ; characterized in that the embossing surface ( 4 ) is produced by at least one of the following techniques: shot blast texturing (SBT), electrical discharge texturing (EDT), laser texturing (LT), electron beam texturing (EBT), and Pretex texturing.

Join the waitlist — get patent alerts

Track US10864565B2 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.