Method of fabricating color filter

Abstract

A method of fabricating a color filter is provided. In the method of fabricating the color filter, a patterned sacrificial layer having a thickness difference is formed on a substrate such that a patterned black photosensitive spacing material layer is formed by a single-tone photomask or a half-tone photomask and has effects of an original black matrix, a main spacer, and a sub-spacer. Thus, production costs can be reduced and a high yield can be carried out.

The invention claimed is: 
     
       1. A method of fabricating a color filter, comprising steps of:
 providing a substrate; 
 forming a patterned sacrificial layer on the substrate, wherein the patterned sacrificial layer comprises a first sacrificial pattern region and a second sacrificial pattern region, wherein the first sacrificial pattern region is adjacent to the second sacrificial pattern region, and a thickness of the first sacrificial pattern region is greater than a thickness of the second sacrificial pattern region, wherein a thickness difference between the first sacrificial pattern region and the second sacrificial pattern region is between 0.8 and 1.5 micrometers, and a width of the first sacrificial pattern region is between 10 and 25 micrometers; 
 forming a pixel layer on the patterned sacrificial layer, the pixel layer comprising a plurality of pixels, wherein a pixel boundary is defined between each two of the pixels adjacent to each other, and the pixel boundary is disposed on the first sacrificial pattern region, wherein each of the plurality of pixels comprises a plurality of sub-pixels, wherein a sub-pixel boundary is defined between each two of the sub-pixels adjacent to each other; 
 forming a transparent conductive layer on the pixel layer; and 
 forming a patterned black photosensitive spacing material layer on the transparent conductive layer, wherein the patterned black photosensitive spacing material layer is formed by a single-tone photomask or a half-tone photomask. 
 
     
     
       2. The method of fabricating the color filter according to  claim 1 , wherein a portion of each of the sub-pixels adjacent to the sub-pixel boundary has a protrusion. 
     
     
       3. The method of fabricating the color filter according to  claim 2 , wherein a height of the protrusion is between 0.3 and 0.8 micrometers, and a width of the protrusion is between 10 and 30 micrometers. 
     
     
       4. The method of fabricating the color filter according to  claim 1 , wherein the second sacrificial pattern region further includes a plurality of grooves, wherein a portion of each of the sub-pixels adjacent to the sub-pixel boundary is formed in the grooves. 
     
     
       5. The method of fabricating the color filter according to  claim 4 , wherein the plurality of grooves pass through the patterned sacrificial layer. 
     
     
       6. The method of fabricating the color filter according to  claim 1 , wherein the patterned black photosensitive spacing material layer includes a first black pattern region, a second black pattern region, and a third black pattern region, wherein a position of the first black pattern region aligns to a position of the first sacrificial pattern region, a position of the second black pattern region aligns to a position at the sub-pixel boundary, and a position of the third black pattern region aligns to a position of the plurality of sub-pixels away from the sub-pixel boundary. 
     
     
       7. The method of fabricating the color filter according to  claim 6 , wherein a height difference is between the first black pattern region and the second black pattern region, wherein the height difference is between 0.3 and 0.8 micrometers. 
     
     
       8. A method of fabricating a color filter, comprising steps of:
 providing a substrate; 
 forming a patterned sacrificial layer on the substrate, wherein the patterned sacrificial layer comprises a first sacrificial pattern region and a second sacrificial pattern region, wherein the first sacrificial pattern region is adjacent to the second sacrificial pattern region, and a thickness of the first sacrificial pattern region is greater than a thickness of the second sacrificial pattern region; 
 forming a pixel layer on the patterned sacrificial layer, the pixel layer comprising a plurality of pixels, wherein a pixel boundary is defined between each two of the pixels adjacent to each other, and the pixel boundary is disposed on the first sacrificial pattern region; 
 forming a transparent conductive layer on the pixel layer; and 
 forming a patterned black photosensitive spacing material layer on the transparent conductive layer, wherein the patterned black photosensitive spacing material layer is formed by a single-tone photomask or a half-tone photomask. 
 
     
     
       9. The method of fabricating the color filter according to  claim 8 , wherein a thickness difference between the first sacrificial pattern region and the second sacrificial pattern region is between 0.8 and 1.5 micrometers, and a width of the first sacrificial pattern region is between 10 and 25 micrometers. 
     
     
       10. The method of fabricating the color filter according to  claim 8 , wherein each of the plurality of pixels comprises a plurality of sub-pixels, wherein a sub-pixel boundary is defined between each two of the sub-pixels adjacent to each other. 
     
     
       11. The method of fabricating the color filter according to  claim 10 , wherein a portion of each of the sub-pixels adjacent to the sub-pixel boundary has a protrusion. 
     
     
       12. The method of fabricating the color filter according to  claim 11 , wherein a height of the protrusion is between 0.3 and 0.8 micrometers, and a width of the protrusion is between 10 and 30 micrometers. 
     
     
       13. The method of fabricating the color filter according to  claim 10 , wherein the second sacrificial pattern region further includes a plurality of grooves, wherein a portion of each of the sub-pixels adjacent to the sub-pixel boundary is formed in the grooves. 
     
     
       14. The method of fabricating the color filter according to  claim 13 , wherein the plurality of grooves pass through the patterned sacrificial layer. 
     
     
       15. The method of fabricating the color filter according to  claim 10 , wherein the patterned black photosensitive spacing material layer includes a first black pattern region, a second black pattern region, and a third black pattern region, wherein a position of the first black pattern region aligns to a position of the first sacrificial pattern region, a position of the second black pattern region aligns to a position at the sub-pixel boundary, and a position of the third black pattern region aligns to a position of the plurality of sub-pixels away from the sub-pixel boundary. 
     
     
       16. The method of fabricating the color filter according to  claim 15 , wherein a height difference is between the first black pattern region and the second black pattern region, wherein the height difference is between 0.3 and 0.8 micrometers. 
     
     
       17. A method of fabricating a color filter, comprising steps of:
 providing a substrate; 
 forming a patterned sacrificial layer on the substrate, wherein the patterned sacrificial layer comprises a first sacrificial pattern region and a second sacrificial pattern region, wherein the first sacrificial pattern region is adjacent to the second sacrificial pattern region, and a thickness of the first sacrificial pattern region is greater than a thickness of the second sacrificial pattern region, wherein the patterned sacrificial layer is formed by a single-tone photomask or a half-tone photomask; 
 forming a pixel layer on the patterned sacrificial layer, the pixel layer comprising a plurality of pixels, wherein a pixel boundary is defined between each two of the pixels adjacent to each other, and the pixel boundary is disposed on the first sacrificial pattern region; 
 forming a transparent conductive layer on the pixel layer; and 
 forming a patterned black photosensitive spacing material layer on the transparent conductive layer, wherein the patterned black photosensitive spacing material layer is formed by the single-tone photomask or the half-tone photomask. 
 
     
     
       18. The method of fabricating the color filter according to  claim 17 , wherein a thickness difference between the first sacrificial pattern region and the second sacrificial pattern region is between 0.8 and 1.5 micrometers, and a width of the first sacrificial pattern region is between 10 and 25 micrometers. 
     
     
       19. The method of fabricating the color filter according to  claim 17 , wherein each of the plurality of pixels comprises a plurality of sub-pixels, wherein a sub-pixel boundary is defined between each two of the sub-pixels adjacent to each other. 
     
     
       20. The method of fabricating the color filter according to  claim 19 , wherein a portion of each of the sub-pixels adjacent to the sub-pixel boundary has a protrusion.