Display screen and manufacturing method thereof and display device

Abstract

A display screen, a manufacturing method thereof, and a display device are disclosed. The display screen includes a base substrate, a thin film transistor located on the base substrate, the thin film transistor including a metal layer, at least one of a light-absorbing material layer or a scattering structure disposed between the base substrate and the metal layer in a direction perpendicular to the base substrate.

The invention claimed is: 
     
       1. A display screen, comprising:
 a base substrate, 
 a thin film transistor, located on the base substrate, comprising a metal layer; and 
 a light-absorbing material layer and a scattering structure, located between the base substrate and the metal layer in a direction perpendicular to the base substrate, 
 wherein in the direction perpendicular to the base substrate, the scattering structure is located between the metal layer and the light-absorbing material layer. 
 
     
     
       2. The display screen according to  claim 1 , wherein light-absorbing ability of the light-absorbing material layer is greater than that of the metal layer. 
     
     
       3. The display screen according to  claim 2 , wherein at least one of the light-absorbing material layer and the scattering structure is in direct contact with the metal layer. 
     
     
       4. The display screen according to  claim 1 , wherein the at least one of the light-absorbing material layer and the scattering structure is in direct contact with the metal layer. 
     
     
       5. The display screen according to  claim 1 , wherein a part of a surface of the base substrate facing the thin film transistor is served as the scattering structure. 
     
     
       6. The display screen according to  claim 1 , wherein at least a part of a surface of the metal layer facing the base substrate is served as the scattering structure. 
     
     
       7. The display screen according to  claim 1 , wherein the light-absorbing material layer is in direct contact with the scattering structure. 
     
     
       8. The display screen according to  claim 1 , wherein an orthographic projection of the metal layer on the base substrate is within an orthographic projection of at least one of the light-absorbing material layer and the scattering structure on the base substrate. 
     
     
       9. The display screen according to  claim 1 , wherein the metal layer comprises at least one selected from the group consisting of a gate electrode metal layer, a source electrode metal layer and a drain electrode metal layer. 
     
     
       10. The display screen according to  claim 1 , wherein the scattering structure and the light-absorbing material layer are sequentially disposed in a light exit direction of the display screen. 
     
     
       11. The display screen according to  claim 1 , further comprising a first interlayer insulation layer and a second interlayer insulation layer disposed between the light-absorbing material layer and the metal layer, and
 wherein the scattering structure is provided at an interface of the first interlayer insulation layer and the second interlayer insulation layer. 
 
     
     
       12. A display device, comprising the display screen according to  claim 1 . 
     
     
       13. A manufacturing method of a display screen, comprising:
 providing a base substrate; 
 forming a thin film transistor on the base substrate, the thin film transistor comprising a metal layer; and 
 providing a light-absorbing material layer and a scattering structure, between the metal layer and the base substrate in a direction perpendicular to the base substrate, 
 wherein in the direction perpendicular to the base substrate, the scattering structure is located between the metal layer and the light-absorbing material layer. 
 
     
     
       14. The manufacturing method of the display screen according to  claim 13 , wherein at least one of the light-absorbing material layer and the scattering structure is in direct contact with the metal layer. 
     
     
       15. The manufacturing method of the display screen according to  claim 13 , wherein providing the light-absorbing material layer and the scattering structure between the base substrate and the metal layer comprises:
 treating a portion of a surface of the base substrate facing the thin film transistor so as to be served as the scattering structure. 
 
     
     
       16. The manufacturing method of the display screen according to  claim 13 , wherein providing the light-absorbing material layer and the scattering structure between the metal layer and the base substrate comprises:
 treating at least a portion of a surface of the metal layer facing the base substrate so as to be served as the scattering structure. 
 
     
     
       17. The manufacturing method of the display screen according to  claim 13 , wherein the light-absorbing material layer is in direct contact with the scattering structure. 
     
     
       18. The manufacturing method of the display screen according to  claim 13 , wherein an orthographic projection of the metal layer on the base substrate is within an orthographic projection of at least one of the light-absorbing material layer and the scattering structure on the base substrate. 
     
     
       19. The manufacturing method of the display screen according to  claim 13 , wherein the metal layer comprises at least one selected from the group consisting of a gate electrode metal layer, a source electrode metal layer and a drain electrode metal layer. 
     
     
       20. The manufacturing method of the display screen according to  claim 13 , wherein the scattering structure and the light-absorbing material layer are sequentially disposed in a light exit direction of the display screen.