Inventor · disambiguated record
Thomas Winter
Also filed as: WINTER THOMAS · WINTER THOMAS E
12 granted patents·5 pending applications·143 citations·filing 2004–2010
91Inventor score
Top patents by PatentIndex Score
17 records- 0194US7531368B2In-line lithography and etch systemTOKYO ELECTRON LTD·Filed 2007·Granted May 12, 2009·28 cites·41 claims
- 0291US7373216B1Method and apparatus for verifying a site-dependent waferTOKYO ELECTRON LTD·Filed 2007·Granted May 13, 2008·38 cites·50 claims
- 0390US7842519B2In-line lithography and etch systemTOKYO ELECTRON LTD·Filed 2009·Granted Nov 30, 2010·11 cites·20 claims
- 0487US7596423B2Method and apparatus for verifying a site-dependent procedureTOKYO ELECTRON LTD·Filed 2007·Granted Sep 29, 2009·16 cites·44 claims
- 0583US7729795B2Method and apparatus for verifying a site-dependent waferTOKYO ELECTRON LTD·Filed 2008·Granted Jun 1, 2010·12 cites·20 claims
- 0682US7741583B2Bake plate lid cleaner and cleaning methodTOKYO ELECTRON LTD·Filed 2007·Granted Jun 22, 2010·9 cites·18 claims
- 0773US7935545B2Method and apparatus for performing a site-dependent dual patterning procedureTOKYO ELECTRON LTD·Filed 2007·Granted May 3, 2011·5 cites·30 claims
- 0871US7670643B2Method and system for dispensing resist solutionTOKYO ELECTRON LTD·Filed 2004·Granted Mar 2, 2010·13 cites·20 claims
- 0970US7783374B2Method and apparatus for performing a site-dependent dual damascene procedureTOKYO ELECTRON LTD·Filed 2007·Granted Aug 24, 2010·4 cites·12 claims
- 1068US7673582B2Apparatus and method for removing an edge bead of a spin-coated layerTOKYO ELECTRON LTD·Filed 2006·Granted Mar 9, 2010·3 cites·5 claims
- 1163US7650200B2Method and apparatus for creating a site-dependent evaluation libraryTOKYO ELECTRON LTD·Filed 2007·Granted Jan 19, 2010·4 cites·24 claims
- 1254US2009317546A1Method and system for dispensing resist solutionTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1344US2009211602A1System and Method For Removing Edge-Bead MaterialTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1444US2009211604A1System and Method For Removing Edge-Bead MaterialTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1544US2008241354A1Apparatus and methods for curing a layer by monitoring gas species evolved during bakingTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1644US2009211603A1System and Method For Removing Post-Etch ResidueTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1739US8808788B2Processing a wafer with a post application bake (PAB) procedureWINTER THOMAS E·Filed 2010·Granted Aug 19, 2014·0 cites·18 claims
Join the waitlist — get patent alerts
Get an alert when Thomas Winter files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →