Inventor · disambiguated record
Stefan Michiel Witte
Also filed as: WITTE STEFAN MICHIEL
10 granted patents·2 pending applications·37 citations·filing 2013–2021
85Inventor score
Files withASML NETHERLANDS BV9STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INST1STICHTING VU-VUMC1VRIJE UNIV AMSTERDAM1
Top patents by PatentIndex Score
12 records- 0193US11391677B2Methods and apparatus for predicting performance of a measurement method, measurement method and apparatusASML NETHERLANDS BV·Filed 2020·Granted Jul 19, 2022·5 cites·20 claims
- 0293US9632039B2Inspection apparatus, inspection method and manufacturing methodVRIJE UNIV AMSTERDAM·Filed 2015·Granted Apr 25, 2017·14 cites·19 claims
- 0392US10648919B2Methods and apparatus for predicting performance of a measurement method, measurement method and apparatusASML NETHERLANDS BV·Filed 2018·Granted May 12, 2020·7 cites·17 claims
- 0487US10788765B2Method and apparatus for measuring a structure on a substrateASML NETHERLANDS BV·Filed 2018·Granted Sep 29, 2020·4 cites·20 claims
- 0587US10088762B2Inspection apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Oct 2, 2018·4 cites·12 claims
- 0679US11042096B2Alignment measurement systemASML NETHERLANDS BV·Filed 2018·Granted Jun 22, 2021·2 cites·21 claims
- 0769US10459347B2Inspection method, inspection apparatus and illumination method and apparatusASML NETHERLANDS BV·Filed 2017·Granted Oct 29, 2019·1 cites·17 claims
- 0861US12474267B2Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatusesASML NETHERLANDS BV·Filed 2021·Granted Nov 18, 2025·0 cites·19 claims
- 0945US10386735B2Lithographic apparatus alignment sensor and methodASML NETHERLANDS BV·Filed 2016·Granted Aug 20, 2019·0 cites·16 claims
- 1042US12411421B2Metrology apparatus based on high harmonic generation and associated methodASML NETHERLANDS BV·Filed 2021·Granted Sep 9, 2025·0 cites·14 claims
- 1141US2015234170A1Microscopic Imaging Apparatus and Method to Detect a Microscopic ImageSTICHTING VU VUMC·Filed 2013·Application pending·0 cites
- 1239US2024003809A1Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structureSTICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INST·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →