Inventor · disambiguated record
Norihiro Katakura
Also filed as: KATAKURA NORIHIRO
5 granted patents·3 pending applications·96 citations·filing 1997–2002
82Inventor score
Technology areasG03F
Files withNIKON CORP8
Top patents by PatentIndex Score
8 records- 0178US5972794ASilicon stencil mask manufacturing methodNIKON CORP·Filed 1998·Granted Oct 26, 1999·47 cites·2 claims
- 0272US6428937B1Methods for fabricating reticle blanks for use in making charged-particle-beam microlithography reticles, and reticle blanks and reticles formed using such methodsNIKON CORP·Filed 2000·Granted Aug 6, 2002·14 cites·20 claims
- 0368US6531249B1Reticle blanks for charged-particle-beam microlithography and methods for making sameNIKON CORP·Filed 2000·Granted Mar 11, 2003·11 cites·9 claims
- 0457US5912095AMask substrate manufacturing methodsNIKON CORP·Filed 1997·Granted Jun 15, 1999·19 cites·23 claims
- 0535US6287731B1Methods for making microlithography masks utilizing temperature controlNIKON CORP·Filed 1999·Granted Sep 11, 2001·5 cites·9 claims
- 0633US2002139770A1Methods for fabricating segmented reticle blanks having uniformly machined grillage, and reticle blanks and reticles formed therebyNIKON CORP·Filed 2002·Application pending·0 cites
- 0733US2003049545A1Methods for manufacturing reticles and reticle blanks exhibiting reduced warp and resist stress for use in charged-particle-beam microlithographyNIKON CORP·Filed 2002·Application pending·0 cites
- 0833US2002122993A1Stencil reticles for charged-particle-beam microlithography, and fabrication methods for making sameNIKON CORP·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →