Inventor · disambiguated record
Jeffrey Robert Stack
Also filed as: STACK JEFFREY R · STACK JEFFREY ROBERT
7 granted patents·7 pending applications·55 citations·filing 2006–2020
76Inventor score
Top patents by PatentIndex Score
14 records- 0194US7234224B1Curved grooving of polishing padsROHM & HAAS ELECT MAT·Filed 2006·Granted Jun 26, 2007·53 cites·10 claims
- 0282US9802293B1Method to shape the surface of chemical mechanical polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 31, 2017·2 cites·13 claims
- 0361US2019381575A1Gelling reduction tool for grooving chemical mechanical planarization polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2019·Application pending·0 cites
- 0457US2020381258A1Biased pulse cmp groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2020·Application pending·0 cites
- 0554US2018281076A1Gelling reduction tool for grooving chemical mechanical planarization polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Application pending·0 cites
- 0651US10777418B2Biased pulse CMP groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Sep 15, 2020·0 cites·10 claims
- 0745US2007034614A1Method of forming grooves in chemical mechanical polishing pad utilizing laser ablationMCCLAIN HARRY G·Filed 2006·Application pending·0 cites
- 0842US2018085891A1Apparatus for shaping the surface of chemical mechanical polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Application pending·0 cites
- 0942US2018169827A1Methods for making chemical mechanical planarization (cmp) polishing pads having integral windowsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Application pending·0 cites
- 1042US2018085888A1Chemical mechanical polishing pads having a consistent pad surface microtextureROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Application pending·0 cites
- 1137US10857647B2High-rate CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·8 claims
- 1237US10586708B2Uniform CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 10, 2020·0 cites·10 claims
- 1336US10857648B2Trapezoidal CMP groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·12 claims
- 1436US10861702B2Controlled residence CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →