Inventor · disambiguated record
Daniel Peter
Also filed as: PETER DANIEL
10 granted patents·6 pending applications·24 citations·filing 2016–2024
84Inventor score
Files withLAM RES CORP16
Top patents by PatentIndex Score
16 records- 0197US12105422B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2020·Granted Oct 1, 2024·13 cites·12 claims
- 0295US12510825B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·33 claims
- 0395US12510826B2Photoresist development with halide chemistriesLAM RES CORP·Filed 2024·Granted Dec 30, 2025·2 cites·12 claims
- 0493US12474640B2Integration of dry development and etch processes for EUV patterning in a single process chamberLAM RES CORP·Filed 2024·Granted Nov 18, 2025·4 cites·20 claims
- 0579US10043672B2Selective self-aligned patterning of silicon germanium, germanium and type III/V materials using a sulfur-containing maskLAM RES CORP·Filed 2016·Granted Aug 7, 2018·2 cites·24 claims
- 0678US12027375B2Selective etch using a sacrificial maskLAM RES CORP·Filed 2020·Granted Jul 2, 2024·1 cites·21 claims
- 0758US10741405B2Selective self-aligned patterning of silicon germanium, germanium and type III/V materials using a sulfur-containing maskLAM RES CORP·Filed 2018·Granted Aug 11, 2020·0 cites·26 claims
- 0853US11450532B2Deposition of self assembled monolayer for enabling selective deposition and etchLAM RES CORP·Filed 2020·Granted Sep 20, 2022·0 cites·20 claims
- 0953US2024355650A1Dry development apparatus and methods for volatilization of dry development byproducts in wafersLAM RES CORP·Filed 2022·Application pending·0 cites
- 1051US2025093781A1Rework of metal-containing photoresistLAM RES CORP·Filed 2022·Application pending·0 cites
- 1149US2024036474A1Control of metallic contamination from metal-containing photoresistLAM RES CORP·Filed 2022·Application pending·0 cites
- 1248US12341021B2Selective etch using deposition of a metalloid or metal containing hardmaskLAM RES CORP·Filed 2021·Granted Jun 24, 2025·0 cites·19 claims
- 1347US2023314954A1Dry backside and bevel edge clean of photoresistLAM RES CORP·Filed 2021·Application pending·0 cites
- 1447US2023047486A1Alloy film etchLAM RES CORP·Filed 2021·Application pending·0 cites
- 1544US2022344136A1Dry chamber clean of photoresist filmsLAM RES CORP·Filed 2020·Application pending·0 cites
- 1643US11521860B2Selectively etching for nanowiresLAM RES CORP·Filed 2019·Granted Dec 6, 2022·0 cites·18 claims
Join the waitlist — get patent alerts
Get an alert when Daniel Peter files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →