Inventor · disambiguated record
Janine Kardokus
Also filed as: KARDOKUS JANINE · KARDOKUS JANINE K · KARDOKUS JANINE KIYABU
20 granted patents·14 pending applications·600 citations·filing 1994–2019
96Inventor score
Files withHONEYWELL INT INC11JOHNSON MATTHEY ELECT INC5KARDOKUS JANINE K4APPLIED MATERIALS INC3ASML NETHERLANDS BV2
Top patents by PatentIndex Score
34 records- 0197US5590389ASputtering target with ultra-fine, oriented grains and method of making sameJOHNSON MATTHEY ELECT INC·Filed 1994·Granted Dec 31, 1996·88 cites·18 claims
- 0295US5809393ASputtering target with ultra-fine, oriented grains and method of making sameJOHNSON MATTHEY ELECT INC·Filed 1995·Granted Sep 15, 1998·71 cites·17 claims
- 0391US6113761ACopper sputtering target assembly and method of making sameJOHNSON MATTHEY ELECT INC·Filed 1999·Granted Sep 5, 2000·74 cites·9 claims
- 0490US5863398AHot pressed and sintered sputtering target assemblies and method for making sameJOHNSON MATTHEY ELECTONICS INC·Filed 1996·Granted Jan 26, 1999·100 cites·9 claims
- 0590US5780755ASputtering target with ultra-fine, oriented grains and method of making sameJOHNSON MATTHEY ELECT INC·Filed 1995·Granted Jul 14, 1998·41 cites·8 claims
- 0689US6765178B2Chamber for uniform substrate heatingAPPLIED MATERIALS INC·Filed 2001·Granted Jul 20, 2004·37 cites·29 claims
- 0783US7022948B2Chamber for uniform substrate heatingAPPLIED MATERIALS INC·Filed 2004·Granted Apr 4, 2006·23 cites·11 claims
- 0882US6331234B1Copper sputtering target assembly and method of making sameHONEYWELL INT INC·Filed 2000·Granted Dec 18, 2001·18 cites·15 claims
- 0979US6849139B2Methods of forming copper-containing sputtering targetsHONEYWELL INT INC·Filed 2001·Granted Feb 1, 2005·19 cites·10 claims
- 1075US6645427B1Copper sputtering target assembly and method of making sameHONEYWELL INT INC·Filed 2000·Granted Nov 11, 2003·11 cites·10 claims
- 1174US5803342AMethod of making high purity copper sputtering targetsJOHNSON MATTHEY ELECT INC·Filed 1996·Granted Sep 8, 1998·33 cites·4 claims
- 1272US6451185B2Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making sameHONEYWELL INT INC·Filed 2001·Granted Sep 17, 2002·16 cites·8 claims
- 1369US6858102B1Copper-containing sputtering targets, and methods of forming copper-containing sputtering targetsHONEYWELL INT INC·Filed 2000·Granted Feb 22, 2005·11 cites·8 claims
- 1467US9279178B2Manufacturing design and processing methods and apparatus for sputtering targetsKARDOKUS JANINE K·Filed 2008·Granted Mar 8, 2016·3 cites·21 claims
- 1566US9246298B2Corrosion resistant electrodes for laser chambersCymer LLC·Filed 2013·Granted Jan 26, 2016·1 cites·16 claims
- 1665US6274015B1Diffusion bonded sputtering target assembly with precipitation hardened backing plate and method of making sameHONEYWELL INT INC·Filed 1997·Granted Aug 14, 2001·28 cites·17 claims
- 1764US8030082B2Liquid-particle analysis of metal materialsHONEYWELL INT INC·Filed 2006·Granted Oct 4, 2011·1 cites·20 claims
- 1863US6555250B2Ni-plated target diffusion bonded to a backing plate and method of making sameHONEYWELL INT INC·Filed 1999·Granted Apr 29, 2003·25 cites·11 claims
- 1960US11317501B2Method of purifying target material for an EUV light sourceASML NETHERLANDS BV·Filed 2019·Granted Apr 26, 2022·0 cites·15 claims
- 2053US10455680B2Method and apparatus for purifying target material for EUV light sourceASML NETHERLANDS BV·Filed 2016·Granted Oct 22, 2019·0 cites·17 claims
- 2153US2016126689A1Corrosion Resistant Electrodes for Laser ChambersCymer LLC·Filed 2015·Application pending·0 cites
- 2247US2005279637A1Methods of forming target/backing plate assemblies comprising ruthenium, methods of electrolytically processing ruthenium, and container-shaped physical vapor deposition targets comprising rutheniumPINTER MICHAEL R·Filed 2004·Application pending·0 cites
- 2346US2007251819A1Hollow cathode magnetron sputtering targets and methods of forming hollow cathode magnetron sputtering targetsKARDOKUS JANINE K·Filed 2006·Application pending·0 cites
- 2446US2007099332A1Chalcogenide PVD components and methods of formationHONEYWELL INT INC·Filed 2006·Application pending·0 cites
- 2544US2009065354A1Sputtering targets comprising a novel manufacturing design, methods of production and uses thereofKARDOKUS JANINE K·Filed 2007·Application pending·0 cites
- 2644US2008110746A1Novel manufacturing design and processing methods and apparatus for sputtering targetsKARDOKUS JANINE K·Filed 2006·Application pending·0 cites
- 2744US2009078570A1Target/backing plate constructions, and methods of forming target/backing plate constructionsYI WUWEN·Filed 2008·Application pending·0 cites
- 2843US2008112878A1Alloy casting apparatuses and chalcogenide compound synthesis methodsHONEYWELL INT INC·Filed 2006·Application pending·0 cites
- 2943US2006062686A1PVD target support members and methods of makingPINTER MICHAEL R·Filed 2004·Application pending·0 cites
- 3042US2007007505A1Chalcogenide PVD componentsHONEYWELL INT INC·Filed 2005·Application pending·0 cites
- 3141US2007084527A1High-strength mechanical and structural components, and methods of making high-strength componentsFERRASSE STEPHANE·Filed 2005·Application pending·0 cites
- 3240US2008173541A1Target designs and related methods for reduced eddy currents, increased resistance and resistivity, and enhanced coolingLEE EAL·Filed 2007·Application pending·0 cites
- 3340US2007056688A1Methods of treating deposition process components to form particle traps, and deposition process components having particle traps thereonKIM JAEYEON·Filed 2004·Application pending·0 cites
- 3436US2003203123A1System and method for metal induced crystallization of polycrystalline thin film transistorsAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
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