Inventor · disambiguated record

Tung-Kai Chen

Also filed as: CHEN TUNG-KAI

9 granted patents·2 pending applications·0 citations·filing 2018–2025

77Inventor score

Technology areasH10P B24B

Files withTAIWAN SEMICONDUCTOR MFG CO LTD11

Top patents by PatentIndex Score

11 records

0182US2025308928A1Chemical mechanical polishing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
0281US12030159B2Chemical mechanical planarization toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jul 9, 2024·0 cites·20 claims
0379US2024395562A1Chemical mechanical polish slurry and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
0478US12300508B2Chemical mechanical polishing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 13, 2025·0 cites·20 claims
0572US12327734B2Chemical mechanical polish slurry and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 10, 2025·0 cites·20 claims
0671US11373879B2Chemical mechanical polishing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 28, 2022·0 cites·20 claims
0768US11854827B2Magnetic slurry for highly efficiency CMPTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Dec 26, 2023·0 cites·20 claims
0868US11712778B2Chemical mechanical planarization toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Aug 1, 2023·0 cites·20 claims
0961US11043396B2Chemical mechanical polish slurry and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 22, 2021·0 cites·20 claims
1061US10777423B2Chemical mechanical polishing methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Sep 15, 2020·0 cites·20 claims
1159US11056352B2Magnetic slurry for highly efficient CMPTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jul 6, 2021·0 cites·20 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →