Inventor · disambiguated record
Weitian Kou
Also filed as: KOU WEITIAN
12 granted patents·2 pending applications·16 citations·filing 2016–2023
86Inventor score
Files withASML NETHERLANDS BV14
Top patents by PatentIndex Score
14 records- 0194US10527958B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jan 7, 2020·7 cites·21 claims
- 0285US12044981B2Method and apparatus for optimization of lithographic processASML NETHERLANDS BV·Filed 2021·Granted Jul 23, 2024·1 cites·20 claims
- 0385US11029610B2Lithographic methodASML NETHERLANDS BV·Filed 2018·Granted Jun 8, 2021·2 cites·21 claims
- 0481US11782349B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2023·Granted Oct 10, 2023·0 cites·20 claims
- 0581US11448973B2Computational metrology based correction and controlASML NETHERLANDS BV·Filed 2018·Granted Sep 20, 2022·2 cites·21 claims
- 0680US11054813B2Method and apparatus for controlling an industrial process using product groupingASML NETHERLANDS BV·Filed 2016·Granted Jul 6, 2021·2 cites·20 claims
- 0779US10962887B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Mar 30, 2021·1 cites·20 claims
- 0877US11592753B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2022·Granted Feb 28, 2023·0 cites·20 claims
- 0977US10877381B2Methods of determining corrections for a patterning processASML NETHERLANDS BV·Filed 2017·Granted Dec 29, 2020·1 cites·20 claims
- 1072US11327407B2Methods of determining corrections for a patterning process, device manufacturing method, control system for a lithographic apparatus and lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted May 10, 2022·0 cites·20 claims
- 1169US2022365446A1Computational metrology based correction and controlASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1265US12124179B2Method of wafer alignment using at resolution metrology on product featuresASML NETHERLANDS BV·Filed 2021·Granted Oct 22, 2024·0 cites·20 claims
- 1358US11099487B2Method and apparatus for optimization of lithographic processASML NETHERLANDS BV·Filed 2018·Granted Aug 24, 2021·0 cites·21 claims
- 1440US2020050180A1Methods & apparatus for controlling an industrial processASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →