Inventor · disambiguated record
Heidi Cao
Also filed as: CAO HEIDI · CAO HEIDI B
11 granted patents·7 pending applications·513 citations·filing 2003–2008
88Inventor score
Top patents by PatentIndex Score
18 records- 0198US7005227B2One component EUV photoresistINTEL CORP·Filed 2004·Granted Feb 28, 2006·471 cites·8 claims
- 0286US7459260B2Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the methodINTEL CORP·Filed 2005·Granted Dec 2, 2008·9 cites·27 claims
- 0386US7374867B2Enhancing photoresist performance using electric fieldsINTEL CORP·Filed 2003·Granted May 20, 2008·21 cites·10 claims
- 0470US6872505B1Enabling chain scission of branched photoresistINTEL CORP·Filed 2003·Granted Mar 29, 2005·8 cites·9 claims
- 0563US7723008B2Photoactive adhesion promoter in a slamINTEL CORP·Filed 2005·Granted May 25, 2010·1 cites·6 claims
- 0654US2008220380A1Enhancing photoresist performance using electric fieldsBRISTOL ROBERT·Filed 2008·Application pending·0 cites
- 0753US7718528B2Photoactive adhesion promoter in a SLAMINTEL CORP·Filed 2007·Granted May 18, 2010·0 cites·9 claims
- 0852US7166413B2Enabling chain scission of branched photoresistINTEL CORP·Filed 2004·Granted Jan 23, 2007·2 cites·9 claims
- 0949US7226718B2Non-outgassing low activation energy resistINTEL CORP·Filed 2005·Granted Jun 5, 2007·0 cites·20 claims
- 1047US7147986B2Resist compounds including acid labile groups attached to polymeric chains at anhydride linkagesINTEL CORP·Filed 2004·Granted Dec 12, 2006·1 cites·15 claims
- 1142US7442487B2Low outgassing and non-crosslinking series of polymers for EUV negative tone photoresistsINTEL CORP·Filed 2003·Granted Oct 28, 2008·0 cites·29 claims
- 1242US2008076058A1Luminescent photoresistLEESON MICHAEL J·Filed 2006·Application pending·0 cites
- 1341US2007122734A1Molecular photoresistROBERTS JEANETTE M·Filed 2005·Application pending·0 cites
- 1439US7427463B2Photoresists with reduced outgassing for extreme ultraviolet lithographyINTEL CORP·Filed 2003·Granted Sep 23, 2008·0 cites·30 claims
- 1539US2006292500A1Cure during rinse to prevent resist collapseROBERTS JEANETTE·Filed 2005·Application pending·0 cites
- 1637US2005069818A1Absorptive resists in an extreme ultraviolet (EUV) imaging layerFiled 2003·Application pending·0 cites
- 1736US2004265748A1Pattern transfer of an extreme ultraviolet imaging layer via flood exposure of contact mask layer (EUV CML)Filed 2003·Application pending·0 cites
- 1835US2024219842A1Photoresist developerCHANDHOK MANISH·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →