Inventor · disambiguated record
Marius Ravensbergen
Also filed as: RAVENSBERGEN MARIUS
10 granted patents·1 pending application·79 citations·filing 2003–2011
86Inventor score
Top patents by PatentIndex Score
11 records- 0196US7525640B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 28, 2009·37 cites·23 claims
- 0284US7436484B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 14, 2008·20 cites·17 claims
- 0382US7999914B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Aug 16, 2011·5 cites·19 claims
- 0480US8089672B2Array element device control method and apparatusTINNEMANS PATRICIUS ALOYSIUS JACOBUS·Filed 2008·Granted Jan 3, 2012·6 cites·29 claims
- 0574US8052289B2Mirror array for lithographyASML NETHERLANDS BV·Filed 2006·Granted Nov 8, 2011·4 cites·14 claims
- 0658US6819400B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Nov 16, 2004·7 cites·20 claims
- 0749US8537330B2Lithographic apparatus, device manufacturing method and computer readable mediumLOOPSTRA ERIK ROELOF·Filed 2011·Granted Sep 17, 2013·0 cites·18 claims
- 0849US2007170376A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 0948US7375353B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·0 cites·20 claims
- 1038US7423721B2Lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Sep 9, 2008·0 cites·29 claims
- 1137US7800079B2Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Sep 21, 2010·0 cites·25 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →