Inventor · disambiguated record
Akitaka Makino
Also filed as: MAKINO AKITAKA
29 granted patents·12 pending applications·1,300 citations·filing 1993–2015
97Inventor score
Top patents by PatentIndex Score
41 records- 0199USD556704SGrounded electrode for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Dec 4, 2007·445 cites·1 claims
- 0298USD557226SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Dec 11, 2007·619 cites·1 claims
- 0390US7828928B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 9, 2010·10 cites·8 claims
- 0486US7335277B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Feb 26, 2008·24 cites·12 claims
- 0584USD557425SCover ring for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Dec 11, 2007·31 cites·1 claims
- 0683US8897906B2Wafer processing based on sensor detection and system learningOHASHI TOMOHIRO·Filed 2011·Granted Nov 25, 2014·8 cites·8 claims
- 0779US5458687AMethod of and apparatus for securing and cooling/heating a waferHITACHI LTD·Filed 1993·Granted Oct 17, 1995·67 cites·10 claims
- 0875US7247207B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Jul 24, 2007·11 cites·13 claims
- 0974US7641069B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Jan 5, 2010·3 cites·5 claims
- 1074US7194821B2Vacuum processing apparatus and vacuum processing methodHITACHI HIGH TECH CORP·Filed 2005·Granted Mar 27, 2007·12 cites·11 claims
- 1173US6850012B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Feb 1, 2005·10 cites·10 claims
- 1272US8569177B2Plasma processing apparatus and plasma processing methodOHASHI TOMOHIRO·Filed 2012·Granted Oct 29, 2013·3 cites·4 claims
- 1372US8148268B2Plasma treatment apparatus and plasma treatment methodSATO KOHEI·Filed 2008·Granted Apr 3, 2012·3 cites·5 claims
- 1471US8216420B2Plasma processing apparatusKAZUMI HIDEYUKI·Filed 2006·Granted Jul 10, 2012·4 cites·5 claims
- 1567US7833382B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 16, 2010·1 cites·11 claims
- 1666US7322561B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Jan 29, 2008·2 cites·15 claims
- 1764US7416633B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Aug 26, 2008·9 cites·3 claims
- 1863US8286822B2Vacuum processing apparatusTAUCHI SUSUMU·Filed 2010·Granted Oct 16, 2012·1 cites·18 claims
- 1961US11710619B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Jul 25, 2023·1 cites·8 claims
- 2059US5391260AVacuum processing apparatusHITACHI LTD·Filed 1993·Granted Feb 21, 1995·24 cites·12 claims
- 2157US7976632B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Jul 12, 2011·0 cites·10 claims
- 2252US7674351B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Mar 9, 2010·3 cites·10 claims
- 2351US8740011B2Vacuum processing apparatusTAUCHI SUSUMU·Filed 2011·Granted Jun 3, 2014·0 cites·19 claims
- 2448US8460467B2Vacuum processing apparatusMAKINO AKITAKA·Filed 2011·Granted Jun 11, 2013·0 cites·15 claims
- 2547US7807581B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2007·Granted Oct 5, 2010·0 cites·7 claims
- 2647US2008066859A1Plasma processing apparatus capable of adjusting pressure within processing chamberKOBAYASHI MICHIAKI·Filed 2006·Application pending·0 cites
- 2747US2009001052A1Plasma processing apparatus and plasma processing methodMAKINO AKITAKA·Filed 2008·Application pending·0 cites
- 2844US5607510AVacuum processing apparatusHITACHI LTD·Filed 1995·Granted Mar 4, 1997·9 cites·7 claims
- 2944US2015248994A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 3043US2015096685A1Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 3142US2007209759A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2006·Application pending·0 cites
- 3240US8048259B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Nov 1, 2011·0 cites·12 claims
- 3340US2006169671A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2005·Application pending·0 cites
- 3440US2006027324A1Plasma processing apparatus and plasma processing methodMAKINO AKITAKA·Filed 2005·Application pending·0 cites
- 3540US2009165952A1Vacuum processing apparatusTAUCHI SUSUMU·Filed 2008·Application pending·0 cites
- 3638US2006191482A1Apparatus and method for processing waferKANNO SEIICHIRO·Filed 2005·Application pending·0 cites
- 3737US2009214399A1Vacuum processing apparatusYATOMI MINORU·Filed 2008·Application pending·0 cites
- 3835US8100620B2Vacuum processing apparatusISOZAKI MASAKAZU·Filed 2008·Granted Jan 24, 2012·0 cites·4 claims
- 3934US10103007B2Plasma processing apparatus with gas feed and evacuation conduitHITACHI HIGH TECH CORP·Filed 2015·Granted Oct 16, 2018·0 cites·8 claims
- 4032US2016027621A1Plasma processing apparatus and sample stage fabricating methodHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
- 4129US2006054278A1Plasma processing apparatusMAKINO AKITAKA·Filed 2005·Application pending·0 cites
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