Inventor · disambiguated record
George E. Bailey
Also filed as: BAILEY GEORGE · BAILEY GEORGE E · BAILEY GEORGE EDWARD
14 granted patents·1 pending application·119 citations·filing 1998–2009
92Inventor score
Top patents by PatentIndex Score
15 records- 0187US6894762B1Dual source lithography for direct write applicationLSI LOGIC CORP·Filed 2002·Granted May 17, 2005·24 cites·31 claims
- 0283US6885436B1Optical error minimization in a semiconductor manufacturing apparatusLSI LOGIC CORP·Filed 2002·Granted Apr 26, 2005·17 cites·18 claims
- 0382US7023530B1Dual source lithography for direct write applicationLSI LOGIC CORP·Filed 2005·Granted Apr 4, 2006·5 cites·5 claims
- 0482US6782525B2Wafer process critical dimension, alignment, and registration analysis simulation toolLSI LOGIC CORP·Filed 2002·Granted Aug 24, 2004·23 cites·20 claims
- 0576US6934929B2Method for improving OPC modelingLSI LOGIC CORP·Filed 2003·Granted Aug 23, 2005·18 cites·15 claims
- 0672US7298458B2Optical error minimization in a semiconductor manufacturing apparatusLSI CORP·Filed 2006·Granted Nov 20, 2007·2 cites·5 claims
- 0771US7098996B1Optical error minimization in a semiconductor manufacturing apparatusLSI LOGIC CORP·Filed 2005·Granted Aug 29, 2006·2 cites·16 claims
- 0861US7005217B2Chromeless phase shift maskLSI LOGIC CORP·Filed 2003·Granted Feb 28, 2006·6 cites·20 claims
- 0961US6627466B1Method and apparatus for detecting backside contamination during fabrication of a semiconductor waferLSI LOGIC CORP·Filed 2002·Granted Sep 30, 2003·6 cites·10 claims
- 1053US2010225067A1Coated ring sealGM GLOBAL TECH OPERATIONS INC·Filed 2009·Application pending·0 cites
- 1151US7381502B2Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticleLSI LOGIC CORP·Filed 2004·Granted Jun 3, 2008·2 cites·8 claims
- 1242US6943055B2Method and apparatus for detecting backside contamination during fabrication of a semiconductor waferLSI LOGIC CORP·Filed 2003·Granted Sep 13, 2005·0 cites·6 claims
- 1341US6866970B2Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticleLSI LOGIC CORP·Filed 2002·Granted Mar 15, 2005·0 cites·14 claims
- 1437US6764749B2Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARCLSI LOGIC CORP·Filed 2002·Granted Jul 20, 2004·0 cites·16 claims
- 1535US6102143AShaped polycrystalline cutter elementsGEN ELECTRIC·Filed 1998·Granted Aug 15, 2000·14 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →