Inventor · disambiguated record
Barton Lane
Also filed as: LANE BARTON · LANE BARTON G · LANE III BARTON G · LANE III BARTON GEORGE
42 granted patents·20 pending applications·608 citations·filing 1989–2025
97Inventor score
Files withTOKYO ELECTRON LTD46PIVOTAL SYSTEMS CORP5FUNK MERRITT2MASSACHUSETTS INST TECHNOLOGY2MONKOWSKI JOSEPH R2
Top patents by PatentIndex Score
62 records- 0198US10991554B2Plasma processing system with synchronized signal modulationTOKYO ELECTRON LTD·Filed 2018·Granted Apr 27, 2021·49 cites·20 claims
- 0298US5061838AToroidal electron cyclotron resonance reactorMASSACHUSETTS INST TECHNOLOGY·Filed 1989·Granted Oct 29, 1991·360 cites·33 claims
- 0396US11600474B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Mar 7, 2023·6 cites·19 claims
- 0495US11348761B2Impedance matching apparatus and control methodTOKYO ELECTRON LTD·Filed 2020·Granted May 31, 2022·4 cites·6 claims
- 0592US7757541B1Techniques for calibration of gas flowsPIVOTAL SYSTEMS CORP·Filed 2007·Granted Jul 20, 2010·23 cites·30 claims
- 0690US12451327B2Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2022·Granted Oct 21, 2025·1 cites·9 claims
- 0789US11817296B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Nov 14, 2023·2 cites·20 claims
- 0889US11410832B2RF measurement system and methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 9, 2022·2 cites·22 claims
- 0989US8816281B2Ion energy analyzer and methods of manufacturing the sameFUNK MERRITT·Filed 2012·Granted Aug 26, 2014·16 cites·20 claims
- 1089US8237928B2Method and apparatus for identifying the chemical composition of a gasMONKOWSKI JOSEPH R·Filed 2011·Granted Aug 7, 2012·7 cites·10 claims
- 1188US12074390B2Parallel resonance antenna for radial plasma controlTOKYO ELECTRON LTD·Filed 2022·Granted Aug 27, 2024·1 cites·22 claims
- 1288US9087677B2Methods of electrical signaling in an ion energy analyzerFUNK MERRITT·Filed 2012·Granted Jul 21, 2015·8 cites·20 claims
- 1388US7937232B1Data timestamp managementPIVOTAL SYSTEMS CORP·Filed 2007·Granted May 3, 2011·32 cites·13 claims
- 1487US8847159B2Ion energy analyzerCHEN LEE·Filed 2012·Granted Sep 30, 2014·6 cites·25 claims
- 1586US8393197B2Method and apparatus for the measurement of atmospheric leaks in the presence of chamber outgassingMONKOWSKI JOSEPH R·Filed 2009·Granted Mar 12, 2013·12 cites·20 claims
- 1685US9396900B2Radio frequency (RF) power coupling system utilizing multiple RF power coupling elements for control of plasma propertiesTOKYO ELECTRON LTD·Filed 2012·Granted Jul 19, 2016·10 cites·18 claims
- 1784US2025014865A1Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1883US10002744B2System and method for controlling plasma densityTOKYO ELECTRON LTD·Filed 2014·Granted Jun 19, 2018·5 cites·10 claims
- 1982US7695984B1Use of modeled parameters for real-time semiconductor process metrology applied to semiconductor processesPIVOTAL SYSTEMS CORP·Filed 2006·Granted Apr 13, 2010·8 cites·22 claims
- 2082US2025391665A1Plasma processing with magnetic ring x pointTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2181US7940395B2Method and apparatus for identifying the chemical composition of a gasPIVOTAL SYSTEMS CORP·Filed 2008·Granted May 10, 2011·6 cites·38 claims
- 2279US12176183B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2023·Granted Dec 24, 2024·0 cites·18 claims
- 2379US12119207B2Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2022·Granted Oct 15, 2024·0 cites·20 claims
- 2478US11201035B2Radical source with contained plasmaTOKYO ELECTRON LTD·Filed 2018·Granted Dec 14, 2021·2 cites·14 claims
- 2577US11515122B2System and methods for VHF plasma processingTOKYO ELECTRON LTD·Filed 2019·Granted Nov 29, 2022·2 cites·12 claims
- 2677US7871830B2End point detection method for plasma etching of semiconductor wafers with low exposed areaPIVOTAL SYSTEMS CORP·Filed 2006·Granted Jan 18, 2011·9 cites·10 claims
- 2776US12500067B2Apparatus for edge control during plasma processingTOKYO ELECTRON LTD·Filed 2022·Granted Dec 16, 2025·0 cites·20 claims
- 2876US2024380114A1Parallel Resonance Antenna for Radial Plasma ControlTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2975US10861679B2Resonant structure for a plasma processing systemTOKYO ELECTRON LTD·Filed 2015·Granted Dec 8, 2020·2 cites·17 claims
- 3073US2023054430A1Apparatus for Plasma ProcessingTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 3172US11393663B2Methods and systems for focus ring thickness determinations and feedback controlTOKYO ELECTRON LTD·Filed 2019·Granted Jul 19, 2022·1 cites·24 claims
- 3272US8501499B2Adaptive recipe selectorSUNDARARAJAN RADHA·Filed 2011·Granted Aug 6, 2013·4 cites·18 claims
- 3370US11551909B2Ultra-localized and plasma uniformity control in a plasma processing systemTOKYO ELECTRON LTD·Filed 2017·Granted Jan 10, 2023·1 cites·20 claims
- 3470US11037765B2Resonant structure for electron cyclotron resonant (ECR) plasma ionizationTOKYO ELECTRON LTD·Filed 2018·Granted Jun 15, 2021·1 cites·18 claims
- 3569US12412748B2Plasma processing with magnetic ring X pointTOKYO ELECTRON LTD·Filed 2022·Granted Sep 9, 2025·0 cites·20 claims
- 3668US10354841B2Plasma generation and control using a DC ringTOKYO ELECTRON LTD·Filed 2016·Granted Jul 16, 2019·1 cites·17 claims
- 3762US12224164B2Radio frequency (RF) system with embedded RF signal pickupsTOKYO ELECTRON LTD·Filed 2021·Granted Feb 11, 2025·0 cites·22 claims
- 3862US2021249226A1Plasma Processing System with Synchronized Signal ModulationTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3959US2025166972A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4059US2025037977A1Apparatus and method for plasma processingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4159US2025273428A1Plasma adjustment using source-less resonant structureTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4259US2025293095A1System and method of pulse scoringTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4359US2025022688A1Plasma processing method and apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4458US12261017B2Resonant antenna for physical vapor deposition applicationsTOKYO ELECTRON LTD·Filed 2022·Granted Mar 25, 2025·0 cites·20 claims
- 4558US2024213005A1System and Method for Plasma ProcessingTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4658US2025132128A1Method and System for Plasma ProcessTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4757US2024258074A1Antenna Plane Magnets for Improved PerformanceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4857US2025069852A1Method for plasma processingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4956US11942307B2Plasma processing with radio frequency (RF) source and bias signal waveformsTOKYO ELECTRON LTD·Filed 2021·Granted Mar 26, 2024·0 cites·17 claims
- 5056US11043362B2Plasma processing apparatuses including multiple electron sourcesTOKYO ELECTRON LTD·Filed 2019·Granted Jun 22, 2021·0 cites·19 claims
Showing the top 50 of 62 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Barton Lane files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →