Inventor · disambiguated record
Sheik Ansar Usman Ibrahim
Also filed as: USMAN IBRAHIM SHEIK · USMAN IBRAHIM SHEIK ANSAR
9 granted patents·5 pending applications·13 citations·filing 2011–2020
80Inventor score
Top patents by PatentIndex Score
14 records- 0186US10385236B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 20, 2019·5 cites·14 claims
- 0282US10899945B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt comprising substratesBASF SE·Filed 2016·Granted Jan 26, 2021·3 cites·20 claims
- 0375US11264250B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2016·Granted Mar 1, 2022·2 cites·21 claims
- 0471US9487675B2Chemical mechanical polishing composition comprising polyvinyl phosphonic acid and its derivativesRAMAN VIJAY IMMANUEL·Filed 2011·Granted Nov 8, 2016·3 cites·11 claims
- 0559US2021102093A1Use of a chemical mechanical polishing (cmp) composition for polishing of cobalt comprising substratesBASF SE·Filed 2020·Application pending·0 cites
- 0647US10570316B2Chemical mechanical polishing (CMP) compositionBASF SE·Filed 2015·Granted Feb 25, 2020·0 cites·20 claims
- 0745US11993729B2Chemical mechanical polishing compositionBASF SE·Filed 2018·Granted May 28, 2024·0 cites·21 claims
- 0841US2016160083A1Cmp composition comprising abrasive particles containing ceriaBASF SE·Filed 2014·Application pending·0 cites
- 0940US11286402B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Mar 29, 2022·0 cites·12 claims
- 1040US10738219B2Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or cobalt alloy comprising substratesBASF SE·Filed 2015·Granted Aug 11, 2020·0 cites·14 claims
- 1133US2013161285A1Aqueous polishing composition and process for chemically mechanically polishing substrate materials for electrical, mechanical and optical devicesLI YUZHUO·Filed 2011·Application pending·0 cites
- 1233US2013200038A1Aqueous polishing composition and process for chemically mechanically polishing substrates for electrical, mechanical and optical devicesLI YUZHUO·Filed 2011·Application pending·0 cites
- 1331US2013200039A1Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide saltsNOLLER BASTIAN·Filed 2011·Application pending·0 cites
- 1430US10227506B2Chemical mechanical polishing (CMP) composition for high effective polishing of substrates comprising germaniumBASF SE·Filed 2015·Granted Mar 12, 2019·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →