Inventor · disambiguated record
Han-Ku Cho
Also filed as: CHO HAN-KU
35 granted patents·12 pending applications·226 citations·filing 1999–2014
97Inventor score
Top patents by PatentIndex Score
47 records- 0195US8003543B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Aug 23, 2011·21 cites·18 claims
- 0294US8278221B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameKOH CHA-WON·Filed 2011·Granted Oct 2, 2012·18 cites·20 claims
- 0393US7873935B2Method of manufacturing a maskSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jan 18, 2011·16 cites·20 claims
- 0493US7732341B2Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 8, 2010·18 cites·21 claims
- 0593US7539970B2Method of manufacturing maskSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted May 26, 2009·15 cites·32 claims
- 0692US8895226B2Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the methodSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Nov 25, 2014·6 cites·17 claims
- 0789US8026044B2Method of forming fine patterns of semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 27, 2011·22 cites·20 claims
- 0885US8715911B2Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the methodKIM HYUN-WOO·Filed 2011·Granted May 6, 2014·7 cites·20 claims
- 0982US7900170B2System and method correcting optical proximity effect using pattern configuration dependent OPC modelsSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Mar 1, 2011·7 cites·23 claims
- 1082US6381165B1Semiconductor memory device having storage node electrodes offset from each otherSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Apr 30, 2002·30 cites·9 claims
- 1180US7344999B2Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Mar 18, 2008·7 cites·26 claims
- 1277US7452825B2Method of forming a mask structure and method of forming a minute pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 18, 2008·5 cites·12 claims
- 1376US7795099B2Semiconductor devices having Fin-type active areas and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 14, 2010·5 cites·16 claims
- 1475US7787301B2Flash memory device using double patterning technology and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Aug 31, 2010·4 cites·12 claims
- 1574US7807318B2Reflective photomask and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Oct 5, 2010·3 cites·20 claims
- 1674US7604917B2Polymer, top coating layer, top coating composition and immersion lithography process using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 20, 2009·3 cites·15 claims
- 1769US7361612B2Barrier coating compositions containing silicon and methods of forming photoresist patterns using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 22, 2008·2 cites·22 claims
- 1866US8013375B2Semiconductor memory devices including diagonal bit linesSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Sep 6, 2011·4 cites·19 claims
- 1966US7940373B2Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted May 10, 2011·2 cites·5 claims
- 2065US7259065B2Method of forming trench in semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Aug 21, 2007·2 cites·17 claims
- 2165US6841801B2Mask for correcting optical proximity effectSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Jan 11, 2005·8 cites·11 claims
- 2263US8013374B2Semiconductor memory devices including offset bit linesSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Sep 6, 2011·2 cites·16 claims
- 2358US7205241B2Method for manufacturing semiconductor device with contact body extended in direction of bit lineSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Apr 17, 2007·8 cites·33 claims
- 2456US7670761B2Method of forming a fine pattern of a semiconductor device using a resist reflow measurement keySAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Mar 2, 2010·0 cites·20 claims
- 2556US7378196B2Method of manufacturing mask for correcting optical proximity effectSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 27, 2008·4 cites·15 claims
- 2655US7547936B2Semiconductor memory devices including offset active regionsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 16, 2009·1 cites·19 claims
- 2752US8551759B2Oligomer probe array and method of producing the sameHAH JUNG-HWAN·Filed 2007·Granted Oct 8, 2013·0 cites·31 claims
- 2851US7799490B2Optical masks and methods for measuring aberration of a beamSAMSUNG ELECTRONICS CO LTD·Filed 2010·Granted Sep 21, 2010·0 cites·11 claims
- 2951US7670725B2Optical masks and methods for measuring aberration of a beamSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Mar 2, 2010·0 cites·18 claims
- 3050US7604918B2Photosensitive polymer and photoresist composition having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Oct 20, 2009·0 cites·17 claims
- 3147US7403276B2Photomask for measuring lens aberration, method of its manufacture, and method of its useSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Jul 22, 2008·0 cites·28 claims
- 3246US2008176764A1Oligomer probe array chips, masks used to produce the same, and hybridization analysis methods using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 3346US2008169862A1Semiconductor device and methods for controlling its patternsSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 3445US2009013303A1Method of creating mask layout image and imaging systemSAMSUNG ELECTRONIES CO LTD·Filed 2008·Application pending·0 cites
- 3544US7842450B2Method of forming a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 30, 2010·0 cites·18 claims
- 3644US2007284623A1Semiconductor device having vertical channel transistorKIM SANG-JIN·Filed 2007·Application pending·0 cites
- 3744US2008076070A1Methods of Forming Fine Patterns In Integrated Circuits Using Atomic Layer DepositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 3843US7550383B2Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 23, 2009·0 cites·28 claims
- 3943US7221014B2DRAM devices having an increased density layoutSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 22, 2007·1 cites·20 claims
- 4043US2005089776A1Resist reflow measurement key and method of forming a fine pattern of a semiconductor device using the sameFiled 2004·Application pending·0 cites
- 4141US2006127816A1Double photolithography methods with reduced intermixing of solventsSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 4240US2006079067A1Methods for aligning patterns on a substrate based on optical properties of a mask layer and related devicesSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 4340US2011177437A1Compensating Masks, Multi-Optical Systems Using the Masks, and Methods of Compensating for 3-D Mask Effect Using the SameSUH SUNG-SOO·Filed 2011·Application pending·0 cites
- 4439US2007023916A1Semiconductor structure with multiple bottom anti-reflective coating layer and method of forming photoresist pattern and pattern of semiconductor device using the same structureHAH JUNG-HWAN·Filed 2006·Application pending·0 cites
- 4537US6492701B1Semiconductor device having anti-reflective cap and spacer, method of manufacturing the same, and method of manufacturing photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1999·Granted Dec 10, 2002·5 cites·12 claims
- 4637US2010290285A1Flash Memory Device Using Double Patterning Technology and Method of Manufacturing the SameLEE DOO-YOUL·Filed 2010·Application pending·0 cites
- 4737US2006115746A1Focus monitoring masks having multiple phase shifter units and methods for fabricating the sameCHOI SUNG-WON·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →